Patents by Inventor Skip Miller

Skip Miller has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Patent number: 8339574
    Abstract: A lithographic apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern, a substrate table configured to hold a substrate and a projection system configured to project the beam as patterned onto a target portion of the substrate. The lithographic apparatus further includes a polarization modifier disposed in a path of the beam. The polarization modifier comprises a material having a linear polarization.
    Type: Grant
    Filed: August 15, 2008
    Date of Patent: December 25, 2012
    Assignees: ASML Netherlands B.V., Carl Zeiss SMT GmbH
    Inventors: Michael Totzeck, Bernd Peter Geh, Skip Miller
  • Lithographic Apparatus and Device Manufacturing Method
    Publication number: 20080304037
    Abstract: A lithographic apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern, a substrate table configured to hold a substrate and a projection system configured to project the beam as patterned onto a target portion of the substrate. The lithographic apparatus further includes a polarization modifier disposed in a path of the beam. The polarization modifier comprises a material having a linear polarization.
    Type: Application
    Filed: August 15, 2008
    Publication date: December 11, 2008
    Applicant: ASML Netherlands B.V.
    Inventors: Michael TOTZECK, Bernd Peter Geh, Skip Miller
  • Lithographic apparatus and device manufacturing method
    Patent number: 7423727
    Abstract: A lithographic apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern, a substrate table configured to hold a substrate and a projection system configured to project the beam as patterned onto a target portion of the substrate. The lithographic apparatus further includes a polarization modifier disposed in a path of the beam. The polarization modifier comprises a material having a radially varying birefringence.
    Type: Grant
    Filed: January 25, 2005
    Date of Patent: September 9, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Michael Totzeck, Bernd Peter Geh, Skip Miller
  • Lithographic apparatus and device manufacturing method
    Publication number: 20060164621
    Abstract: A lithographic apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern, a substrate table configured to hold a substrate and a projection system configured to project the beam as patterned onto a target portion of the substrate. The lithographic apparatus further includes a polarization modifier disposed in a path of the beam. The polarization modifier comprises a material having a radially varying birefringence.
    Type: Application
    Filed: January 25, 2005
    Publication date: July 27, 2006
    Applicants: ASML NETHERLANDS B.V., CARL ZEISS SMT AG
    Inventors: Michael Totzeck, Bernd Geh, Skip Miller