Patents by Inventor So-yoon Bae

So-yoon Bae has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods for measuring mean-to-target (MTT) based on pattern area measurements and methods of correcting photomasks using the same
    Patent number: 8056032
    Abstract: Methods of measuring a mean-to-target (MTT) based on pattern area measurements are provided including providing a design pattern. A plurality of design pattern measurements are measured for calculating an area of the design pattern based on a shape of the design pattern. A series of calculation measurements are calculated by continuously substituting a same variation into the design pattern measurements, and calculating a series of calculation areas corresponding respectively to the calculation measurements to generate a database including the calculation measurements and the calculation areas. An actual pattern is formed using the design pattern and an area of the actual pattern is measured. A calculation area corresponding to the area of the actual pattern is selected from the database and calculation measurements corresponding to the calculation area are selected. A difference between the design pattern measurements and the calculation measurements is calculated and the difference is set as an MTT.
    Type: Grant
    Filed: November 24, 2008
    Date of Patent: November 8, 2011
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Hyung-joo Lee, So-yoon Bae, Yo-han Choi, Jong-won Kim, Dong-hoon Chung
  • Methods for Measuring Mean-to-Target (MTT) Based on Pattern Area Measurements and Methods of Correcting Photomasks Using the Same
    Publication number: 20090150849
    Abstract: Methods of measuring a mean-to-target (MTT) based on pattern area measurements are provided including providing a design pattern. A plurality of design pattern measurements are measured for calculating an area of the design pattern based on a shape of the design pattern. A series of calculation measurements are calculated by continuously substituting a same variation into the design pattern measurements, and calculating a series of calculation areas corresponding respectively to the calculation measurements to generate a database including the calculation measurements and the calculation areas. An actual pattern is formed using the design pattern and an area of the actual pattern is measured. A calculation area corresponding to the area of the actual pattern is selected from the database and calculation measurements corresponding to the calculation area are selected. A difference between the design pattern measurements and the calculation measurements is calculated and the difference is set as an MTT.
    Type: Application
    Filed: November 24, 2008
    Publication date: June 11, 2009
    Inventors: Hyung-joo Lee, So-yoon Bae, Yo-han Choi, Jong-won Kim, Dong-hoon Chung