Abstract: An emanation device comprises an emanation material container (10), an emanation section (20) and emanation material level indication means (14,16); wherein, the emanation material level indication means (14, 16) comprises a light source (14), a light detector (16) and control means (not shown), wherein the light detector (16) is adapted to receive light from the light source (14) when a level of emanation material in the emanation material container (10) is at a first level and wherein the light detector (16) is adapted to receive substantially no light from the light source (14) when a level of emanation material in the emanation material container (10) is at a second level.

Abstract: A method for forming an active material containing coating on a substrate, which method comprises the steps of: i) introducing one or more gaseous or atomised liquid and/or solid coating-forming materials which undergo chemical bond forming reactions within a plasma environment and one or more active materials which substantially do not undergo chemical bond forming reactions within a plasma environment, into an atmospheric or low pressure non-thermal equilibrium plasma discharge and/or an excited gas stream resulting therefrom, and ii) exposing the substrate to the resulting mixture of atomised coating-forming and at least one active material which are deposited onto the substrate surface to form a coating; wherein the substrate is not a wipe, cloth or sponge for household care or depilatory care or a water solute household cleaning unit dose product.

Abstract: A method is provided for forming an active material containing coating on a substrate. The substrate is suitably a wipe, cloth or sponge for household use, or a water-soluble household cleaning unit dose product. The method comprises the steps of: i) introducing one or more gaseous or atomised liquid and/or solid coating-forming materials which undergo chemical bond forming reactions within a plasma environment and one or more active materials which substantially do not undergo chemical bond forming reactions within a plasma environment, into an atmospheric or low pressure plasma discharge and/or an excited gas stream resulting therefrom, and ii) exposing the substrate to the resulting mixture of atomised coating-forming and at least one active material which are deposited onto the substrate surface to form a coating.