Patents by Inventor Sonny KUNNAKKAT

Sonny KUNNAKKAT has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for semiconductor processing chamber isolation for reduced particles and improved uniformity
    Patent number: 10679827
    Abstract: Implementations of the present disclosure generally relate to apparatus and methods for uniform deposition of thin films on substrates. In one implementation, a plasma-processing chamber comprises a chamber body including chamber walls, a chamber floor, and a lid support. The plasma-processing chamber further comprises a substrate support assembly at least partially disposed within the chamber body and configured to support a substrate. The plasma-processing chamber further comprises a lid assembly disposed over the support assembly and positioned on the lid support wherein the lid assembly and the chamber body define a first processing volume. The plasma-processing chamber further comprises a bottom isolation assembly that circumscribes at least a portion of the substrate support assembly and is vertically movable from a loading position to a processing position. A seal is formed between the bottom isolation assembly and the lid assembly when the bottom isolation assembly is in the processing position.
    Type: Grant
    Filed: January 10, 2018
    Date of Patent: June 9, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Gopu Krishna, Ravikumar Patil, Hanish Kumar Panavalappil Kumarankutty, Somil Kapadia, Sonny Kunnakkat
  • METHOD AND APPARATUS FOR SEMICONDUCTOR PROCESSING CHAMBER ISOLATION FOR REDUCED PARTICLES AND IMPROVED UNIFORMITY
    Publication number: 20180211820
    Abstract: Implementations of the present disclosure generally relate to apparatus and methods for uniform deposition of thin films on substrates. In one implementation, a plasma-processing chamber comprises a chamber body including chamber walls, a chamber floor, and a lid support. The plasma-processing chamber further comprises a substrate support assembly at least partially disposed within the chamber body and configured to support a substrate. The plasma-processing chamber further comprises a lid assembly disposed over the support assembly and positioned on the lid support wherein the lid assembly and the chamber body define a first processing volume. The plasma-processing chamber further comprises a bottom isolation assembly that circumscribes at least a portion of the substrate support assembly and is vertically movable from a loading position to a processing position. A seal is formed between the bottom isolation assembly and the lid assembly when the bottom isolation assembly is in the processing position.
    Type: Application
    Filed: January 10, 2018
    Publication date: July 26, 2018
    Inventors: Gopu KRISHNA, Ravikumar PATIL, Hanish Kumar PANAVALAPPIL KUMARANKUTTY, Somil KAPADIA, Sonny KUNNAKKAT