Patents by Inventor Song-Jong Cho

Song-Jong Cho has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Catalyst for decomposition of perfluorinated compound containing halogen acid gas, and preparation method thereof
    Patent number: 9321039
    Abstract: The present invention provides a catalyst for the decomposition of a perfluorinated compound containing a halogen acid gas, and a preparation method thereof. According to the present invention, the Ru—P—Al tri-component catalyst for the decomposition of a perfluorinated compound shows an excellent decomposition activity and durability with respect to the decomposition and removal of a perfluorinated compound containing a halogen acid gas, and thus can be used to decompose a chamber cleaning gas, an etchant, a solvent and the like of a perfluorinated compound from the semiconductor manufacturing industry to the LCD processing field. In addition, the present invention can be useful for decomposing and removing a perfluorinated compound discharged in a process using a halogen acid gas such as F2, Cl2, Br2 and the like.
    Type: Grant
    Filed: August 16, 2012
    Date of Patent: April 26, 2016
    Assignees: KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY, ECOPRO CO., LTD.
    Inventors: Won Choon Choi, Yong Ki Park, Na Young Kang, Min-Whee Cho, Song-Jong Cho, Sung Ho Cho, Sung Jin Yoon, Young-Ju Son
  • CATALYST FOR DECOMPOSITION OF PERFLUORINATED COMPOUND CONTAINING HALOGEN ACID GAS, AND PREPARATION METHOD THEREOF
    Publication number: 20140329667
    Abstract: The present invention provides a catalyst for the decomposition of a perfluorinated compound containing a halogen acid gas, and a preparation method thereof. According to the present invention, the Ru—P—Al tri-component catalyst for the decomposition of a perfluorinated compound shows an excellent decomposition activity and durability with respect to the decomposition and removal of a perfluorinated compound containing a halogen acid gas, and thus can be used to decompose a chamber cleaning gas, an etchant, a solvent and the like of a perfluorinated compound from the semiconductor manufacturing industry to the LCD processing field. In addition, the present invention can be useful for decomposing and removing a perfluorinated compound discharged in a process using a halogen acid gas such as F2, Cl2, Br2 and the like.
    Type: Application
    Filed: August 16, 2012
    Publication date: November 6, 2014
    Applicants: ECOPRO CO., LTD., KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY
    Inventors: Won Choon Choi, Yong Ki Park, Na Young Kang, Min-Whee Cho, Song-Jong Cho, Sung Ho Cho, Sung Jin Yoon, Young-Ju Son