Patents by Inventor Soichiro OMIZU

Soichiro OMIZU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Polar functional non-aqueous acrylic dispersions
    Patent number: 11767395
    Abstract: Described herein is a polar non-aqueous dispersion comprising polar polymeric microparticles in a polar non-aqueous medium, the polar polymeric microparticles being insoluble in the medium and being produced by dispersion polymerization of vinyl monomers such as acrylate monomers in the medium in the presence of a polymeric acrylic stabilizer. Inks, coatings and overprint varnishes are formulated that employ the polar non-aqueous dispersion. Such inks, etc., exhibit superior chemical resistance properties, for example in one-part and two-part systems.
    Type: Grant
    Filed: March 13, 2017
    Date of Patent: September 26, 2023
    Assignee: Sun Chemical Corporation
    Inventors: Juanita M. Parris, Soichiro Omizu, Carl S. Weisbecker, Josie M. Rosen, Ralph Arcurio, Ramasamy Krishnan, Alex Chudolij
  • High molecular weight polystyrene in inks and coatings
    Patent number: 11306216
    Abstract: Described herein are depolymerized polystyrene resins derived from polystyrene source resins. The depolymerized polystyrene resins undergo a depolymerization in which chemical bonds are cleaved, producing depolymerized polystyrene resins of lower molecular weight. The polystyrene resins may be modified by chemical reaction with monomers, polymers, and oligomers, such as acrylates thereof. Also described are ink and coating compositions that include the depolymerized and modified polystyrene resins.
    Type: Grant
    Filed: June 19, 2020
    Date of Patent: April 19, 2022
    Assignee: Sun Chemical Corporation
    Inventors: Michael J. Jurek, John G. Tiessen, Soichiro Omizu, Juanita M. Parris
  • HIGH MOLECULAR WEIGHT POLYSTYRENE IN INKS AND COATINGS
    Publication number: 20200317939
    Abstract: Described herein are depolymerized polystyrene resins derived from polystyrene source resins. The depolymerized polystyrene resins undergo a depolymerization in which chemical bonds are cleaved, producing depolymerized polystyrene resins of lower molecular weight. The polystyrene resins may be modified by chemical reaction with monomers, polymers, and oligomers, such as acrylates thereof. Also described are ink and coating compositions that include the depolymerized and modified polystyrene resins.
    Type: Application
    Filed: June 19, 2020
    Publication date: October 8, 2020
    Applicant: SUN CHEMICAL CORPORATION
    Inventors: Michael J. JUREK, John G. TIESSEN, Soichiro OMIZU, Juanita M. PARRIS
  • High molecular weight polystyrene in inks and coatings
    Patent number: 10689500
    Abstract: Described herein are depolymerized polystyrene resins derived from polystyrene source resins. The depolymerized polystyrene resins undergo a depolymerization in which chemical bonds are cleaved, producing depolymerized polystyrene resins of lower molecular weight. The polystyrene resins may be modified by chemical reaction with monomers, polymers, and oligomers, such as acrylates thereof. Also described are ink and coating compositions that include the depolymerized and modified polystyrene resins.
    Type: Grant
    Filed: February 8, 2017
    Date of Patent: June 23, 2020
    Assignee: Sun Chemical Corporation
    Inventors: Michael J. Jurek, John G. Tiessen, Soichiro Omizu, Juanita M. Parris
  • POLAR FUNCTIONAL NON-AQUEOUS ACRYLIC DISPERSIONS
    Publication number: 20190112404
    Abstract: Described herein is a polar non-aqueous dispersion comprising polar polymeric microparticles in a polar non-aqueous medium, the polar polymeric microparticles being insoluble in the medium and being produced by dispersion polymerization of vinyl monomers such as acrylate monomers in the medium in the presence of a polymeric acrylic stabilizer. Inks, coatings and overprint varnishes are formulated that employ the polar non-aqueous dispersion. Such inks, etc., exhibit superior chemical resistance properties, for example in one-part and two-part systems.
    Type: Application
    Filed: March 13, 2017
    Publication date: April 18, 2019
    Applicant: SUN CHEMICAL CORPORATION
    Inventors: Juanita M. Parris, Soichiro Omizu, Carl S. Weisbecker, Josie M. Rosen, Ralph Arcurio, Ramasamy KRISHNAN
  • HIGH MOLECULAR WEIGHT POLYSTYRENE IN INKS AND COATINGS
    Publication number: 20190062518
    Abstract: Described herein are depolymerized polystyrene resins derived from polystyrene source resins. The depolymerized polystyrene resins undergo a depolymerization in which chemical bonds are cleaved, producing depolymerized polystyrene resins of lower molecular weight. The polystyrene resins may be modified by chemical reaction with monomers, polymers, and oligomers, such as acrylates thereof. Also described are ink and coating compositions that include the depolymerized and modified polystyrene resins.
    Type: Application
    Filed: February 8, 2017
    Publication date: February 28, 2019
    Applicant: SUN CHEMICAL CORPORATION
    Inventors: Michael J. JUREK, John G. TIESSEN, Soichiro OMIZU, Juanita M. PARRIS