Patents by Inventor Sirisha Behara

Sirisha Behara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10504705
    Abstract: Magnetrons for plasma sputter chambers, plasma sputter chambers including magnetrons and methods of processing a substrate such as an EUV mask blank in a plasma sputter chamber are disclosed. The magnetron comprises a plurality of elongate magnets arranged in a pattern where there is an unbalance ratio greater than 1 and less than 3.
    Type: Grant
    Filed: September 15, 2017
    Date of Patent: December 10, 2019
    Assignee: Applied Materials, Inc.
    Inventors: Sirisha Behara, Sanjay Bhat, Vibhu Jindal
  • Publication number: 20190088456
    Abstract: Magnetrons for plasma sputter chambers, plasma sputter chambers including magnetrons and methods of processing a substrate such as an EUV mask blank in a plasma sputter chamber are disclosed. The magnetron comprises a plurality of elongate magnets arranged in a pattern where there is an unbalance ratio greater than 1 and less than 3.
    Type: Application
    Filed: September 15, 2017
    Publication date: March 21, 2019
    Inventors: Sirisha Behara, Sanjay Bhat, Vibhu Jindal