Patents by Inventor Song-Wein Hong

Song-Wein Hong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7666385
    Abstract: A powdered photocatalyst and manufacturing method thereof are disclosed. The manufacturing method of the photocatalytic nanopowders is achieved by the non-transferred DC plasma apparatus in an atmosphere of nitrogen at around 1 atm. The nitrogen-containing gas is used as the plasma-forming gas. After the generation of the nitrogen-plasma in the non-transferred DC plasma apparatus, a plurality of solid Zn precursors are introduced to the nitrogen-plasma for vaporization and oxidization. The solid Zn precursors are vaporized and oxidized through homogeneous nucleation and are rapidly cooled down by a large amount of cooling gas (i.e. mixture of nitrogen and oxygen). After the cooling process, the tetrapod-shaped and nitrogen-doped photocatalytic ZnO nanopowders having wurtzite structure are formed.
    Type: Grant
    Filed: December 30, 2004
    Date of Patent: February 23, 2010
    Assignee: Industrial Technology Research Institute
    Inventors: Shih-Chieh Liao, Song-Wein Hong, Hsiu-Fen Lin
  • Patent number: 7431750
    Abstract: The present invention relates to a nanostructured metal powder and a method of fabricating the same. A twin-wire electric arc process is performed to melt the wire tips, and metal melt is formed. Simultaneously, the metal melt is broken up into melt droplets by an atomizing device. The operating temperature of the electric arc process is controlled between melting point and boiling point of the wire, to avoid vaporization of the melt droplets. Then, a fast cooling is performed to quench the melt droplets. Thus, melt droplets are solidified to ?m-scaled, spherical and dense powders comprising nano-grains (d<100 nm).
    Type: Grant
    Filed: December 28, 2005
    Date of Patent: October 7, 2008
    Assignee: Industrial Technology Research Institute
    Inventors: Shih-Chieh Liao, Jin-Ming Chen, Song-Wein Hong, Zhong-Ren Wu
  • Patent number: 7125537
    Abstract: A method for manufacturing powders of oxides in a nanometer level through a direct current plasma thermal reaction is disclosed. The energy required is provided by the plasma that is generated in the non-transferred DC plasma apparatus. Once the solid precursors are introduced into the plasma, the solid precursors are vaporized and oxidized in the plasma reaction region of the non-transferred DC plasma apparatus continuously. Then, the oxide powders in a nanometer scale can form homogeneously and continuously. By controlling the nozzle size, the speed of the plasma can be adjusted and the coarsening and agglomeration of the nanopowders can be effectively prevented. Finally, oxide nanopowders of high-purity and high-dispersity are obtained by cooling down the plasma gas containing the vaporized and oxidized precursor through a vortical cooling-gas.
    Type: Grant
    Filed: December 30, 2004
    Date of Patent: October 24, 2006
    Assignee: Industrial Technology Research Institute
    Inventors: Shih-Chieh Liao, Song-Wein Hong, Hsiu-Fen Lin
  • Publication number: 20060162495
    Abstract: The present invention relates to a nanostructured metal powder and a method of fabricating the same. A twin-wire electric arc process is performed to melt the wire tips, and metal melt is formed. Simultaneously, the metal melt is broken up into melt droplets by an atomizing device. The operating temperature of the electric arc process is controlled between melting point and boiling point of the wire, to avoid vaporization of the melt droplets. Then, a fast cooling is performed to quench the melt droplets. Thus, melt droplets are solidified to ?m-scaled, spherical and dense powders comprising nano-grains (d<100 nm).
    Type: Application
    Filed: December 28, 2005
    Publication date: July 27, 2006
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Shih-Chieh Liao, Jin-Ming Chen, Song-Wein Hong, Zhong-Ren Wu
  • Publication number: 20050249660
    Abstract: A powdered photocatalyst and manufacturing method thereof are disclosed. The manufacturing method of the photocatalytic nanopowders is achieved by the non-transferred DC plasma apparatus in an atmosphere of nitrogen at around 1 atm. The nitrogen-containing gas is used as the plasma-forming gas. After the generation of the nitrogen-plasma in the non-transferred DC plasma apparatus, a plurality of solid Zn precursors are introduced to the nitrogen-plasma for vaporization and oxidization. The solid Zn precursors are vaporized and oxidized through homogeneous nucleation and are rapidly cooled down by a large amount of cooling gas (i.e. mixture of nitrogen and oxygen). After the cooling process, the tetrapod-shaped and nitrogen-doped photocatalytic ZnO nanopowders having wurtzite structure are formed.
    Type: Application
    Filed: December 30, 2004
    Publication date: November 10, 2005
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Shih-Chieh Liao, Song-Wein Hong, Hsiu-Fen Lin
  • Publication number: 20050186132
    Abstract: A method for manufacturing powders of oxides in a nanometer level through a direct current plasma thermal reaction is disclosed. The energy required is provided by the plasma that is generated in the non-transferred DC plasma apparatus. Once the solid precursors are introduced into the plasma, the solid precursors are vaporized and oxidized in the plasma reaction region of the non-transferred DC plasma apparatus continuously. Then, the oxide powders in a nanometer scale can form homogeneously and continuously. By controlling the nozzle size, the speed of the plasma can be adjusted and the coarsening and agglomeration of the nanopowders can be effectively prevented. Finally, oxide nanopowders of high-purity and high-dispersity are obtained by cooling down the plasma gas containing the vaporized and oxidized precursor through a vortical cooling-gas.
    Type: Application
    Filed: December 30, 2004
    Publication date: August 25, 2005
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Shih-Chieh Liao, Song-Wein Hong, Hsiu-Fen Lin
  • Patent number: 6814927
    Abstract: A nanostructured tungsten carbide bulk material, sintered from tungsten carbide and metal such as cobalt nano-powders, comprises a tungsten carbide and a metallic binder such as cobalt phases. The tungsten carbide phase has nanostructures comprising a plurality of dislocations, twins, stacking faults, dislocation cells, nano-subgrains with preferred orientation or texture, or a combination thereof.
    Type: Grant
    Filed: November 15, 2002
    Date of Patent: November 9, 2004
    Assignee: Industrial Technology Research Institute
    Inventors: Shih-Chieh Liao, Song-Wein Hong, Geoffrey Wen Tai Shuy, Jin-Ming Chen, Thiraphat Vilaithong, Lang Deng Yu
  • Publication number: 20040123699
    Abstract: The present invention relates to a nanostructured metal powder and a method of fabricating the same. A twin-wire electric arc process is performed to melt the wire tips, and metal melt is formed. Simultaneously, the metal melt is broken up into melt droplets by an atomizing device. The operating temperature of the electric arc process is controlled between melting point and boiling point of the wire, to avoid vaporization of the melt droplets. Then, a fast cooling is performed to quench the melt droplets. Thus, melt droplets are solidified to &mgr;m-scaled, spherical and dense powders comprising nano-grains (d<100 nm).
    Type: Application
    Filed: June 10, 2003
    Publication date: July 1, 2004
    Applicant: Industrial Technology Research Institute
    Inventors: Shih-Chieh Liao, Jin-Ming Chen, Song-Wein Hong, Zhong-Ren Wu
  • Patent number: 6667072
    Abstract: This invention provides a concept of using porous materials on ceramic substrate planarization. This planarized substrate consists of a ceramic substrate, a buffer layer, and a nanostructure layer. The ceramic substrate provides structural strength and surface-mount capability. The buffer layer provides the adhesion between the substrate and the nanostructure layer. The nanostructure layer provides the required surface smoothness of the ceramic substrates for performing thin-film processing techniques and enhances adhesion for metallization and electronic materials.
    Type: Grant
    Filed: December 21, 2001
    Date of Patent: December 23, 2003
    Assignee: Industrial Technology Research Institute
    Inventors: Geoffrey Wen-Tai Shuy, Jong-Hong Lu, Sheng-Ju Liao, Huai-Luh Chang, Song-Wein Hong, Ruey-Cheng Huang
  • Publication number: 20030226423
    Abstract: A nanostructured tungsten carbide bulk material, sintered from tungsten carbide and metal such as cobalt nano-powders, comprises a tungsten carbide and a metallic binder such as cobalt phases. The tungsten carbide phase has nanostructures comprising a plurality of dislocations, twins, stacking faults, dislocation cells, nano-subgrains with preferred orientation or texture, or a combination thereof.
    Type: Application
    Filed: November 15, 2002
    Publication date: December 11, 2003
    Inventors: Shih-Chieh Liao, Song-Wein Hong, Geoffrey Wen Tai Shuy, Jin-Ming Chen, Thiraphat Vilaithong, Lang Deng Yu
  • Publication number: 20030118738
    Abstract: This invention provides a concept of using porous materials on ceramic substrate planarization. This planarized substrate comprises a ceramic substrate, a buffer layer, and a nanostructure layer. The ceramic substrate can enhance the structural strength and surface-mount capability. The buffer layer provides the adhesion between a substrate and a nanostructure layer. Nanostructure layer provides the required surface smoothness of the ceramic substrates for performing thin-film processing techniques and enhancing adhesion for metallization and electronic materials. This layer also provides required properties for integrating electronic such as thermal conductivity, electrical insulation, dielectric, etc.
    Type: Application
    Filed: December 21, 2001
    Publication date: June 26, 2003
    Inventors: Geoffrey Wen-Tai Shuy, Jong-Hong Lu, Sheng-Ju Liao, Huai-Luh Chang, Song-Wein Hong, Ruey-Cheng Huang