Abstract: Disclosed is an unmanned aerial vehicle (UAV)-aided over-the-air computing system based on full-duplex relay and a trajectory and power optimization method thereof. The UAV-aided over-the-air computing system adopts the UAV as a full-duplex relay for data fusing and forwarding. The method of the application aims at minimizing an average mean square error of over-the-air computing, and solves an optimization problem under constraints of sensor transmitting power, information transmission rate, UAV trajectory and denoising factor. For an overall joint optimization problem, each optimization variable is determined one by one by an alternative optimization method according to the high coupling of optimization variables.

Abstract: A pressure-sensitive adhesive composition and a use thereof are provided. The present application can provide a pressure-sensitive adhesive composition which has excellent performance to block ultraviolet rays including a blue region of 380 nm or more and exhibits excellent durability upon reliability evaluation without deteriorating the optical characteristics of a polarizing plate when applied to the polarizing plate. The pressure-sensitive adhesive composition of the present application can be used, for example, for a polarizing plate and an organic light emitting device.

Abstract: A method of processing a substrate includes a first step, a second step and a third step. The substrate includes an etching layer and a mask. The mask is formed on a first surface of the etching layer. The first step forms a first film on a second surface of the mask. The second step forms a second film having a material of the etching layer on the first film by etching the first surface of the etching layer. The third step removes the first film and the second film by exposing the substrate after the second step to plasma of a processing gas. The first film has an electrode material. The processing gas includes oxygen.

Abstract: A method of making a semiconductor device that includes forming a vertical access transistor including forming bit lines in a first direction on a substrate, forming a polysilicon pillar as a sacrificial pillar over each bit line of the bit lines, forming a gate oxide on side surfaces of the polysilicon pillar, forming a word line, in a second direction, on the polysilicon pillar with the gate oxide interposed between the word line and the polysilicon pillar, the second direction being not substantially parallel to the first direction, after forming the word line, removing the polysilicon pillar so as to leave a vertical void in place of the polysilicon pillar, filling the vertical void with an oxide semiconductor that serves as a channel for the vertical access transistor; and forming a cell capacitor over the channel of the vertical access transistor.

Abstract: A pressure-sensitive adhesive composition and a use thereof are provided. The present application can provide a pressure-sensitive adhesive composition which has excellent performance to block ultraviolet rays including a blue region of 380 nm or more and exhibits excellent durability upon reliability evaluation without deteriorating the optical characteristics of a polarizing plate when applied to the polarizing plate. The pressure-sensitive adhesive composition of the present application can be used, for example, for a polarizing plate and an organic light emitting device.

Abstract: A polarizing plate and a display device including the same is disclosed herein. In some embodiments, a polarizing plate includes a polarizer which allows only light polarized in a specific direction to pass through; and a haze adhesive film disposed on a one surface of the polarizer and having a haze of 49% to 65%, wherein the haze adhesive film is configured to adhere to the display device, and reduce moire occurring in the dual cell structure of the display device.

Abstract: Provided is use of a recombinant nucleic acid construct containing a B7-2-PE40 exotoxin fusion gene in the preparation of a DNA vaccine or medicament for treatment and/or prevention of type 1 diabetes. The DNA vaccine can reduce blood glucose in patient with type 1 diabetes, restore the secretion of insulin of the patients per se, and reduce the contents of islet cell autoantibody (ICA) and glutamate decarboxylase autoantibody (GAD) in the patients.

Abstract: The present application relates to a pressure-sensitive adhesive composition and a use thereof. The polarizing plate to which the pressure-sensitive adhesive composition of the present application is applied has an advantage that the performance capable of blocking the blue light, for example, the light having a wavelength region of 380 nm or more, is particularly excellent, when attached to an organic light emitting panel, especially, an organic light emitting panel comprising a plastic substrate.

Abstract: The present application relates to a photocurable solventless pressure-sensitive adhesive composition, a pressure-sensitive adhesive polarizing plate and a display device. According to the present application, a pressure-sensitive adhesive composition, a polarizing plate and a liquid crystal device, which have excellent durability and antistatic abilities, can be provided.

Abstract: A method of processing a substrate includes a first step, a second step and a third step. The substrate includes an etching layer and a mask. The mask is formed on a first surface of the etching layer. The first step forms a first film on a second surface of the mask. The second step forms a second film having a material of the etching layer on the first film by etching the first surface of the etching layer. The third step removes the first film and the second film by exposing the substrate after the second step to plasma of a processing gas. The first film has an electrode material. The processing gas includes oxygen.

Abstract: There is provided a method of processing a workpiece for manufacturing a magnetoresistive effect element, the workpiece including a first multilayer film and a second multilayer film, the first multilayer film including a first magnetic layer, a second magnetic layer and a tunnel barrier layer formed between the first magnetic layer and the second magnetic layer, and the second multilayer film constituting a pinning layer in the magnetoresistive effect element. The method includes etching the first multilayer film and the second multilayer film, and heating the workpiece after the etching or during the etching. The heating includes heating the workpiece while adjusting an ambient condition of the workpiece.

Abstract: The first film forming device is configured to form a film using plasma in a consistent vacuum state. In the forming of the first substrate product, the first substrate product is formed in a consistent vacuum state. The first substrate product has the support base, a first lamination region, and a metal region. The first lamination region is provided on the support base. The metal region is provided on the first lamination region, and has a first metal layer and a second metal layer. The first metal layer is provided on the first lamination region, and the second metal layer is provided on the first metal layer. A material of the first metal layer has TiN or Ta, and a material of the second metal layer has TaN or Ru.

Abstract: A substrate processing method includes holding a substrate on which a boron-containing silicon film is formed; supplying an oxidative aqueous solution including hydrofluoric acid and nitric acid to the held substrate; and etching the boron-containing silicon film of the substrate with the oxidative aqueous solution.

Abstract: A method of cleaning a substrate processing apparatus that etches a film including a metal includes (a) providing an inert gas, and removing a metal-containing deposition by plasma generated from the inert gas; and (b) after (a), providing a gas containing a fluorine-containing gas and an oxygen-containing gas, and removing a silicon-containing deposition by plasma generated from the gas containing the fluorine-containing gas and the oxygen-containing gas.

Abstract: The present application relates to a pressure-sensitive adhesive composition and a use thereof. The polarizing plate to which the pressure-sensitive adhesive composition of the present application is applied has an advantage that the performance capable of blocking the blue light, for example, the light having a wavelength region of 380 nm or more, is particularly excellent, when attached to an organic light emitting panel, especially, an organic light emitting panel comprising a plastic substrate.

Abstract: The first film forming device is configured to form a film using plasma in a consistent vacuum state. In the forming of the first substrate product, the first substrate product is formed in a consistent vacuum state. The first substrate product has the support base, a first lamination region, and a metal region. The first lamination region is provided on the support base. The metal region is provided on the first lamination region, and has a first metal layer and a second metal layer. The first metal layer is provided on the first lamination region, and the second metal layer is provided on the first metal layer. A material of the first metal layer has TiN or Ta, and a material of the second metal layer has TaN or Ru.

Abstract: A pressure-sensitive adhesive composition and a use thereof are provided. The present application can provide a pressure-sensitive adhesive composition which has excellent performance to block ultraviolet rays including a blue region of 380 nm or more and exhibits excellent durability upon reliability evaluation without deteriorating the optical characteristics of a polarizing plate when applied to the polarizing plate. The pressure-sensitive adhesive composition of the present application can be used, for example, for a polarizing plate and an organic light emitting device.

Abstract: In a method for etching a multilayer film of a target object by using a plasma processing apparatus, the multilayer film of the target object includes a layer made of a metal magnetic material and a mask is provided on the multilayer film. The multilayer film is etched in a state where a pressure in a processing chamber of the plasma processing apparatus is set to a first pressure that is a relatively high pressure. Subsequently, the multilayer film is further etched in a state where the pressure in the processing chamber is set to a second pressure lower than the first pressure.

Abstract: In a method of etching according to one embodiment, a multilayer film having a magnetic tunnel junction layer is etched. In the method of etching, a plasma processing apparatus is used. A chamber body of the plasma processing apparatus provides an internal space. In the method of etching, a workpiece is accommodated in the internal space. Next, the multilayer film is etched by plasma of a first gas generated in the internal space. The first gas includes carbon and a rare gas and does not include hydrogen. Next, the multilayer film is further etched by plasma of a second gas generated in the internal space. The second gas includes oxygen and a rare gas and does not include carbon and hydrogen.

Abstract: The present application relates to a photocurable solventless pressure-sensitive adhesive composition, a pressure-sensitive adhesive polarizing plate and a display device. According to the present application, a pressure-sensitive adhesive composition, a polarizing plate and a liquid crystal device, which have excellent durability and antistatic abilities, can be provided.