Patents by Inventor Soon-Hwan So

Soon-Hwan So has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240045339
    Abstract: A photomask includes a first light-transmitting portion including first and second main patterns spaced apart from each other in a first direction, a second light-transmitting portion having a light transmittance lower than a light transmittance of the first light-transmitting portion and including a first auxiliary pattern disposed between the first and second main patterns and extending in a second direction crossing the first direction, a second auxiliary pattern spaced apart from the first auxiliary pattern in the first direction with the first main pattern interposed therebetween and surrounding the first main pattern, and a third auxiliary pattern spaced apart from the first auxiliary pattern in the first direction with the second main pattern interposed therebetween and surrounding the second main pattern, and a light shielding portion surrounding the first and second light-transmitting portions.
    Type: Application
    Filed: May 22, 2023
    Publication date: February 8, 2024
    Inventors: Soon-Hwan So, Tae Joon Kim, Wonseon Yu, Bong_Yeon Kim, Sung-Woo Cho