Abstract: A high-sensitivity optical system to determine and/or control spatial displacement and position of objects applicable to various situations when a contact measurement cannot be performed, such as in high-vacuum or ultra-high vacuum chambers, at high temperatures, in aggressive chemical environments, etc. A laser beam is directed at a low glancing angle to a screen secured to an object. The screen's surface is normal to a motion direction of interest. A location of the bright laser beam spot on the screen surface is acquired and the displacement thereof is analyzed and quantified based on the change in distance from the laser beam spot to a reference element which is arranged on the screen and creates a variation in the acquired image brightness. A feedback loop control mechanism is provided which returns the displaced object to its original position.

Abstract: A high-sensitivity optical system to determine and/or control spatial displacement and position of objects applicable to various situations when a contact measurement cannot be performed, such as in high-vacuum or ultra-high vacuum chambers, at high temperatures, in aggressive chemical environments, etc. A laser beam is directed at a low glancing angle to a screen secured to an object. The screen's surface is normal to a motion direction of interest. A location of the bright laser beam spot on the screen surface is acquired and the displacement thereof is analyzed and quantified based on the change in distance from the laser beam spot to a reference element which is arranged on the screen and creates a variation in the acquired image brightness. A feedback loop control mechanism is provided which returns the displaced object to its original position.

Abstract: System and method for determining the composition of deposited thin films by acquiring multiple sequential X-ray spectra for a film of interest during the deposition process as the film thickness increases, computing intensities of peaks found in the X-ray spectra corresponding to elements present in the film material, followed by computing, for each pair of elements, ratios of corresponding peak intensities, graphing the intensities and ratios against a parameter correlated to the film thickness, and applying a physically meaningful function to the graphed data for best fitting the data down to a ratio RA/B(0) for each pair of the elements for a virtual film of zero thickness. Elemental concentrations ratio for each pair of elements is subsequently computed as a product of RA/B(0) and a factor which is specific for the pair of elements, constant for the instrument as set up, and independent of elements concentrations, and of film thickness.

Abstract: A radiative heater for substrates in a physical vapor deposition process for fabricating films of materials in a wide dynamic range of process temperatures and gas pressures includes a heat radiating member made from a high-temperature and oxidation resistant material tolerant to vacuum conditions which separates a heater volume containing heating filaments from a process volume which contains a deposition substrate heated by radiation of the walls of the heat radiating member. The heating elements extend through the body of the heat radiating member as well as in proximity to its surface to provide delivery of the heat to the substrate. The heat radiating member is shaped to form a cavity containing the substrate. The walls of the cavity envelope the substrate and radiate heat towards the substrate. Alternatively, the substrate is adhered to the flat surface of the heat radiating member.

Abstract: A pulsed electron ablation (PEA) utilizes a source of a high power density electron beam which includes a cathode plasma supplying electrons for generation of the electron beam and an anode plasma having a front layer extending in the processing chamber in a counter relationship with the front layer of the cathode plasma. A gas supply line is coupled to the processing chamber to supply a process gas in a controlled fashion to the anode to create a pressure gradient between the anode and the cathode plasma, and to stimulate an intense ionization of the process gas in the vicinity to the anode to form the anode plasma. The power density of the electron beam sharply increases as the result of an interaction of said cathode and anode plasmas at the double space charge contact layer formed between their fronts. A target is positioned in the processing chamber a predetermined distance from the front layer of the cathode plasma and is exposed to the electron beam to produce stream of the ablation plasma.