Abstract: An electrostatic charge image developing toner contains toner particles, fatty acid metal salt particles externally added to the toner particles, and silica particles (S) that are externally added to the toner particles and contain a nitrogen element-containing compound containing a molybdenum element, in which a ratio NMo/NSi of Net intensity NMo of the molybdenum element measured by X-ray fluorescence analysis to Net intensity NSi of a silicon element measured by X-ray fluorescence analysis is 0.035 or more and 0.45 or less.

Abstract: An electrostatic charge image developing toner contains toner particles that contain a binder resin and resin particles, fatty acid metal salt particles externally added to the toner particles, and silica particles (A) that are externally added to the toner particles and contain a nitrogen element-containing compound containing a molybdenum element, in which a ratio NMo/NSi of Net intensity NMo of the molybdenum element measured by X-ray fluorescence analysis to Net intensity NSi of a silicon element measured by X-ray fluorescence analysis is 0.035 or more and 0.45 or less.

Abstract: An electrostatic charge image developing toner contains toner particles that contain a binder resin and resin particles and silica particles (A) that are externally added to the toner particles and contain a nitrogen element-containing compound containing a molybdenum element, in which a ratio NMo/NSi of Net intensity NMo of the molybdenum element measured by X-ray fluorescence analysis to Net intensity NSi of a silicon element measured by X-ray fluorescence analysis is 0.035 or more and 0.45 or less.

Abstract: An electrostatic charge image developing toner contains toner particles, silica particles (A) that are added to an exterior of the toner particles and contain a nitrogen element-containing compound containing a molybdenum element, and inorganic particles (B) that are added to the exterior of the toner particles and other than the silica particles (A), in which in the silica particles (A), a ratio NMo/NSi of Net intensity NMo of the molybdenum element measured by X-ray fluorescence analysis to Net intensity NSi of a silicon element measured by X-ray fluorescence analysis is 0.035 or more and 0.45 or less, and an average primary particle size of the inorganic particles (B) is 10 nm or more and 80 nm or less.

Abstract: A multicore processor according to the invention has a plurality of cores. The plurality of cores are configured to operate at an operation clock with a frequency varying periodically with the same period, and a variation phase of a frequency of the operation clock of each core of the plurality of cores is shifted by a predetermined amount among the plurality of cores.

Abstract: A multicore processor according to the invention has a plurality of cores. The plurality of cores are configured to operate at an operation clock with a frequency varying periodically with the same period, and a variation phase of a frequency of the operation clock of each core of the plurality of cores is shifted by a predetermined amount among the plurality of cores.

Abstract: A vehicle-mounted electronic system includes: a standby ECU that performs standby operation when ignition is turned off; a plurality of non-standby ECUs that are inactive when the ignition is turned off; a sensor electric wire that is disposed between the plurality of sensors and the standby ECU to supply power from the standby ECU to the plurality of sensors; a sensor signal wire that carries a signal from the plurality of sensors to the standby ECU; and an ECU signal wire that is disposed between the non-standby ECU and the standby ECU to carry a wakeup request signal from the standby ECU to the non-standby ECU, in which the standby ECU, in response to signal input from the sensor, transmits the wake up request signal through the ECU signal wire to the non-standby ECU that corresponds to the signal from the sensor.

Abstract: An apparatus aims at detecting an angle of a rotating shaft as a train of bits. A first signal including a train of pulses corresponding to angle intervals of a rotation of the rotating shaft is inputted to the apparatus, and a second signal including a train of clock pulses whose clock cycle is a positive integer submultiple of a pulse cycle of the first signal is inputted to the apparatus. In the apparatus, a first counter is indicative of a higher-order of the train of bits, and counts up or down in synchronization with the pulse cycle of the first signal. A second counter is indicative of a lower-order of the train of bits, and counts either up or down in synchronization with the clock cycle of the second signal. The second counter is cleared in synchronization with the pulse cycle of the first signal.

Abstract: An apparatus aims at detecting an angle of a rotating shaft as a train of bits. A first signal including a train of pulses corresponding to angle intervals of a rotation of the rotating shaft is inputted to the apparatus, and a second signal including a train of clock pulses whose clock cycle is a positive integer submultiple of a pulse cycle of the first signal is inputted to the apparatus. In the apparatus, a first counter is indicative of a higher-order of the train of bits, and counts up or down in synchronization with the pulse cycle of the first signal. A second counter is indicative of a lower-order of the train of bits, and counts either up or down in synchronization with the clock cycle of the second signal. The second counter is cleared in synchronization with the pulse cycle of the first signal.

Abstract: A charged particle beam exposure method includes the steps of creating dot pattern data indicative of a pattern to be exposed, storing the dot pattern data in a first storage device having a first access speed, transferring the dot pattern data from the first storage device to a second storage device having a second, higher access speed, reading the dot pattern data out from the second storage device, and producing a plurality of charged particle beams in response to the dot pattern data read out from the second storage device by means of a blanking aperture array, wherein the blanking aperture array includes a plurality of apertures each causing turning-on and turning-off of a changed particle beam pertinent to the aperture in response to the dot pattern data.

Abstract: A charged particle beam exposure method includes the steps of creating dot pattern data indicative of a pattern to be exposed, storing the dot pattern data in a first storage device having a first access speed, transferring the dot pattern data from the first storage device to a second storage device having a second, higher access speed, reading the dot pattern data out from the second storage device, and producing a plurality of charged particle beams in response to the dot pattern data read out from the second storage device by means of a blanking aperture array, wherein the blanking aperture array includes a plurality of apertures each causing turning-on and turning-off of a changed particle beam pertinent to the aperture in response to the dot pattern data.

Abstract: A charged particle beam exposure method including the steps of creating dot pattern data indicative of a pattern to be exposed, storing the dot indicative of a pattern to be exposed, storing the dot pattern data in a first storage device having a first access speed, transferring the dot pattern data from the first storage device to a second storage device having a second, higher access speed, reading the dot pattern data out from the second storage device; and producing a plurality of charged particle beams in response to the dot pattern data read out from the second storage device by means of a blanking aperture array. The blanking aperture array includes a plurality of apertures each causing turning-on and turning-off of a changed particle beam pertinent to the aperture in response to the dot pattern data.

Abstract: A data conversion device for converting analog data to digital data, or digital data to analog data, is composed of a data converter. and a mediator. Plural data groups are fed to the data converter that coverts the data, group by group, upon receipt of a request for converting a particular data group. If plural requests are simultaneously made, the mediator makes mediation among the plural requests to select a data group to be first converted and to set a priority order. A function uniquely corresponding to a combination of the plural requests is generated in the mediator, and the mediation is performed based on the generated function with reference to a preinstalled table showing a relation between the function and the request to be selected.

Abstract: A data conversion device for converting analog data to digital data, or digital data to analog data, is composed of a data converter and a mediator. Plural data groups are fed to the data converter that coverts the data, group by group, upon receipt of a request for converting a particular data group. If plural requests are simultaneously made, the mediator makes mediation among the plural requests to select a data group to be first converted and to set a priority order. A function uniquely corresponding to a combination of the plural requests is generated in the mediator, and the mediation is performed based on the generated function with reference to a preinstalled table showing a relation between the function and the request to be selected.

Abstract: A charged particle beam exposure apparatus of the BAA type is disclosed, which improves the transmission rate of at least a signal transmission path leading from a blanking aperture array (BAA) control circuit to at least a blanking electrode and has an increased BAA driving speed. The impedance of the signal transmission path leading from the driver of the BAA control circuit to the BAA electrode is rendered to coincide with the output impedance of the driver of the BAA control circuit. Further, an auxiliary transmission path is provided for leading the signal transmission path inside a column outside of the column, and terminates with a resistor having the same impedance with the transmission impedance, thereby matching the impedance of the signal transmission path.

Abstract: A method for exposing an exposure pattern on an object by a charged particle beam, including the steps of: shaping a charged particle beam into a plurality of charged particle beam elements in response to first bitmap data indicative of an exposure pattern, such that the plurality of charged particle beam elements are selectively turned off in response to the first bitmap data; focusing the charged particle beam elements upon a surface of an object; and scanning the surface of the object by the charged particle beam elements; the step of shaping including the steps of: expanding pattern data of said exposure pattern into second bitmap data having a resolution of n times (n.gtoreq.2) as large as, and m times (m.gtoreq.

Abstract: A device exposing a wafer to charged-particle beams in an exposure process generates a plurality of micro beams and controls deflection of each of the micro beams, relative to whether or not the micro beams reach the wafer, in accordance with control data. A data processing unit inserts data-position-adjustment data into the control data for each exposure. A first data-storage unit stores the control data, inserted with the data-position-adjustment data, and outputs the control data at a time of the exposure process. Storage positions of the control data in the first data-storage unit are adjusted by the data-position-adjustment data so that the control data can be continuously read from the first data-storage unit for maintaining a continuous exposure process.

Abstract: The present invention relates to an exposure method of a multi-beam type in which a stage mounting a sample to be exposed is continuously moved in a first direction, and charged-particle beams are controlled so as to form a desired beam shape as a whole, and in which a pattern is formed on the sample by deflecting the charged-particle beams by a main deflector and a sub deflector. Patterns to be drawn are divided into pattern data on a cell stripe basis which corresponds to an area which can be exposed when the sub deflector scans the charged-particle beams one time. The pattern data on the cell stripe basis is stored into a memory. Then, position data indicative of cell stripes is stored, in an exposure sequence, together with address information concerning the memory in which the pattern data is stored. The deflection amount data relating to the main deflector and the sub deflector is calculated from the position data. Patterns are drawn on the wafer by using the pattern data and the deflection amount data.

Abstract: Before figure data are expanded into a bitmap, a checksum is calculated in unit of bitmap data corresponding to a cell stripe of scanning over which continuous exposure is possible. When the checksum is calculated after expanding the data into the bitmap, the interim calculation result of refocus values is used. In exposure, exposing k number of sub rectangular areas by repeating a sub scanning k number of times, jumping a deflection by a main deflector toward an center of remaining sub rectangular areas whose number is (p-k) inside a main rectangular areas and exposing remained (p-k) number of the sub rectangular areas by repeating the sub scanning (p-k) times after the jumping is settled. In an amplifier & low pass filter for supplying a drive voltage to a sub deflector, the cutoff frequency is lowed during flyback in a sawtooth waveform without changing an amplification factor.

Abstract: A charged particle beam exposure method including steps of creating dot pattern data indicative of a pattern to be exposed, storing the dot pattern data in a first storage device having a first access speed, transferring the dot pattern data from the first storage device to a second storage device having a second, higher access speed, reading the dot pattern data out from the second storage device, and producing a plurality of charged particle beams in response to the dot pattern data read out from the second storage device by means of a blanking aperture array. The blanking aperture array includes a plurality of apertures each causing turning-on and turning-off of a changed particle beam pertinent to the aperture in response to the dot pattern data.