Abstract: A method of fabricating a multilayer interconnected substrate is disclosed. In one embodiment, the method includes providing a structure having a dielectric substrate having a first substantially planar surface and an opposing second substantially planar surface. A first conductive layer is disposed on the first substantially planar surface of the dielectric substrate, and an interface is present between the first conductive layer and the dielectric substrate. A blind via site is formed in the structure, and through the dielectric substrate to the interface between the first conductive layer and the dielectric substrate. The blind via site is filled with a conductive material by an electrolytic plating process.

Abstract: Disclosed is an interposer for electrically coupling two electrical components having different coefficients of thermal expansion (CTEs). The interposer has two substrates which have different CTE values, with each substrate having a first surface and a second surface. The interposer has electrical connectors located on the first surfaces of the two substrates, the connectors for making electrical connections to the two corresponding electrical components. A flexible-circuit layer is disposed between the two substrates and interconnects the connectors on the first substrate to the connectors on the second substrate. The two substrates are folded such that their second surfaces confront one another, where they may be attached to one another. General methods of making interposers for electrically coupling two electrical components are disclosed.

Abstract: Methods and articles used to fabricate flexible circuit structures are disclosed. The methods include depositing a release layer on substrate, and then forming a conductive laminate on the release layer. After the release layer is formed, the conductive laminate can be easily separated by the substrate to eventually form a flexible circuit structure.

Abstract: A method of fabricating a substrate having a conductive layer on opposing sides, with the conductive layers interconnected by a conductive via. The inventive method uses a dielectric substrate having a conductive layer deposited or laminated onto one or both of the substrate's opposing surfaces. For the situation of a metal layer on one side of the substrate, a laser drill is used to drill blind vias through the dielectric, stopping at the substrate/conductive layer interface. An electrolytic plating process is used to fill the via by establishing an electrical connection to the conductive layer. A second conductive layer may be deposited or laminated to the other surface of the substrate. If the starting structure has a conductive layer on both sides of the substrate, the drill is controlled to bore through the upper conductive layer at a comparatively high power and then continue at a lower power through the substrate.

Abstract: A method for making a multilayer circuit structure using circuit substrates with apertures at edge regions is disclosed. The method includes using a roller element with teeth. The teeth are used to align the circuit substrates during a lamination process.

Abstract: An interposer for providing power, ground, and signal connections between an integrated circuit chip or chips and a substrate. The inventive interposer includes a signal core and external power/ground connection wrap. The two sections may be fabricated and tested separately, then joined together using z-connection technology. The signal core is formed from a conductive power/ground plane positioned between two dielectric layers. A patterned metal layer is formed on each dielectric layer. The two metal layers are interconnected by a through via or post process. The conductive power/ground plane functions to reduce signal cross-talk between signal lines formed on the two patterned metal layers. The power/ground wrap includes an upper substrate positioned above the signal core and a lower substrate positioned below the signal core.

Abstract: An interposer for providing power, ground, and signal connections between an integrated circuit chip or chips and a substrate. The interposer includes a signal core and external power/ground connection wrap. The two sections may be fabricated and tested separately, then joined together using z-connection technology. The signal core is a dielectric film with patterned metal on both sides. The two metal layers are interconnected by a through via or post process. The power/ground wrap includes an upper substrate positioned above the signal core and a lower substrate positioned below the signal core. The upper and lower substrates of the power/ground wrap are formed from a dielectric film having a patterned metal layer on both sides connected by a through via or post process. The upper power/ground wrap substrate, signal core, and lower power/ground substrate are interconnected as desired using z-connection technology (e.g., solder or conductive ink).