Patents by Inventor Sinae Heo

Sinae Heo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240266185
    Abstract: Exemplary semiconductor processing methods may include depositing a metal-doped boron-containing material on a substrate disposed within a processing region of a semiconductor processing chamber. The metal-doped boron-containing material may include a metal dopant comprising tungsten. The substrate may include a silicon-containing material. The methods may include depositing one or more additional materials over the metal-doped boron-containing material. The one or more additional materials may include a patterned photoresist material. The methods may include transferring a pattern from the patterned photoresist material to the metal-doped boron-containing material. The methods may include etching the metal-doped boron-containing material with a chlorine-containing precursor. The methods may include etching the silicon-containing material with a fluorine-containing precursor. The metal dopant may enhance an etch rate of the silicon-containing material.
    Type: Application
    Filed: February 7, 2023
    Publication date: August 8, 2024
    Applicant: Applied Materials, Inc.
    Inventors: Han Wang, Yu Yang, Jing Zhang, Aykut Aydin, Guoqing Li, Guangyan Zhong, Rui Cheng, Gene H. Lee, Srinivas Guggilla, Sinae Heo, Eswaranand Venkatasubramanian, Abhijit Basu Mallick, Karthik Janakiraman