Patents by Inventor Simone Daaud

Simone Daaud has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Device for applying photoresist to a base body surface
    Patent number: 6294020
    Abstract: An applicator device for applying photoresist to a surface of a base body having a receiving device therefor, including a photoresist feeder movable relative to the base body, the feeder being a point source device, and a device for performing a defined movement of the base body, comprising a conically shaped tip formed on the point source device for applying photoresist in a defined spot.
    Type: Grant
    Filed: February 19, 1999
    Date of Patent: September 25, 2001
    Assignee: Heidelberger Druckmaschinen AG
    Inventors: Holger Lüthje, Simone Daaud, Reinulf Böttcher
  • Method for applying photoresist to a base body surface
    Publication number: 20010021419
    Abstract: An applicator device for applying photoresist to a surface of a base body having a receiving device therefor, including a photoresist feeder movable relative to the base body, the feeder being a point source device, and a device for performing a defined movement of the base body, comprising a conically shaped tip formed on the point source device for applying photoresist in a defined spot.
    Type: Application
    Filed: April 12, 2001
    Publication date: September 13, 2001
    Applicant: Heidelberger Druckmaschinen AG
    Inventors: Holger Luthje, Simone Daaud, Reinulf Bottcher
  • Process for producing layers of cubic boron nitride
    Patent number: 5723188
    Abstract: Process for producing wear-resistant layers of cubic boron nitride or wear-resistant layers containing cubic boron nitride by sputtering with RF or DC voltage in the operating mode of an unbalanced magnetron, in which the plasma is generated by DC arc discharges or DC operated magnetron cathodes. The initial target for the production of the layer from which the material is removed comprises electrically conductive material containing boron, preferably boron carbide, and, in the process, the reactive process is conducted with the addition of N.sub.2 and Ar in such a way that the necessary stoichiometric ratio BiN in the layer can be adjusted.
    Type: Grant
    Filed: September 4, 1996
    Date of Patent: March 3, 1998
    Assignee: Fraunhofer-Gesellschaft zur Forderung der Angewandten Forschung E.V
    Inventors: Holger Luthje, Klaus Bewilogua, Simone Daaud