Patents by Inventor Soo-Wan KOH

Soo-Wan KOH has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PHOTOMASK CLEANING APPARATUS, METHOD OF CLEANING A PHOTOMASK, AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
    Publication number: 20170059984
    Abstract: Disclosed is a method. The method includes placing a photomask on a receiver of a cleaning apparatus, removing adhesive residue from the photomask by irradiating laser on the adhesive residue, attaching a pellicle to the photomask, and exposing a semiconductor substrate to a light using the photomask, wherein the irradiating laser repeatedly pauses and restarts during the removing of the adhesive residue.
    Type: Application
    Filed: July 14, 2016
    Publication date: March 2, 2017
    Inventors: Jin-su KIM, Jae-hyuck CHOI, Byung-gook KIM, Soo-wan KOH
  • Reflective photomask blank, reflective photomask, and integrated circuit device manufactured by using reflective photomask
    Patent number: 9341941
    Abstract: A reflective photomask blank, a reflective photomask and an integrated circuit device manufactured by using a reflective photomask, include a multi-layered reflection layer; a capping layer on the multi-layered reflection layer and including a first transition metal; a passivation film contacting at least a portion of the capping layer on a side opposite to the multi-layered reflection layer and including a second transition metal and a nitrogen (N) atom; and a light absorption pattern covering a portion of the capping layer.
    Type: Grant
    Filed: July 21, 2014
    Date of Patent: May 17, 2016
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Han-Shin Lee, Jae-Hyuck Choi, Soo-Wan Koh, Jin-Su Kim, Hyung-Ho Ko
  • REFLECTIVE PHOTOMASK BLANK, REFLECTIVE PHOTOMASK, AND INTEGRATED CIRCUIT DEVICE MANUFACTURED BY USING REFLECTIVE PHOTOMASK
    Publication number: 20150037544
    Abstract: A reflective photomask blank, a reflective photomask and an integrated circuit device manufactured by using a reflective photomask, include a multi-layered reflection layer; a capping layer on the multi-layered reflection layer and including a first transition metal; a passivation film contacting at least a portion of the capping layer on a side opposite to the multi-layered reflection layer and including a second transition metal and a nitrogen (N) atom; and a light absorption pattern covering a portion of the capping layer.
    Type: Application
    Filed: July 21, 2014
    Publication date: February 5, 2015
    Inventors: Han-Shin LEE, Jae-Hyuck CHOI, Soo-Wan KOH, Jin-Su KIM, Hyung-Ho KO