Patents by Inventor SMADAR FERBER

SMADAR FERBER has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240271926
    Abstract: A method for semiconductor device metrology. The method may include creating a time-domain representation of wavelength-domain measurement data of light reflected by a three dimensional (3D) patterned structure of a semiconductor device; selecting one or more relevant peaks of the time-domain representation and at least one irrelevant portion of the time-domain representation. One or more relevant peaks occur during one or more relevant time periods; and are associated with corresponding relevant reference peaks that are associated with different versions of a reference 3D patterned structure.
    Type: Application
    Filed: June 3, 2022
    Publication date: August 15, 2024
    Applicant: NOVA LTD.
    Inventors: Dror SHAFIR, Zvi Gorohovsky, Jacob Ofek, Daphna Peimer, Tal Heilpern, Dana Szafranek, Gilad BARAK, Smadar Ferber
  • Publication number: 20220390858
    Abstract: Semiconductor device metrology including creating a time-domain representation of wavelength-domain measurement data of light reflected by a patterned structure of a semiconductor device, selecting an earlier-in-time portion of the time-domain representation that excludes a later-in-time portion of the time-domain representation, and determining one or more measurements of one or more parameters of interest of the patterned structure by performing model-based processing using the earlier-in-time portion of the time-domain representation.
    Type: Application
    Filed: June 21, 2022
    Publication date: December 8, 2022
    Inventors: GILAD BARAK, MICHAEL CHEMAMA, SMADAR FERBER, YANIR HAINICK, BORIS LEVANT, ZE'EV LINDENFELD, DROR SHAFIR, YURI SHIRMAN, ELAD SCHLEIFER
  • Patent number: 11366398
    Abstract: Semiconductor device metrology including creating a time-domain representation of wavelength-domain measurement data of light reflected by a patterned structure of a semiconductor device, selecting an earlier-in-time portion of the time-domain representation that excludes a later-in-time portion of the time-domain representation, and determining one or more measurements of one or more parameters of interest of the patterned structure by performing model-based processing using the earlier-in-time portion of the time-domain representation.
    Type: Grant
    Filed: July 18, 2019
    Date of Patent: June 21, 2022
    Assignee: NOVA LTD
    Inventors: Gilad Barak, Michael Chemama, Smadar Ferber, Yanir Hainick, Boris Levant, Ze'Ev Lindenfeld, Dror Shafir, Yuri Shirman, Elad Schleifer
  • Publication number: 20210247699
    Abstract: Semiconductor device metrology including creating a time-domain representation of wavelength-domain measurement data of light reflected by a patterned structure of a semiconductor device, selecting an earlier-in-time portion of the time-domain representation that excludes a later-in-time portion of the time-domain representation, and determining one or more measurements of one or more parameters of interest of the patterned structure by performing model-based processing using the earlier-in-time portion of the time-domain representation.
    Type: Application
    Filed: July 18, 2019
    Publication date: August 12, 2021
    Inventors: GILAD BARAK, MICHAEL CHEMAMA, SMADAR FERBER, YAIR HAINICK, BORIS LEVANT, ZE'EV LINDENFELD, DROR SHAFIR, YURI SHIRMAN, ELAD SCHLEIFER