Patents by Inventor Sonia CASTELLANOS ORTEGA

Sonia CASTELLANOS ORTEGA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process environment for inorganic resist patterning
    Patent number: 11947262
    Abstract: The processing of radiation patternable organometallic coatings is shown to be improved through the appropriate selection of post processing conditions between coating and development of the pattern. In particular, a coated wafer can be subjected to process delays to allow aging of the coating at various process points, in particular following irradiation. Process delays can be combined and interspersed with heating steps. The atmosphere above the coated wafer at various process steps can be adjusted to obtain desired improvements in the development of the pattern. Reactive gases can be beneficial with respect to improvement of coating properties.
    Type: Grant
    Filed: March 1, 2021
    Date of Patent: April 2, 2024
    Assignee: Inpria Corporation
    Inventors: Alan J. Telecky, Jason K. Stowers, Douglas A. Keszler, Stephen T. Meyers, Peter de Schepper, Sonia Castellanos Ortega, Michael Greer, Kirsten Louthan
  • METHOD AND APPARATUS FOR FORMING A PATTERNED LAYER OF CARBON, METHOD OF FORMING A PATTERNED LAYER OF MATERIAL
    Publication number: 20240011150
    Abstract: Methods and apparatus for forming a patterned layer of carbon are disclosed. In one arrangement, a selected portion of a surface of a solid structure is irradiated with extreme ultraviolet radiation in the presence of a carbon-containing precursor. The radiation interacts with the solid structure in the selected portion to cause formation of a layer of carbon in the selected portion from the carbon-containing precursor. The layer of carbon is formed in a pattern defined by the selected portion.
    Type: Application
    Filed: September 26, 2023
    Publication date: January 11, 2024
    Applicant: ASML Netherlands B.V.
    Inventors: Sonia CASTELLANOS ORTEGA, Jan VERHOEVEN, Joost Wilhelmus Maria FRENKEN, Pavlo ANTONOV, Nicolaas TEN KATE, Olivier Christian Maurice LUGIER
  • Method and apparatus for forming a patterned layer of carbon, method of forming a patterned layer of material
    Patent number: 11807937
    Abstract: Methods and apparatus for forming a patterned layer of carbon are disclosed. In one arrangement, a selected portion of a surface of a solid structure is irradiated with extreme ultraviolet radiation in the presence of a carbon-containing precursor. The radiation interacts with the solid structure in the selected portion to cause formation of a layer of carbon in the selected portion from the carbon-containing precursor. The layer of carbon is formed in a pattern defined by the selected portion.
    Type: Grant
    Filed: February 26, 2019
    Date of Patent: November 7, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Sonia Castellanos Ortega, Jan Verhoeven, Joost Wilhelmus Maria Frenken, Pavlo Antonov, Nicolaas Ten Kate, Olivier Christian Maurice Lugier
  • METHOD AND APPARATUS FOR FORMING A PATTERNED LAYER OF MATERIAL
    Publication number: 20230350301
    Abstract: Methods and apparatus for forming a patterned layer of material are disclosed. In one arrangement, a deposition-process material is provided in gaseous form. A layer of the deposition-process material is formed on the substrate by causing condensation or deposition of the gaseous deposition-process material. A selected portion of the layer of deposition-process material is irradiated to modify the deposition-process material in the selected portion.
    Type: Application
    Filed: February 17, 2021
    Publication date: November 2, 2023
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Evgenia KURGANOVA, Gosse Charles DE VRIES, Alexey Olegovich POLYAKOV, Jim Vincent OVERKAMP, Teis Johan COENEN, Tamara DRUZHININA, Sonia CASTELLANOS ORTEGA, Olivier Christian Maurice LUGIER
  • PROCESS ENVIRONMENT FOR INORGANIC RESIST PATTERNING
    Publication number: 20210271170
    Abstract: The processing of radiation patternable organometallic coatings is shown to be improved through the appropriate selection of post processing conditions between coating and development of the pattern. In particular, a coated wafer can be subjected to process delays to allow aging of the coating at various process points, in particular following irradiation. Process delays can be combined and interspersed with heating steps. The atmosphere above the coated wafer at various process steps can be adjusted to obtain desired improvements in the development of the pattern. Reactive gases can be beneficial with respect to improvement of coating properties.
    Type: Application
    Filed: March 1, 2021
    Publication date: September 2, 2021
    Inventors: Alan J. Telecky, Jason K. Stowers, Douglas A. Keszler, Stephen T. Meyers, Peter de Schepper, Sonia Castellanos Ortega, Michael Greer, Kirsten Louthan
  • Method and Apparatus for Forming a Patterned Layer of Carbon, Method of Forming a Patterned Layer of Material
    Publication number: 20210032743
    Abstract: Methods and apparatus for forming a patterned layer of carbon are disclosed. In one arrangement, a selected portion of a surface of a solid structure is irradiated with extreme ultraviolet radiation in the presence of a carbon-containing precursor. The radiation interacts with the solid structure in the selected portion to cause formation of a layer of carbon in the selected portion from the carbon-containing precursor. The layer of carbon is formed in a pattern defined by the selected portion.
    Type: Application
    Filed: February 26, 2019
    Publication date: February 4, 2021
    Applicant: ASML Netherlands B.V.
    Inventors: Sonia CASTELLANOS ORTEGA, Jan VERHOEVEN, Joost Wilhelmus Maria FRENKEN, Pavlo ANTONOV, Nicolaas TEN KATE, Olivier Christian Maurice LUGIER