Patents by Inventor Sing Long Lee

Sing Long Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHOD AND APPARATUS FOR DYNAMIC PLASMA TREATMENT OF BIPOLAR ESC SYSTEM
    Publication number: 20070019360
    Abstract: The disclosure generally relates to a method for method for plasma etching a substrate in a plasma reactor comprising positioning the substrate on an electrostatic chuck inside the plasma reactor; supplying a DC voltage to the chuck, the DC voltage forming an electrostatic charge buildup on the substrate; plasma etching the substrate; disconnecting the DC voltage to the chuck; and counteracting the electrostatic charge buildup on the substrate by discharging a varying RF signal within the chamber.
    Type: Application
    Filed: June 19, 2006
    Publication date: January 25, 2007
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Cuker Huang, Sing Long Lee, Yi-Jou Lu, Chia-Ling Lee