Patents by Inventor Solystic

Solystic has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20130173050
    Abstract: A method of processing mailpieces for sorting mailpieces into sequence in a sorting machine depending on delivery points of delivery rounds, in which method the mailpieces are grouped together into batches associated with delivery rounds and are sorted as a function of various sorting plans each associated with a respective batch of mailpieces and defining a list of delivery points of delivery rounds, which method includes the following steps, assessing the batches of mailpieces before the machine sorting to detect those that will under-use the sorting capacities; aggregating the batches of mailpieces detected as under-using the capacity so as to constitute aggregated batches of mailpieces; computing an associated sorting plan resulting from the aggregating; feeding each aggregated batch of mailpieces into the postal sorting machine and controlling the sorting of the mailpieces as a function of the sorting plan computed for said aggregated batch of mailpieces.
    Type: Application
    Filed: December 12, 2012
    Publication date: July 4, 2013
    Applicant: Solystic
    Inventor: Solystic
  • Patent number: 4157935
    Abstract: Nozzle arrays for ink jet recording are produced by preferred chemical etching of a substrate material which frequently has a non-uniform thickness. The preferred substrate is a monocrystalline silicon wafer and the 100 plane surface of the wafer is coated with etchant masking material and the resist coated wafer is held in close physical contact with a base member. A suitable mask member which defines a nozzle array pattern is spaced a predetermined distance from the base member and is positioned parallel to the base member. The wafer is then exposed through the mask by a suitable light source arranged at a suitable angle while the wafer is simultaneously rotated about an axis perpendicular to the wafer. The wafer is then exposed to a chemical anisotropic etching agent to produce a uniform array of nozzles in the wafer wherein the lateral walls of the nozzles are substantially in the "111" plane of the wafer. The masking material is then stripped from the wafer.
    Type: Grant
    Filed: December 23, 1977
    Date of Patent: June 12, 1979
    Assignee: International Business Machines Corporation
    Inventor: Erik R. Solyst
  • Patent number: 3975741
    Abstract: A charge electrode structure for electrostatic ink jet systems comprises a series of dielectric laminates having planar electrode laminates therebetween and openings therethrough for passage of the ink jet stream approximately normal to the plane of the electrodes. The electrodes for the same stream are electrically interconnected and energizeble to form a charging field similar to that of a tubular charge electrode parallel to the stream.
    Type: Grant
    Filed: July 23, 1975
    Date of Patent: August 17, 1976
    Assignee: International Business Machines Corporation
    Inventor: Erik R. Solyst
  • Patent number: D272578
    Type: Grant
    Filed: August 31, 1981
    Date of Patent: February 7, 1984
    Inventor: Jalmer Solyst