Patents by Inventor Siu Fai Hung

Siu Fai Hung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for a photon induced material deposition and a device therefor
    Patent number: 11554541
    Abstract: A method for photon induced material deposition includes providing a first solution, which contains metallate or metal ions, providing a second solution, which contains light sensitive reducing agent, such as semiconductor nanoparticles, mixing the first solution and the second solution to form a reagent on a substrate, and focusing a light source on the reagent to form a mechanically rigid deposition in the focus of the light source.
    Type: Grant
    Filed: December 16, 2020
    Date of Patent: January 17, 2023
    Assignee: The Chinese University of Hong Kong
    Inventors: Sen Yang, Kangwei Xia, Siu Fai Hung, Yifan Chen
  • Method for a Photon Induced Material Deposition and a Device Therefor
    Publication number: 20210187828
    Abstract: A method for photon induced material deposition includes providing a first solution, which contains metallate or metal ions, providing a second solution, which contains light sensitive reducing agent, such as semiconductor nanoparticles, mixing the first solution and the second solution to form a reagent on a substrate, and focusing a light source on the reagent to form a mechanically rigid deposition in the focus of the light source.
    Type: Application
    Filed: December 16, 2020
    Publication date: June 24, 2021
    Inventors: Sen Yang, Kangwei Xia, Siu Fai Hung, Yifan Chen