Abstract: The present invention relates to an apparatus and a method for transferring substrates into and from a vacuum chamber in a lithography apparatus. The load lock system comprises: a load lock chamber provided with an opening for allowing passage of a substrate in and out of the load lock chamber, and a transfer apparatus comprising a sub-frame at least partially arranged in the load lock chamber, an arm which is, with a proximal end thereof, connected to the sub-frame, and a substrate receiving unit which is connected to a distal end of the arm. The arm comprises at least three hinging arm parts, wherein a first and a second arm part are hingedly connected to the sub-frame with a proximal end thereof. A third arm part is hingedly connected to the distal ends of the first and second arm parts. The arm parts are arranged to form a four-bar linkage.

Abstract: The present invention relates to an apparatus and a method for transferring substrates into and from a vacuum chamber in a lithography apparatus. The load lock system comprises: a load lock chamber provided with an opening for allowing passage of a substrate in and out of the load lock chamber, and a transfer apparatus comprising a sub-frame at least partially arranged in the load lock chamber, an arm which is, with a proximal end thereof, connected to the sub-frame, and a substrate receiving unit which is connected to a distal end of the arm. The arm comprises at least three hinging arm parts, wherein a first and a second arm part are hingedly connected to the sub-frame with a proximal end thereof. A third arm part is hingedly connected to the distal ends of the first and second arm parts. The arm parts are arranged to form a four-bar linkage.

Abstract: The present invention relates to a bolometer (10) comprising a substrate (12), a first membrane (16) formed by removing a first sacrificial layer (14) on the substrate (12), the first membrane (16) comprising a measuring element (18) for measuring an amount of incident electromagnetic radiation (R), a second membrane (22) formed by removing a second sacrificial layer (20) on the first membrane (16), the second membrane (22) enclosing the first membrane (16), a first cavity (24) formed between the substrate (12) and the first membrane (16), and a second cavity (26) formed between the first membrane (16) and the second membrane (22). The present invention further relates to a method of manufacturing a bolometer, as well as a thermographic image sensor and medical device.

Abstract: The present invention relates to a bolometer (10) comprising a substrate (12), a first membrane (16) formed by removing a first sacrificial layer (14) on the substrate (12), the first membrane (16) comprising a measuring element (18) for measuring an amount of incident electromagnetic radiation (R), a second membrane (22) formed by removing a second sacrificial layer (20) on the first membrane (16), the second membrane (22) enclosing the first membrane (16), a first cavity (24) formed between the substrate (12) and the first membrane (16), and a second cavity (26) formed between the first membrane (16) and the second membrane (22). The present invention further relates to a method of manufacturing a bolometer, as well as a thermographic image sensor and medical device.