Abstract: A plasma abatement apparatus includes: a plasma device configured to generate a plasma stream from a plasma gas; an effluent stream aperture configured to convey the effluent stream into the plasma stream for treatment by the plasma stream; a first aperture positioned to deliver a reducing reactant to a first region of the plasma stream; and a second aperture positioned to deliver an oxidising reactant to a second region of the plasma stream, wherein the second region is located at a position of the plasma stream which is cooler than the first region.

Abstract: A plasma generating apparatus may include a cathode assembly including a cathode, an anode assembly including an anode having therein a plasma generation space, and one or more magnetic force generators configured to generate a magnetic force. The anode assembly has one end portion in which a gas supply path is provided and the other end portion having an opening, the gas supply path configured to supply a plasma generating gas to the plasma generation space. The gas supply path is configured to generate a vortex of the plasma generating gas in the plasma generation space and said one or more magnetic force generators are arranged such that the magnetic force is generated in a direction opposite to a rotational direction of the vortex of the plasma generating gas.

Abstract: A gas treating apparatus may include a reaction chamber configured to process a gas supplied from an outside by a plasma, the processed gas containing a nitrogen oxide, and a nitrogen oxide reduction apparatus connected to the reaction chamber. The nitrogen oxide reduction apparatus includes a cooling unit configured to cool the processed gas to a temperature lower than a nitrogen oxide generation temperature.

Abstract: A plasma generating apparatus may include a cathode assembly including a cathode, an anode assembly including an anode having therein a plasma generation space, and one or more magnetic force generators configured to generate a magnetic force. The anode assembly has one end portion in which a gas supply path is provided and the other end portion having an opening, the gas supply path configured to supply a plasma generating gas to the plasma generation space. The gas supply path is configured to generate a vortex of the plasma generating gas in the plasma generation space and said one or more magnetic force generators are arranged such that the magnetic force is generated in a direction opposite to a rotational direction of the vortex of the plasma generating gas.

Abstract: A method of controlling power output by a power supply configured to supply power to a plasma torch in a gas treatment system, the plasma torch being configured to treat effluent gas received from at least two processing chambers is disclosed, along with a controller and the gas treatment system. The method comprises: receiving at least one input signal, the at least one input signal comprising an indication of a number of processing chambers currently supplying an effluent gas stream to the plasma torch; and in response to the at least one input signal, controlling the power output by the power supply by outputting a control signal to control a rate of flow of the plasma source gas.

Abstract: A power supply configured to supply power to a plasma torch in a gas treatment system within a predetermined power limit by periodically receiving at least one input signal indicative of a current power output by the power supply; and in response to the at least one input signal indicating the power output has passed a predetermined value adjusting the power output such that the power output is within the predetermined power limit. Adjusting the power output includes: outputting a control signal to change a flow rate of a source gas supplied to the plasma torch where the change would maintain a source gas flow rate within predetermined gas flow limits; and where the change would not maintain the source gas flow rate within the predetermined gas flow limits, outputting a control signal to change one of a current or voltage output by the power supply unit.

Abstract: A use of a tannin and non tannin material phytocomposition or phytocomplex, either in a dry or liquid form, applied to the seedling seeds or seedling agamic multiplication members, or to implanted seedlings, to promote the starter effect, i.e. strong stimulation of the seedling initial growth. The phytocomposition is made by leaching a biomass of one or more of the following species: Castanea spp., Juglans spp., Eucalyptus spp., Quercus spp., Salix spp., Vitis spp., Mimosa ssp., Schinopsis spp., Olea europaea, Onobrychis viciifolia, Rhamnus spp., Artemisia spp., Lawsonia inermis, either in a single form or in a mixture in all mixing ratios.

Abstract: A use of a tannin and non tannin material phytocomposition or phytocomplex, either in a dry or liquid form, applied to the seedling seeds or seedling agamic multiplication members, or to implanted seedlings, to promote the starter effect, i.e. strong stimulation of the seedling initial growth. The phytocomposition is made by leaching a biomass of one or more of the following species: Castanea spp., Juglans spp., Eucalyptus spp., Quercus spp., Salix spp., Vitis spp., Mimosa ssp., Schinopsis spp., Olea europaea, Onobrychis viciifolia, Rhamnus spp., Artemisia spp., Lawsonia inermis, either in a single form or in a mixture in all mixing ratios.

Abstract: The present invention relates to a sprayable self sustaining mulch for protecting crops comprising an aqueous based mixture based on a sprayable vegetable filler and a binder consisting of poly(vinylalcohol). The composition is applied by spray means to form a protective layer on the soil.