Patents by Inventor Soon-Ho Yon

Soon-Ho Yon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma etching apparatus
    Publication number: 20050061447
    Abstract: A plasma etch apparatus is disclosed. The plasma etch apparatus includes an electrostatic chuck for loading a wafer; an insulation portion surrounding the electrostatic chuck; and a focus ring disposed on the electrostatic chuck and the insulation portion. The focus ring has a concave-convex configuration.
    Type: Application
    Filed: September 20, 2004
    Publication date: March 24, 2005
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Yong-Dae Kim, Soon-Ho Yon, Do-Hyeong Kim, Doo-Won Lee