Patents by Inventor Son N. Kim

Son N. Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5498690
    Abstract: Carboxyl-containing polycondensation products having glass transition temperatures T.sub.G .gtoreq.20.degree. C. obtained from anhydrides of tricarboxylic or tetracarboxylic acids and diols, diamines or amino alcohols are used for cosmetic purposes, in particular as hair treatment compositions.
    Type: Grant
    Filed: January 27, 1995
    Date of Patent: March 12, 1996
    Assignee: BASF Aktiengesellschaft
    Inventors: Son N. Kim, Axel Sanner, Karin Sperling-Vietmeier
  • Patent number: 5389494
    Abstract: A radiation-sensitive mixture essentially consisting of(a) a binder or binder mixture which is insoluble in water but soluble in aqueous alkaline solutions and(b) a compound which forms a strong acid on exposure to radiation,wherein the binder (a) used is a phenolic resin in which from 5 to 50% of the phenolic hydroxyl groups have been replaced by .beta.-halogenated alkyl carbonate groups, is suitable for the production of relief structures.
    Type: Grant
    Filed: October 3, 1990
    Date of Patent: February 14, 1995
    Assignee: Basf Aktiengesellschaft
    Inventor: Son N. Kim
  • Patent number: 5204216
    Abstract: A radiation-sensitive mixture, essentially consisting of(a) a binder or binder mixture which is insoluble in water but soluble in aqueous alkaline solutions,(b) a compound which forms a strong acid on exposure to radiation and(c) one or more organic compounds which suppress the solubility of (a) in aqueous alkaline solutions,wherein component (c) is an organic compound of the general formula (I) ##STR1## where R.sup.1 and R.sup.2 are each hydrogen, alkyl, alkoxy, aryl or aralkyl and R.sup.3 and R.sup.4 are each alkyl, cycloalkyl, aralkyl, aryl or a radical ##STR2## where n is from 1 to 5 and R.sup.5 is alkyl, alkoxy, aryl or aralkyl, or R.sup.3 together with R.sup.4 form a five-membered to seven-membered ring via --(CH.sub.2).sub.m -- in which m is from 4 to 6, is suitable for the production of relief structures.
    Type: Grant
    Filed: January 30, 1991
    Date of Patent: April 20, 1993
    Assignee: BASF Aktiengesellschaft
    Inventor: Son N. Kim
  • Patent number: 5151341
    Abstract: A radiation-sensitive mixture useful for producing relief structures consists essentially of(a) a water-insoluble binder or binder mixture which is soluble in aqueous alkali and(b) a compound which forms a strong acid on irradiation,wherein component (a) contains at least one group ##STR1##
    Type: Grant
    Filed: November 20, 1990
    Date of Patent: September 29, 1992
    Inventor: Son N. Kim
  • Patent number: 5110708
    Abstract: A radiation-sensitive mixture, essentially consisting ofa) a binder or binder mixture which is insoluble in water but soluble in aqueous alkaline solutions,b) a compound which forms a strong acid on exposure to radiation andc) an organic compound which contains an acid-cleavable carbamate unit,is suitable for the production of relief structures.
    Type: Grant
    Filed: October 3, 1990
    Date of Patent: May 5, 1992
    Assignee: BASF Aktiengesellschaft
    Inventor: Son N. Kim