Abstract: The purpose of the present disclosure is to provide a method for recovering a solid state electrolyte from an all-solid-state battery, which simultaneously recovers rare metals through a hydrometallurgical process. In order to achieve the purpose, an aspect of the present disclosure provides a method for recovering a solid state electrolyte from an all-solid-state battery, the method comprising steps of: (a) crushing or grinding the all-solid-state battery; (b) acid leaching the crushed or ground all-solid-state battery to form a leaching solution; (c) adding a first precipitant to the leaching solution to separate the leaching solution into a first precipitate and a first leachate; (d) adding a pH modifier to the first leachate to separate the first leachate into a second precipitate and a second leachate; and (e) adding a second precipitant to the second leachate to recover a third precipitate.

Abstract: A method of fabricating a semiconductor device may include providing a substrate including cell and peripheral regions, forming a cell gate structure on the cell region, forming a peripheral gate structure on the peripheral region, forming a bit line structure on the cell region, forming a preliminary conductive layer to cover the bit line structure and the peripheral gate structure, and etching the preliminary conductive layer to form a landing pad and peripheral conductive pads. The etching of the preliminary conductive layer may include forming lower and photoresist layers on the preliminary conductive layer, performing a first exposure process on the photoresist layer, performing a second exposure process on the photoresist layer, and etching the preliminary conductive layer using the photoresist and lower layers as an etch mask. The first exposure process may expose a portion of the photoresist layer that is on the cell region to light.

Abstract: A method of manufacturing a semiconductor device includes forming a mold layer on a semiconductor wafer having a plurality of integrated circuit die at least partially defined therein. An etch stopper film is selectively formed on a second portion of the mold layer extending adjacent a periphery of the semiconductor wafer, but not on a first portion of the mold layer extending opposite at least one of the plurality of integrated circuit die. A preliminary pattern layer is formed on the etch stopper film and on the first portion of the mold layer. A plurality of patterns are formed in the preliminary pattern layer by selectively exposing the preliminary pattern layer to extreme ultraviolet light (EUV). Then, hole patterns are selectively formed in the first portion of the mold layer, using the exposed preliminary pattern layer and the etch stopper film as an etching mask.

Abstract: A display device includes: a substrate including a display area at a front surface and a non-display area at a periphery of the display area, wherein the non-display area includes a bending area having at least a portion bent toward a rear surface; a first metal layer on the substrate, the first metal layer overlapping with a contact hole at an out side of the bending area in the non-display area; a first via layer as an organic layer, located over the first metal layer, the first via layer including the contact hole; a second metal layer on the first via layer, the second metal layer being electrically connected to the first metal layer in the contact hole; and an inorganic layer on the second metal layer, wherein at least a portion of one side end of the inorganic layer, which is in the non-display area, is at an outside of the bending area and an area on the contact hole.

Abstract: A reflective mask includes a central region and first and second peripheral regions at opposite sides of the central region, respectively, the first peripheral region including a first out-of-band region having a first edge region extending in a first direction, and a first expansion region between the first edge region and the central region, and a first outer auxiliary region adjacent to the first expansion region of the first out-of-band region in the first direction, the first outer auxiliary region having a first auxiliary pattern region.

Abstract: A semiconductor device is provided. The semiconductor device includes: a first interlayer insulating film defining a lower wiring trench; a lower wiring structure including a first lower barrier film which extends along sidewalls of the lower wiring trench, and a lower filling film which is on the first lower barrier film; a second interlayer insulating film on the first interlayer insulating film, the second interlayer insulating film defining an upper wiring trench which exposes at least part of the lower wiring structure; and an upper wiring structure provided in the upper wiring trench and connected to the lower wiring structure. An upper surface of the first lower barrier film is closer to a bottom surface of the lower wiring trench than each of an upper surface of the first interlayer insulating film and an upper surface the lower filling film. The upper surface of the first lower barrier film is concave.

Abstract: Provided are a multi-channel isothermal amplification system and an operation method. The operation method comprises: a first step in which sample tubes are disposed in holes formed in a line in a heating block, respectively, wherein the heating block comprises: a first heating block area in which some of the plurality of holes are formed in a line; and a second heating block area in which the rest of the plurality of holes are formed in a line, and which is disposed to be in a line with the first heating block area, wherein the first heating block area and the second heating block area are spaced apart from each other at an interval as much as one hole area between two holes; and a second step in which an optical system moves in a longitudinal direction of the first heating block area and the second heating block area.

Abstract: A method of manufacturing a semiconductor device includes forming a mold layer on a semiconductor wafer having a plurality of integrated circuit die at least partially defined therein. An etch stopper film is selectively formed on a second portion of the mold layer extending adjacent a periphery of the semiconductor wafer, but not on a first portion of the mold layer extending opposite at least one of the plurality of integrated circuit die. A preliminary pattern layer is formed on the etch stopper film and on the first portion of the mold layer. A plurality of patterns are formed in the preliminary pattern layer by selectively exposing the preliminary pattern layer to extreme ultraviolet light (EUV). Then, hole patterns are selectively formed in the first portion of the mold layer, using the exposed preliminary pattern layer and the etch stopper film as an etching mask.

Abstract: A reflective mask includes a central region and first and second peripheral regions at opposite sides of the central region, respectively, the first peripheral region including a first out-of-band region having a first edge region extending in a first direction, and a first expansion region between the first edge region and the central region, and a first outer auxiliary region adjacent to the first expansion region of the first out-of-band region in the first direction, the first outer auxiliary region having a first auxiliary pattern region.

Abstract: Provided is a method for processing data from a point-of-care test reader, which reduces an error of a measured value of the point-of-care test reader for a diagnostic kit to acquire quantitative data having high reliability, and the method includes correcting location errors of a test signal line and a control signal line on a membrane based on scan line signal data obtained by scanning a specific region of the membrane within a diagnostic kit with a laser beam, setting a region of interest for the test signal line and the control signal line of the scan line signal data, and arranging and analyzing each of the scan line signal data in the region of interest.

Abstract: A method of driving a display panel includes adjusting a level of a data sustaining voltage or an on bias voltage during an on bias compensating period, applying the on bias voltage to pixels through data lines during an on bias period, which is subsequent to the on bias compensating period, to adjust a voltage level of control electrodes of driving transistors of the pixels, initiating a voltage of anode electrodes of organic light emitting elements of the pixels during an initiating period, applying data voltages to the pixels through the data lines during a scanning period, and turning on the organic light emitting elements of the pixels during an emission period.

Abstract: A method of driving a display panel includes adjusting a level of a data sustaining voltage or an on bias voltage during an on bias compensating period, applying the on bias voltage to pixels through data lines during an on bias period, which is subsequent to the on bias compensating period, to adjust a voltage level of control electrodes of driving transistors of the pixels, initiating a voltage of anode electrodes of organic light emitting elements of the pixels during an initiating period, applying data voltages to the pixels through the data lines during a scanning period, and turning on the organic light emitting elements of the pixels during an emission period.

Abstract: A medical image display apparatus and method, which divide a screen region into a first region whose length is relatively greater than a width thereof and on which an entire lower-limb image and a division boundary line dividing the lower-limb image in a widthwise direction, and a second region adjacent to the first region, and enlarge and display a part of the lower-limb image including the division boundary line on the second region. Thereby, it is possible to minimize work for image enlargement and repetitive movement in reading a computed tomography image and to reduce the reading time.

Abstract: The present invention relates to a metal recovery reactor and a metal recovery system. The metal recovery device according to the present invention comprises an electrolytic cell which receives a solution containing metal ions from the outside, and which reduces and precipitates the metal ions of the solution on the surface of a cathode when the solution is supplied to a reaction space formed between an anode and the cathode surrounding the anode. The cathode comprises a main cathode and an auxiliary cathode positioned inside the main cathode and capable of being detached and attached from the main cathode.

Abstract: A method of fabricating an image sensor is provided. The method may include preparing a substrate with first to third pixel regions, coating a first color filter layer on the substrate, sequentially forming a first sacrificial layer and a first protection layer to cover the first color filter layer, forming a first photoresist pattern on the first protection layer to be overlapped with the first pixel region, performing a first dry etching process using the first photoresist pattern as an etch mask to the first sacrificial layer and the first protection layer to form a first color filter, a first sacrificial pattern, and a first protection pattern sequentially stacked on the first pixel region, and selectively removing the first sacrificial pattern to separate the first protection pattern from the first color filter.

Abstract: A method of fabricating an image sensor is provided. The method may include preparing a substrate with first to third pixel regions, coating a first color filter layer on the substrate, sequentially forming a first sacrificial layer and a first protection layer to cover the first color filter layer, forming a first photoresist pattern on the first protection layer to be overlapped with the first pixel region, performing a first dry etching process using the first photoresist pattern as an etch mask to the first sacrificial layer and the first protection layer to form a first color filter, a first sacrificial pattern, and a first protection pattern sequentially stacked on the first pixel region, and selectively removing the first sacrificial pattern to separate the first protection pattern from the first color filter.

Abstract: An electrowinning apparatus and method are provided. The electrowinning apparatus includes: an electrolytic cell including a body portion which has an inlet for introducing an aqueous solution containing metal ions into the body portion and a conical portion which is gradually reduced in diameter from top to bottom and disposed under the body portion; a ring-shaped cathode coupled to an inner circumferential surface of the body portion of the electrolytic cell and having an entrance hole which extends from an outer circumferential surface of the cathode through to an inner circumferential surface of the cathode and is connected to the inlet of the electrolytic cell; and a hollow anode having an upper end disposed outside the electrolytic cell and inserted into the cathode. In the electrowinning method, a metal can be recovered from an aqueous solution containing a low concentration of metal ions using the above cyclone-shaped electrowinning apparatus.

Abstract: A photoresist composition for fabricating a probe array is provided. The photoresist composition includes a photoacid generator having an onium salt and an i-line reactive sensitizer.

Abstract: A medical image display apparatus and method, which divide a screen region into a first region whose length is relatively greater than a width thereof and on which an entire lower-limb image and a division boundary line dividing the lower-limb image in a widthwise direction, and a second region adjacent to the first region, and enlarge and display a part of the lower-limb image including the division boundary line on the second region. Thereby, it is possible to minimize work for image enlargement and repetitive movement in reading a computed tomography image and to reduce the reading time.

Abstract: The present invention relates to a segmentation method and apparatus of a medical image. The segmentation method of a medical image according to an example of the present invention includes the steps of: extracting information about a position of a pointer according to a user input from a slice medical image displayed on a screen; determining a segmentation region including the position of the pointer, based on information about the slice medical image related to the extracted information about the position of the pointer; preliminarily displaying the determined segmentation region in the slice medical image; and when the preliminarily displayed segmentation region is affirmed by a user, determining the affirmed segmentation region as a lesion diagnosis region for the slice medical image.