Patents by Inventor So Young CHOO

So Young CHOO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11892662
    Abstract: A diffraction light guide plate, including: a first diffraction substrate; and a second diffraction substrate provided on the first diffraction substrate. The first diffraction substrate includes a first diffraction grating layer on one surface and a second diffraction grating layer on an opposite surface. The second diffraction substrate includes a third diffraction grating layer on one surface and a stress compensation layer on an opposite surface. The first diffraction grating layer separates light having a wavelength of 550 nm or more and 700 nm or less, the second diffraction grating layer separates light having a wavelength of 400 nm or more and 550 nm or less, the third diffraction grating layer separates light having a wavelength of 450 nm or more and 650 nm or less, and the stress compensation layer has stress in the same direction as a direction of stress of the third diffraction grating layer.
    Type: Grant
    Filed: October 23, 2018
    Date of Patent: February 6, 2024
    Assignee: LG CHEM LTD.
    Inventors: Jung Hwan Yoon, Bu Gon Shin, Jeong Ho Park, Eun Kyu Her, So Young Choo
  • Publication number: 20230315013
    Abstract: A holographic optical element and a method for producing the same are disclosed herein. In some embodiments, a method includes illuminating a first surface of a photopolymer resin layer, where the photopolymer resin layer comprises a photopolymer resin, illuminating a second surface of the photopolymer resin layer through a retardation layer disposed in the second surface, wherein the second surface is opposite the first surface, and recording an interference pattern in the photopolymer resin layer, wherein the interference pattern is created by interference between the first parallel laser beam and the second parallel laser beam. The holographic optical element is produced using a retardation layer to prevent an unwanted interference pattern from being formed in the process of recording an interference pattern in a photopolymer resin layer.
    Type: Application
    Filed: September 13, 2021
    Publication date: October 5, 2023
    Applicant: LG Chem, Ltd.
    Inventors: So Young Choo, Dae Han Seo, Chang Yoon Lim, Hyun Joo Son, Jae Young Moon
  • Patent number: 11680311
    Abstract: The present invention relates to a method for forming an amorphous layer on one surface of a second substrate through a simple method of performing laser irradiation on a multilayered metal layer provided on a first substrate.
    Type: Grant
    Filed: June 11, 2019
    Date of Patent: June 20, 2023
    Assignee: LG CHEM, LTD.
    Inventors: Jung Hwan Yoon, Bu Gon Shin, Jeong Ho Park, Eun Kyu Her, So Young Choo, Yeon Jae Yoo
  • Patent number: 11681154
    Abstract: A wearable device which is lighter, relatively safer at the time of breakage, and smaller than a wearable device having a lens substrate that is a glass substrate.
    Type: Grant
    Filed: December 11, 2018
    Date of Patent: June 20, 2023
    Assignee: LG CHEM, LTD.
    Inventors: Hye Min Kim, Yong Suk Kim, Boo Kyung Kim, Yeong Rae Chang, Bu Gon Shin, So Young Choo
  • Patent number: 11656390
    Abstract: A method of manufacturing a module having multiple pattern areas, a module having multiple pattern areas according to the method, and a method of manufacturing a diffraction grating module or a mold for a diffraction grating module. The method of manufacturing a module having multiple pattern areas comprises: disposing a first substrate having a first pattern on a first base substrate; forming a first cutting line on the first substrate; forming a second cutting line on the first substrate; removing any one of a first area defined by the first cutting line and a second area defined by the second cutting line from the first substrate to form a removed area on the first substrate; disposing a second base substrate having a second pattern different from the first pattern in the removed area; and removing the first substrate from the base substrate without removing the first and second areas.
    Type: Grant
    Filed: August 1, 2018
    Date of Patent: May 23, 2023
    Assignee: LG CHEM, LTD.
    Inventors: Jeong Ho Park, Bu Gon Shin, Eun Kyu Her, Jung Hwan Yoon, So Young Choo
  • Patent number: 11462393
    Abstract: A plasma etching method using a Faraday cage, including: providing an etch substrate in a Faraday cage, where the etch substrate includes a metal mask provided on one surface thereof, and where an upper surface of the Faraday cage is provided with a mesh portion; a first patterning step of forming a first pattern area on the etch substrate; and a second patterning step of forming a second pattern area on the etch substrate after shielding at least a part of the mesh portion with a shutter. The first pattern area includes a first groove pattern having a depth gradient of 0 to 40 nm per 5 mm, and the second pattern area includes a second groove pattern having a depth gradient of 50 to 300 nm per 5 mm.
    Type: Grant
    Filed: December 14, 2018
    Date of Patent: October 4, 2022
    Assignee: LG CHEM, LTD.
    Inventors: Eun Kyu Her, Song Ho Jang, Chung Wan Kim, Bu Gon Shin, Jeong Ho Park, Jung Hwan Yoon, So Young Choo
  • Publication number: 20220221821
    Abstract: An embodiment of the present disclosure provides a holographic optical element and a manufacturing method of a holographic optical element including holographic gratings, the manufacturing method including: a step (a) of forming a photosensitive substrate by coating one surface of a substrate with a photosensitive resin; and a step (b) of recording the holographic gratings by irradiating each of one surface and the other surface of the photosensitive substrate with laser light, wherein in the step (a), the photosensitive resin is applied so that a height of a photosensitive resin coating layer varies along a predetermined direction.
    Type: Application
    Filed: September 24, 2020
    Publication date: July 14, 2022
    Applicant: LG Chem, Ltd.
    Inventors: Sung Yeon Kim, Min Soo Song, So Young Choo, Hye Won Hwang
  • Patent number: 11355821
    Abstract: The present invention relates to a method of welding an electrode tab which welds an electrode tab and a current collecting layer by using a pulsed laser beam, and a cable type rechargeable battery including an electrode manufactured according to the same.
    Type: Grant
    Filed: June 27, 2018
    Date of Patent: June 7, 2022
    Assignee: LG CHEM, LTD.
    Inventors: Jin Soo Lee, So Young Choo, Ju Ryoun Kim, Bu Gon Shin
  • Patent number: 11348799
    Abstract: The present invention relates to a method of manufacturing a mold for a diffraction grating light guide plate by using two mask films, the mold having first to fourth pattern portions provided on one surface thereof, and to a method of manufacturing a diffraction grating light guide plate.
    Type: Grant
    Filed: June 18, 2019
    Date of Patent: May 31, 2022
    Assignee: LG CHEM, LTD
    Inventors: Eun Kyu Her, Song Ho Jang, Chung Wan Kim, Bu Gon Shin, Jeong Ho Park, Jung Hwan Yoon, So Young Choo
  • Patent number: 11331869
    Abstract: The present invention relates to a method of manufacturing a mold substrate for a diffraction lattice light guide plate, and a method of manufacturing a diffraction lattice light guide plate.
    Type: Grant
    Filed: August 16, 2018
    Date of Patent: May 17, 2022
    Assignee: LG CHEM, LTD.
    Inventors: Eun Kyu Her, Chung Wan Kim, Song Ho Jang, Bu Gon Shin, Jeong Ho Park, Jung Hwan Yoon, So Young Choo
  • Patent number: 11276561
    Abstract: A plasma etching method using a Faraday cage, comprising: providing a Faraday cage having a mesh portion on an upper surface thereof in a plasma etching apparatus; providing a quartz substrate having a metal mask with an opening provided on one surface of the metal mask in the Faraday cage; and patterning the quartz substrate with plasma etching.
    Type: Grant
    Filed: October 19, 2018
    Date of Patent: March 15, 2022
    Assignee: LG CHEM, LTD.
    Inventors: Eun Kyu Her, Chung Wan Kim, Song Ho Jang, Bu Gon Shin, Jeong Ho Park, Jung Hwan Yoon, So Young Choo
  • Patent number: 11271199
    Abstract: A method for patterning a lithium metal surface, including the steps of (S1) forming an intaglio or relief pattern having a predetermined size on a patterning substrate; (S2) either (a) compressing lithium metal physically to a surface of the patterning substrate having the pattern formed thereon to form the predetermined pattern on the surface of the lithium metal, or (b) applying liquid lithium to the surface of the patterning substrate having the pattern formed thereon and solidifying the liquid lithium to form the predetermined pattern on the surface of the lithium metal; and (S3) separating the lithium metal having the predetermined pattern formed thereon from the patterning substrate, wherein the patterning substrate is at least one selected from a silicon wafer or polycarbonate substrate.
    Type: Grant
    Filed: August 17, 2018
    Date of Patent: March 8, 2022
    Assignee: LG ENERGY SOLUTION, LTD.
    Inventors: Yoon-Ah Kang, Eun-Kyung Kim, Sang-Wook Woo, Oh-Byong Chae, Soo-Hee Kang, Geun-Sik Jo, So-Young Choo
  • Publication number: 20210063619
    Abstract: A smaller and lighter diffraction light guide plate, and a method of manufacturing the same.
    Type: Application
    Filed: September 12, 2018
    Publication date: March 4, 2021
    Inventors: Jung Hwan YOON, Bu Gon SHIN, Jeong Ho PARK, Eun Kyu HER, So Young CHOO
  • Publication number: 20200408969
    Abstract: A diffraction light guide plate, including: a first diffraction substrate; and a second diffraction substrate provided on the first diffraction substrate. The first diffraction substrate includes a first diffraction grating layer on one surface and a second diffraction grating layer on an opposite surface. The second diffraction substrate includes a third diffraction grating layer on one surface and a stress compensation layer on an opposite surface. The first diffraction grating layer separates light having a wavelength of 550 nm or more and 700 nm or less, the second diffraction grating layer separates light having a wavelength of 400 nm or more and 550 nm or less, the third diffraction grating layer separates light having a wavelength of 450 nm or more and 650 nm or less, and the stress compensation layer has stress in the same direction as a direction of stress of the third diffraction grating layer.
    Type: Application
    Filed: October 23, 2018
    Publication date: December 31, 2020
    Inventors: Jung Hwan Yoon, Bu Gon Shin, Jeong Ho Park, Eun Kyu Her, So Young Choo
  • Patent number: 10859875
    Abstract: Disclosed are a method for forming a pattern for liquid crystal orientation of a zenithal bi-stable liquid crystal panel, a liquid crystal orientation substrate including the pattern formed thereby, and a mask substrate used for forming the pattern.
    Type: Grant
    Filed: February 13, 2018
    Date of Patent: December 8, 2020
    Assignee: LG CHEM, LTD.
    Inventors: So Young Choo, Jin Soo Lee, Eun Kyu Her, Bu Gon Shin
  • Publication number: 20200368981
    Abstract: The present invention relates to a method of manufacturing a mold substrate for a diffraction lattice light guide plate, and a method of manufacturing a diffraction lattice light guide plate.
    Type: Application
    Filed: August 16, 2018
    Publication date: November 26, 2020
    Inventors: Eun Kyu HER, Chung Wan KIM, Song Ho JANG, Bu Gon SHIN, Jeong Ho PARK, Jung Hwan YOON, So Young CHOO
  • Publication number: 20200370164
    Abstract: The present invention relates to a method for forming an amorphous layer on one surface of a second substrate through a simple method of performing laser irradiation on a multilayered metal layer provided on a first substrate.
    Type: Application
    Filed: June 11, 2019
    Publication date: November 26, 2020
    Applicant: LG CHEM, LTD.
    Inventors: Jung Hwan YOON, Bu Gon SHIN, Jeong Ho PARK, Eun Kyu HER, So Young CHOO, Yeon Jae YOO
  • Publication number: 20200365379
    Abstract: A plasma etching method using a Faraday cage, including: providing an etch substrate in a Faraday cage, where the etch substrate includes a metal mask provided on one surface thereof, and where an upper surface of the Faraday cage is provided with a mesh portion; a first patterning step of forming a first pattern area on the etch substrate; and a second patterning step of forming a second pattern area on the eth substrate after shielding at least a part of the mesh portion with a shutter. The first pattern area includes a first groove pattern having a depth gradient of 0 to 40 nm per 5 mm, and the second pattern area includes a second groove pattern having a depth gradient of 50 to 300 nm per 5 mm.
    Type: Application
    Filed: December 14, 2018
    Publication date: November 19, 2020
    Inventors: Eun Kyu Her, Song Ho Jang, Chung Wan Kim, Bu Gon Shin, Jeong Ho Park, Jung Hwan Yoon, So Young Choo
  • Publication number: 20200355932
    Abstract: A wearable device which is lighter, relatively safer at the time of breakage, and smaller than a wearable device having a lens substrate that is a glass substrate.
    Type: Application
    Filed: December 11, 2018
    Publication date: November 12, 2020
    Inventors: Hye Min Kim, Yong Suk KIM, Boo Kyung KIM, Yeong Rae CHANG, Bu Gon SHIN, So Young CHOO
  • Publication number: 20200335347
    Abstract: The present invention relates to a method of manufacturing a mold for a diffraction grating light guide plate by using two mask films, the mold having first to fourth pattern portions provided on one surface thereof, and to a method of manufacturing a diffraction grating light guide plate.
    Type: Application
    Filed: June 18, 2019
    Publication date: October 22, 2020
    Inventors: Eun Kyu HER, Song Ho JANG, Chung Wan KIM, Bu Gon SHIN, Jeong Ho PARK, Jung Hwan YOON, So Young CHOO