Abstract: A silica having metal ions absorbed thereon and a fabricating method thereof are provided. The silica having metal ions absorbed thereon is a silica having metal ions absorbed thereon and being modified with persulfate salt. The method includes following steps. A solution is provided, and the solution includes silica and persulfate salt therein. The solution is heated to react the silica with the persulfate salt, so as to obtain silica modified with persulfate salt. Metal ion source is added in the solution, the metal ion source dissociates metal ions, and the silica modified with persulfate salt absorbs the metal ions to obtain the silica having metal ions absorbed thereon.

Abstract: A cleaning composition is provided. The cleaning composition includes at least one polyamino-polycarboxylic acid or at least one salt thereof, at least one solvent, at least one substituted or non-substituted phenethylamine and water. The solvent is selected from a group consisting of glycols.

Abstract: A polishing composition of the present invention at least comprises about 750 ppm to less than 5000 ppm by weight of abrasive particles, hydrogen peroxide, an accelerator, a dual-corrosion inhibitor and water, wherein the dual-corrosion inhibitor contains a first and a second corrosion inhibitor. The dual-corrosion inhibitor is applied to the planarization of metal layers so as to maintain a high removal rate of metal layers as well as suppress etching of the metal, thus capable of reducing polishing defects such as dishing, erosion and the like.

Abstract: Provided is a polishing slurry composition, including a non-ionic surfactant represented by the following formula (1) R-(OCH2CH2)x—OH ??formula (1) wherein x is an integer from 1 to 50.

Abstract: A silica having metal ions absorbed thereon and a fabricating method thereof are provided. The silica having metal ions absorbed thereon is a silica having metal ions absorbed thereon and being modified with persulfate salt. The method includes following steps. A solution is provided, and the solution includes silica and persulfate salt therein. The solution is heated to react the silica with the persulfate salt, so as to obtain silica modified with persulfate salt. Metal ion source is added in the solution, the metal ion source dissociates metal ions, and the silica modified with persulfate salt absorbs the metal ions to obtain the silica having metal ions absorbed thereon.

Abstract: The sarcosine compounds used as a corrosion inhibitor according to the present invention include sarcosine and salt compounds thereof. The corrosion inhibitor is used in chemical mechanical polishing compositions or post CMP clean agents, which forms a protective film on the surface of a work piece to prevent the work piece from corrosion in chemical mechanical polishing, and thus common residue defect on the surface of a work piece due to the use of a conventional corrosion inhibitor (e.g. benzotriazole (BTA)) can be improved or the surface of a work piece can be protected from corrosion in post-CMP cleaning.

Abstract: A cleaning composition including a polyamino carboxylic salt, an acid and water is provided. The content of the polyamino carboxylic salt is 0.01 wt % to 0.5 wt %. The content of the acid is 0.01 wt % to 0.5 wt %. The remaining portion of the cleaning composition is water.

Abstract: A slurry composition has an amount of 100% and includes abrasives, an acid-base pH adjustor, an oxidant and water. A content of the abrasives is 10 wt % to 40 wt %, and a polydisperse index of the abrasives sizes is greater than 1.8. A content of the acid-base pH adjustor is 0.01 wt % to 10 wt %. A content of the oxidant is 0.01 wt % to 10 wt %. A remaining portion of the slurry composition is water.

Abstract: An inhibitor composition according to the present invention at least comprises an imidazoline compound or a triazole compound or combinations thereof, and sarcosine and salt compounds thereof or combinations thereof. The inhibitor composition is applicable to chemical mechanical polishing so as to maintain a high removal rate of metal layers as well as suppress metal etching, thereby reducing polishing defects such as dishing, erosion and the like.

Abstract: An acidic post-CMP cleaning composition includes at least one polyamino-polycarboxylic acid, or salt thereof; at least one hydroxycarboxylic acid, or salt thereof; and the remainder being substantially water. The acidic cleaning composition also includes a surfactant. The acidic post-CMP cleaning composition has a pH of 1 to 5, and is useful for removing the contaminants from the wafer surface after a CMP process without making roughness worse.

Abstract: A polishing composition of the present invention at least comprises about 750 ppm to less than 5000 ppm by weight of abrasive particles, hydrogen peroxide, an accelerator, a dual-corrosion inhibitor and water, wherein the dual-corrosion inhibitor contains a first and a second corrosion inhibitor. The dual-corrosion inhibitor is applied to the planarization of metal layers so as to maintain a high removal rate of metal layers as well as suppress etching of the metal, thus capable of reducing polishing defects such as dishing, erosion and the like.

Abstract: The sarcosine compounds used as a corrosion inhibitor according to the present invention include sarcosine and salt compounds thereof. The corrosion inhibitor is used in chemical mechanical polishing compositions or post CMP clean agents, which forms a protective film on the surface of a work piece to prevent the work piece from corrosion in chemical mechanical polishing, and thus common residue defect on the surface of a work piece due to the use of a conventional corrosion inhibitor (e.g. benzotriazole (BTA)) can be improved or the surface of a work piece can be protected from corrosion in post-CMP cleaning.

Abstract: Methods for making a nonlinear optical device and related devices are dissed. The method includes creating an ordered dispersion of charged particles in a surrounding medium. The charged particles and the surrounding medium are chosen such that they initially have identical refractive indices. In accordance with one aspect of the invention, cadmium sulfide inclusions are added to at least one of (a) the particles or (b) the medium. The cadmium sulfide inclusions have a highly nonlinear refractive index. The inclusions are optically nonlinear and upon high intensity radiation the refractive index of the particles change. This change in the refractive index occurs on the order of nanoseconds. In accordance with another aspect of the invention, a nonfluorescent dye is incorporated into at least one of (a) the particles or (b) the medium. The dye is photoabsorptive. Upon being impinged with high intensity radiation, the dye absorbs photons and heats the surrounding particles.