Patents by Inventor Siva Chandrasekar
Siva Chandrasekar has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20250126765Abstract: Exemplary semiconductor processing chambers may include a chamber body. The chambers may include a substrate support assembly disposed within the chamber body. The chambers may include a substrate support assembly having a support plate seated atop a support stem. The chambers may include a radio frequency (RF) shield seated atop the chamber body and extending about a peripheral edge of the support plate. The RF shield may include a lower annular member. The RF shield may include an upper annular member seated atop the lower annular member. The upper annular member may define a lip that protrudes radially outward from an outer surface of the upper annular member. Each of the lower annular member and the upper annular member may include a dielectric material.Type: ApplicationFiled: October 13, 2023Publication date: April 17, 2025Applicant: Applied Materials, Inc.Inventors: Vellaichamy Nagappan, Viren Kalsekar, Vinay K. Prabhakar, Siva Chandrasekar, Satish Radhakrishnan, Rajath Kumar Lakkenahalli Hiriyannaiah, Dharma Ratnam Srichurnam, Sumit Subhash Singh
-
Publication number: 20250118593Abstract: Embodiments of the present disclosure relate to a processing chamber. The process chamber includes a lid assembly, a choke plate, a pedestal assembly, a ground plate, and a ground ring. A processing region is defined between the lid assembly and the pedestal assembly. The pedestal assembly includes an isolator plate assembly. The isolator plate assembly includes three or more plates. Each plate includes one or more alignment tabs, one or more protrusions, one or more lift pin holes, a ground plate, and a ground ring. The lid assembly, choke plate, and pedestal assembly form a RF return path. The ground plate, includes a cylindrical core, an annular body, and an annular projection. The ground ring includes an annular body, an annular wall, an annular connector, and an annular tab. The ground ring and the ground plate are electrically connected via a RF strap.Type: ApplicationFiled: October 2, 2024Publication date: April 10, 2025Inventors: Vellaichamy NAGAPPAN, Viren KALSEKAR, Vinay K. PRABHAKAR, Siva CHANDRASEKAR, Satish RADHAKRISHNAN, Tuan Anh (Mike) NGUYEN, Saket RATHI
-
Publication number: 20250118577Abstract: Exemplary semiconductor processing systems may include a chamber body having a bottom plate. The systems may include a substrate support disposed within the chamber body. The substrate support may include a support plate and a shaft. The shaft may include a cooling hub that extends through the bottom plate. The shaft may include a ground shaft that is seated atop the cooling hub. The ground shaft may include a ceramic material. The systems may include an inner isolator coupled with a bottom of the support plate. The inner isolator may define an aperture therethrough that receives the shaft. The systems may include an outer isolator that is seated atop the inner isolator. Each of the inner isolator and the outer isolator may include a ceramic material.Type: ApplicationFiled: October 10, 2023Publication date: April 10, 2025Applicant: Applied Materials, Inc.Inventors: Vellaichamy Nagappan, Viren Kalsekar, Vinay K. Prabhakar, Dharma Ratnam Srichurnam, Satish Radhakrishnan, Siva Chandrasekar, Sumit Subhash Singh, Pratap Chandran
-
Publication number: 20240186121Abstract: Exemplary choke plates for use in a substrate processing system may include a plate defining a first aperture through the plate and a second aperture through the plate. The second aperture may be laterally offset from the first aperture. The plate may include a flange that defines a purging inlet. The plate may include a rim defining a plurality of purging outlets that are fluidly coupled with the purging inlet. Each of the plurality of purging outlets may be fluidly coupled with the first aperture.Type: ApplicationFiled: December 6, 2022Publication date: June 6, 2024Applicant: Applied Materials, Inc.Inventors: Vellaichamy Nagappan, Viren Kalsekar, Jeongmin Lee, Vinay K. Prabhakar, Pratap Chandran, Dharma Ratnam Srichurnam, Azhar Khan, Sumit Subhash Singh, Siva Chandrasekar, Satish Radhakrishnan
-
Publication number: 20230069317Abstract: Exemplary substrate processing systems may include a chamber body defining a transfer region. The systems may include a lid plate seated on the chamber body. The lid plate may define a first plurality of apertures and a second plurality of apertures. The systems may include a plurality of lid stacks equal to a number of the first plurality of apertures. Each lid stack may include a choke plate seated on the lid plate along a first surface of the choke plate. The choke plate may define a first aperture axially aligned with an associated aperture of the first plurality of apertures. The choke plate may define a second aperture axially aligned with an associated aperture of the second plurality of apertures. The choke plate may define protrusions extending from each of a top and bottom surface of the choke plate that are arranged substantially symmetrically about the first aperture.Type: ApplicationFiled: August 25, 2021Publication date: March 2, 2023Applicant: Applied Materials, Inc.Inventors: Siva Chandrasekar, Satish Radhakrishnan, Viren Kalsekar, Vellaichamy Nagappan, Vinay K. Prabhakar
-
Patent number: 11515176Abstract: Exemplary substrate processing systems may include chamber body defining a transfer region. The systems may include a lid plate seated on the chamber body. The lid plate may define a first plurality of apertures through the lid plate and a second plurality of apertures through the lid plate. The systems may include a plurality of lid stacks equal to a number of apertures of the first plurality of apertures defined through the lid plate. Each lid stack of the plurality of lid stacks may include a choke plate seated on the lid plate along a first surface of the choke plate. The choke plate may define a first aperture axially aligned with an associated aperture of the first plurality of apertures. The choke plate may define a second aperture axially aligned with an associated aperture of the second plurality of apertures.Type: GrantFiled: April 14, 2020Date of Patent: November 29, 2022Assignee: Applied Materials, Inc.Inventors: Siva Chandrasekar, Satish Radhakrishnan, Rajath Kumar Lakkenahalli Hiriyannaiah, Viren Kalsekar, Vinay Prabhakar
-
Patent number: 11371148Abstract: A method includes receiving one or more parameters associated with a plurality of metal plates. The method further includes determining, based on the one or more parameters, a plurality of predicted deformation values associated with the plurality of metal plates. Each of the plurality of predicted deformation values correspond to a corresponding metal plate of the plurality of metal plates. The method further includes causing, based on the plurality of predicted deformation values, the plurality of metal plates to be diffusion bonded to produce a bonded metal plate structure.Type: GrantFiled: August 24, 2020Date of Patent: June 28, 2022Assignee: Applied Materials, Inc.Inventors: Sumit Agarwal, Anantha K Subramani, Yang Guo, Siva Chandrasekar
-
Publication number: 20220056584Abstract: A method includes receiving one or more parameters associated with a plurality of metal plates. The method further includes determining, based on the one or more parameters, a plurality of predicted deformation values associated with the plurality of metal plates. Each of the plurality of predicted deformation values correspond to a corresponding metal plate of the plurality of metal plates. The method further includes causing, based on the plurality of predicted deformation values, the plurality of metal plates to be diffusion bonded to produce a bonded metal plate structure.Type: ApplicationFiled: August 24, 2020Publication date: February 24, 2022Inventors: Sumit Agarwal, Anantha K. Subramani, Yang Guo, Siva Chandrasekar
-
Publication number: 20210320018Abstract: Exemplary substrate processing systems may include chamber body defining a transfer region. The systems may include a lid plate seated on the chamber body. The lid plate may define a first plurality of apertures through the lid plate and a second plurality of apertures through the lid plate. The systems may include a plurality of lid stacks equal to a number of apertures of the first plurality of apertures defined through the lid plate. Each lid stack of the plurality of lid stacks may include a choke plate seated on the lid plate along a first surface of the choke plate. The choke plate may define a first aperture axially aligned with an associated aperture of the first plurality of apertures. The choke plate may define a second aperture axially aligned with an associated aperture of the second plurality of apertures.Type: ApplicationFiled: April 14, 2020Publication date: October 14, 2021Applicant: Applied Materials, Inc.Inventors: Siva Chandrasekar, Satish Radhakrishnan, Rajath Kumar Lakkenahalli Hiriyannaiah, Viren Kalsekar, Vinay Prabhakar
-
Publication number: 20190311886Abstract: Plasma source assemblies, gas distribution assemblies including the plasma source assembly and methods of generating plasma are described. The plasma source assemblies include a powered electrode with a ground electrode adjacent a first side, a first dielectric adjacent a second side of the powered electrode and at least one second dielectric adjacent the first dielectric on a side opposite the first dielectric. The sum of the thicknesses of the first dielectric and each of the second dielectrics is in the range of about 10 mm to about 17 mm.Type: ApplicationFiled: April 10, 2019Publication date: October 10, 2019Inventors: Siva Chandrasekar, Quoc Truong, Dmitry A. Dzilno, Avinash Shervegar, Jozef Kudela, Tsutomu Tanaka, Alexander V. Garachtchenko, Yanjun Xia, Balamurugan Ramasamy, Kartik Shah
-
Publication number: 20140019298Abstract: Systems and methods for providing secure online shopping and, more particularly, systems and methods of electronic commerce using a universal shopping cart and a managed spider application that is adapted to maintain integration with each e-tailer-specific virtual shopping cart and to recreate on the corresponding e-tailer's website a most-recent shopping session state of the cart if integration between the two is interrupted.Type: ApplicationFiled: July 12, 2013Publication date: January 16, 2014Inventors: Philippe Suchet, Siva Chandrasekar
-
Publication number: 20120059708Abstract: In one embodiment, a method includes constructing an intent map for a plurality of products, the intent map comprising intent topics and each intent topic comprising intents, and then deriving a plurality of keywords from the intent map based on keyword templates.Type: ApplicationFiled: August 26, 2011Publication date: March 8, 2012Applicant: ADCHEMY, INC.Inventors: Daniel Galas, Veeravich Thi Thumasathit, Murthy V. Nukala, Richard Edward Chatwin, Alessandro Magnani, Benjamin David Foster, Alan Coleman, Manish Khettry, Siva Chandrasekar, Nitin Gupta, Srinidhi Ramesh Kondaji
-
Publication number: 20120059713Abstract: In one embodiment, a method includes deriving a user intent from user information associated with a user, selecting an advertiser intent that aligns with the user intent, and then advertising to the user based on the advertiser intent that aligns with the user intent.Type: ApplicationFiled: August 26, 2011Publication date: March 8, 2012Applicant: ADCHEMY, INC.Inventors: Daniel Galas, Veeravich Thi Thumasathit, Murthy V. Nukala, Richard Edward Chatwin, Alessandro Magnani, Benjamin David Foster, Alan Coleman, Manish Khettry, Siva Chandrasekar, Nitin Gupta, Srinidhi Ramesh Kondaji, Venkatesh Natarajan, Nitin Duggal
-
Patent number: D938373Type: GrantFiled: October 25, 2019Date of Patent: December 14, 2021Assignee: Applied Materials, Inc.Inventors: Jason M. Schaller, Benjamin Riordon, Mitchell DiSanto, Paul Forderhase, Gary Wyka, Jeffrey Hudgens, Paul Z. Wirth, Charles T. Carlson, Siva Chandrasekar, Michael Carrell, Venkata Raghavaiah Chowdhary Kode, Dmitry A. Dzilno, Juan Carlos Rocha-Alvarez