Abstract: The present technology relates to antimicrobial cleaning compositions comprising a polyurethane having at least one acid group salted with a biguanide (e.g., bis-biguanide) free base compound. More specifically, the present technology relates to an antimicrobial cleaning composition comprising a) a polyurethane with at least one free acid group salted with a biguanide free base; b) at least one surfactant; and c) a diluent. Surfaces treated with the antimicrobial compositions of the disclosed technology are provided with residual inhibition against the proliferation of microbe growth.

Abstract: The disclosed technology relates to esterified and/or ether containing polymers derived from itaconic acid that are free of the less reactive tri-substituted vinyl monomers (e.g., citraconic acid or mesaconic acid) that may be used, for example, as builders in detergent applications, such as in the personal and home care market.

Abstract: The disclosed technology relates to pure polyitaconic acid homo- and co-polymers free of the less reactive tri-substituted vinyl monomers (e.g., citraconic acid or mesaconic acid) that may be used, for example, as builders in detergent applications, such as in the personal and home care market.

Abstract: The disclosed technology relates to pure polyitaconic acid homo- and co-polymers free of the less reactive tri-substituted vinyl monomers (e.g., citraconic acid or mesaconic acid) that may be used, for example, as builders in detergent applications, such as in the personal and home care market.

Abstract: A hard surface cleaning composition which provides a shine to hard surfaces and which is water resistant includes 0.001-50 wt. % of at least one detersive surfactant, at least 10 wt. % of a diluent, the diluent including water, and 0.01-40 wt. % of particles comprising at least one of an anionic polyurethane polymer and an anionic polyurethane hybrid polymer, formed as an aqueous dispersion, the particles having an average particle size of less than 170 nm.

Abstract: The disclosed technology relates to esterified and/or ether containing polymers derived from itaconic acid that are free of the less reactive tri-substituted vinyl monomers (e.g., citraconic acid or mesaconic acid) that may be used, for example, as builders in detergent applications, such as in the personal and home care market.

Abstract: The disclosed technology relates to pure polyitaconic acid homo- and co-polymers free of the less reactive tri-substituted vinyl monomers (e.g., citraconic acid or mesaconic acid) that may be used, for example, as builders in detergent applications, such as in the personal and home care market.

Abstract: A hard surface cleaning composition which provides a shine to hard surfaces and which is water resistant includes 0.001-50 wt. % of at least one detersive surfactant, at least 10 wt. % of a diluent, the diluent including water, and 0.01-40 wt. % of particles comprising at least one of an anionic polyurethane polymer and an anionic polyurethane hybrid polymer, formed as an aqueous dispersion, the particles having an average particle size of less than 170 nm.

Abstract: The present invention provides for textiles treated with a composition comprising the reaction product of e) an oxirane or oxetane compound comprising at least two oxirane or oxetane groups; and f) an amino silane having the formula: N(H)(R1)R2Si(OR3)3-a-b-c(OR4)a(R5Si(OR6)d(R7)e)bR8c with R1 is chosen from the group consisting of H or a monovalent hydrocarbon radical containing one to 20 carbon atoms; R2 and R5 are independently selected from a group consisting of oxygen or a divalent linear or branched hydrocarbon radical consisting of 1-60 carbons; R4 is a hydrocarbon radical that contains 3 to 200 carbon atoms; R3, R6, R7, and R8 and are each independently selected from the group of monovalent linear or branched hydrocarbon radicals having from 1 to 200 carbon atoms; the subscript b is zero or a positive number and has a value ranging from 0 to 3; the subscripts a, and c are zero or positive and have a value ranging from 0 to 3 subject to the limitation that (a+b+c)?3; and the subscripts d and e ar

Abstract: The present invention provides for textiles treated with a composition comprising the reaction product of e) an oxirane or oxetane compound comprising at least two oxirane or oxetane groups; and f) an amino silane having the formula: N(H)(R1)R2Si(OR3)3?a?b?c(OR4)a(R5Si(OR6)d(R7)c)b R8c with R1 is chosen from the group consisting of H or a monovalent hydrocarbon radical containing one to 20 carbon atoms; R2 and R5 are independently selected from a group consisting of oxygen or a divalent linear or branched hydrocarbon radical consisting of 1-60 carbons; R4 is a hydrocarbon radical that contains 3 to 200 carbon atoms; R3, R6, R7, and R8 and are each independently selected from the group of monovalent linear or branched hydrocarbon radicals having from 1 to 200 carbon atoms; the subscript b is zero or a positive number and has a value ranging from 0 to 3; the subscripts a, and c are zero or positive and have a value ranging from 0 to 3 subject to the limitation that (a+b+c)?3; and the subscripts d and e are zero

Abstract: The present invention provides for textiles treated with a composition comprising the reaction product of e) an oxirane or oxetane compound comprising at least two oxirane or oxetane groups; and f) an amino silane having the formula: N(H)(R1)R2Si(OR3)3-a-b-c(OR4)a(R5Si(OR6)d(R7)e)bR8c with R1 is chosen from the group consisting of H or a monovalent hydrocarbon radical containing one to 20 carbon atoms; R2 and R5 are independently selected from a group consisting of oxygen or a divalent linear or branched hydrocarbon radical consisting of 1-60 carbons; R4 is a hydrocarbon radical that contains 3 to 200 carbon atoms; R3, R6, R7, and R8 and are each independently selected from the group of monovalent linear or branched hydrocarbon radicals having from 1 to 200 carbon atoms; the subscript b is zero or a positive number and has a value ranging from 0 to 3; the subscripts a, and c are zero or positive and have a value ranging from 0 to 3 subject to the limitation that (a+b+c)?3; and the subscripts d and