Patents by Inventor Sin-jeung Park

Sin-jeung Park has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photolithography patterning system using feature parameters
    Patent number: 9529960
    Abstract: A method of providing a photolithography pattern can be provided by identifying at least one weak feature from among a plurality of features included in a photolithography pattern based on a feature parameter that is compared to a predetermined identification threshold value for the feature parameter. A first region of the weak feature can be classified as a first dosage region and a second region of the weak feature can be classified as a second dosage region. Related methods and apparatus are also disclosed.
    Type: Grant
    Filed: April 6, 2015
    Date of Patent: December 27, 2016
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jin Choi, Heung-suk Oh, Sin-jeung Park, Rae-won Yi
  • METHODS OF PROVIDING PHOTOLITHOGRAPHY PATTERNS USING FEATURE PARAMETERS, SYSTEMS AND COMPUTER PROGRAM PRODUCTS IMPLEMENTING THE SAME
    Publication number: 20150220679
    Abstract: A method of providing a photolithography pattern can be provided by identifying at least one weak feature from among a plurality of features included in a photolithography pattern based on a feature parameter that is compared to a predetermined identification threshold value for the feature parameter, A first region of the weak feature can be classified as a first dosage region and a second region of the weak feature can be classified as a second dosage region. Related methods and apparatus are also disclosed.
    Type: Application
    Filed: April 6, 2015
    Publication date: August 6, 2015
    Inventors: Jin Choi, Heung-suk Oh, Sin-jeung Park, Rae-won Yi
  • Methods of providing photolithography patterns using feature parameters
    Patent number: 9017904
    Abstract: A method of providing a photolithography pattern can be provided by identifying at least one weak feature from among a plurality of features included in a photolithography pattern based on a feature parameter that is compared to a predetermined identification threshold value for the feature parameter. A first region of the weak feature can be classified as a first dosage region and a second region of the weak feature can be classified as a second dosage region. Related methods and apparatus are also disclosed.
    Type: Grant
    Filed: July 25, 2013
    Date of Patent: April 28, 2015
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jin Choi, Heung-Suk Oh, Sin-jeung Park, Rae-won Yi
  • APPARATUS AND METHOD FOR PERFORMING MULTI-BEAM BASED LITHOGRAPHY
    Publication number: 20140233001
    Abstract: An apparatus for performing lithography includes a light source that emits light. A light enhancer is configured to receive and enhance the emitted light. The light enhancer includes a first lens and a second lens. A first position adjusting unit is configured to adjust a position of the second lens. A lens array is configured to separate the light enhanced by the light enhancer into multiple beams, and focus the multiple beams.
    Type: Application
    Filed: January 31, 2014
    Publication date: August 21, 2014
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: JIN CHOI, Sin-Jeung Park, Young-Su Sung
  • Methods of Providing Photolithography Patterns Using Feature Parameters, Systems and Computer Program Products Implementing the Same
    Publication number: 20140045334
    Abstract: A method of providing a photolithography pattern can be provided by identifying at least one weak feature from among a plurality of features included in a photolithography pattern based on a feature parameter that is compared to a predetermined identification threshold value for the feature parameter. A first region of the weak feature can be classified as a first dosage region and a second region of the weak feature can be classified as a second dosage region. Related methods and apparatus are also disclosed.
    Type: Application
    Filed: July 25, 2013
    Publication date: February 13, 2014
    Inventors: Jin Choi, Heung-Suk Oh, Sin-jeung Park, Rae-won Yi