Patents by Inventor Slumin Wang

Slumin Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6620037
    Abstract: A chemical mechanical polishing slurry comprising an oxidizing agent, a complexing agent, an abrasive, and an optional surfactant, as well as a method for using the chemical mechanical polishing slurry to remove copper alloy, titanium, titanium nitride, tantalum and tantalum nitride containing layers from a substrate. The slurry does not include a separate film-forming agent.
    Type: Grant
    Filed: May 14, 2002
    Date of Patent: September 16, 2003
    Assignee: Cabot Microelectronics Corporation
    Inventors: Vlasta Brusic Kaufman, Rodney C. Kistler, Slumin Wang