Abstract: Provided is a plasma reactor including a reactor body having a gas inlet at a side thereof, a gas outlet at another side thereof, and an annular loop space therein, a magnetic core provided in a shape surrounding a portion of the reactor body, and wound with a primary coil for receiving power from a power unit, so as to generate plasma by exciting a gas in the annular loop space, and a control unit for determining whether the plasma is in an off state, by comparing, to a reference value, an electrical parameter related to an output of the primary coil.

Abstract: A remote plasma generator includes a body, a driver, and a protection tube. The body includes a gas injection port, a plasma exhaust port, and a plasma generation pipe through which discharge gas or plasma flow. The driver is coupled to the body and generates a magnetic field and plasma in the body. The protection tube is at an inner side of the plasma generation pipe to protect the plasma generation pipe from plasma.

Abstract: A remote plasma generator includes a body, a driver, and a protection tube. The body includes a gas injection port, a plasma exhaust port, and a plasma generation pipe through which discharge gas or plasma flow. The driver is coupled to the body and generates a magnetic field and plasma in the body. The protection tube is at an inner side of the plasma generation pipe to protect the plasma generation pipe from plasma.

Abstract: There are provided a substrate transferring apparatus for continuously loading/unloading a plurality of substrates in and from a process chamber to reduce time spent on transferring the substrates and to improve productivity and a substrate processing system using the same. The substrate transfer apparatus is installed in the transfer chamber and transfers substrates between first and second process chambers which is positioned lateral sides of the transfer chamber and a load rock chamber. The substrate transfer apparatus includes a driving unit to supply a rotational force, a spindle connected to the driving unit, first swivel plate arms to load/unload substrate to/from first process chamber, and second swivel plate arms to load/unload substrate to/from second process chamber. Since substrates before and after being processed are rapidly exchanged during the simultaneous or continuous process of plural substrates, processing rate increases and overall productivity can be increased.

Abstract: An inductive plasma chamber of the present invention comprises a plurality of discharge tube bridges connected between a discharge tube head and a process chamber. The discharge tube head is disc shaped and a cylindrical gas inlet which a gas is injected is disposed in its center. A susceptor on which a workpiece is placed is disposed inside a process chamber and a flange of upper certain area has an inclined surface which is upward centrally inclined. The discharge tube bridge is provided with at least one ferrite core, and the ferrite core has a winding connected to a power supply source. When a process gas is injected via the gas inlet and a RF power from the power supply source is supplied with a winding, the electromotive force is transmitted inside the discharge tube head, the discharge bridge and the process chamber so that the plasma discharge is occurred in the plasma chamber.

Abstract: Disclosed is an organic/inorganic composite porous film comprising: (a) a porous substrate having pores; and (b) an active layer formed by coating a surface of the substrate or a part of the pores in the substrate with a mixture of inorganic particles and a binder polymer, wherein the inorganic particles in the active layer are interconnected among themselves and are fixed by the binder polymer, and interstitial volumes among the inorganic particles form a pore structure. A method for manufacturing the same film and an electrochemical device including the same film are also disclosed. An electrochemical device comprising the organic/inorganic composite porous film shows improved safety and quality, simultaneously.

Abstract: A capacitively coupled plasma reactor includes a plasma reactor, a capacitive coupling electrode assembly including a plurality of capacitive coupling electrodes to induce plasma discharge inside the plasma reactor, a main power supply source to supply radio-frequency power, and a distribution circuit to receive the radio-frequency power supplied from the main power supply source and to distribute the received radio-frequency power to the plurality of capacitive coupling electrodes.

Abstract: A plasma source with discharge inducing bridges and a plasma processing system using the same. The plasma source may be constructed with a number of discharge inducing bridges, each discharge inducing bridge containing a magnetic core with a primary winding of a transformer. The discharge inducing bridges are positioned so as to face a susceptor. Each discharge inducing bridge is a hollow tube. When the electrical current of the primary winding of the transformer is driven, magnetic flux is induced to the magnetic core, so that inductive coupled plasma is formed around the discharge inducing bridges, and a plasma discharge is evenly induced horizontally/vertically along the discharge inducing bridges, so that uniform large-area high-density plasma is generated.

Abstract: A multi-workpiece processing chamber according to the present invention comprises a chamber housing which forms at least two internal processing spaces therein; at least one partition member which is provided in the chamber housing and partitions the chamber housing into at least two internal processing spaces; and the respective internal processing spaces being coupled with the partition member and having a symmetric shape to generate a processing reaction uniformly. The multi-workpiece processing chamber according to the present invention has internal processing spaces that have a symmetric shape by being coupled with a partition member. Thus, a processing reaction uniformly occurs across the internal processing areas and reproducibility and uniformity of a workpiece processing process may improve.

Abstract: A capacitively coupled plasma reactor includes a plasma reactor, a capacitive coupling electrode assembly including a plurality of capacitive coupling electrodes to induce plasma discharge inside the plasma reactor, a main power supply source to supply radio-frequency power, and a distribution circuit to receive the radio-frequency power supplied from the main power supply source and to distribute the received radio-frequency power to the plurality of capacitive coupling electrodes.

Abstract: A system for driving a multi-lamp, and more particularly to, a system for driving a multi-lamp for driving a parallel arrangement of a plurality of discharge lamps and a method of driving a plurality of discharge lamps and a method thereof.

Abstract: A system for driving a multi-lamp, and more particularly to, a system for driving a multi-lamp for driving a parallel arrangement of a plurality of discharge lamps and a method of driving a plurality of discharge lamps and a method thereof.

Abstract: A multi-chamber plasma process system includes a plurality of process chambers, each of which has an inductively coupled plasma generator. The inductively coupled plasma generator is electrically connected to a main power supply through a first impedance matcher. The first impedance matcher has at least one variable inductor. Ignition electrodes of the inductively coupled plasma generators are connected in parallel with an ignition power supply configured as a variable transformer. The variable inductor of the first impedance matcher and the variable transformer of the ignition power supply are controlled by a controller. Each process chamber has a plasma density regulator. Power supply systems, including an ignition power source, a radio frequency (RF) power source, an impedance matcher, etc. can be effectively integrated. As a result, it is possible to decrease the area of facilities and the cost of the system, and to individually control the plasma density of each process chamber.

Abstract: A multi-chamber plasma process system includes a plurality of process chambers, each of which has an inductively coupled plasma generator. The inductively coupled plasma generator is electrically connected to a main power supply through a first impedance matcher. The first impedance matcher has at least one variable inductor. Ignition electrodes of the inductively coupled plasma generators are connected in parallel with an ignition power supply configured as a variable transformer. The variable inductor of the first impedance matcher and the variable transformer of the ignition power supply are controlled by a controller. Each process chamber has a plasma density regulator. Power supply systems, including an ignition power source, a radio frequency (RF) power source, an impedance matcher, etc. can be effectively integrated. As a result, it is possible to decrease the area of facilities and the cost of the system, and to individually control the plasma density of each process chamber.

Abstract: A plasma source with discharge inducing bridges and a plasma processing system using the same. The plasma source may be constructed with a number of discharge inducing bridges, each discharge inducing bridge containing a magnetic core with a primary winding of a transformer. The discharge inducing bridges are positioned so as to face a susceptor. Each discharge inducing bridge is a hollow tube. When the electrical current of the primary winding of the transformer is driven, magnetic flux is induced to the magnetic core, so that inductive coupled plasma is formed around the discharge inducing bridges, and a plasma discharge is evenly induced horizontally/vertically along the discharge inducing bridges, so that uniform large-area high-density plasma is generated.

Abstract: An inductive plasma chamber of the present invention comprises a plurality of discharge tube bridges connected between a discharge tube head and a process chamber. The discharge tube head is disc shaped and a cylindrical gas inlet which a gas is injected is disposed in its center. A susceptor on which a workpiece is placed is disposed inside a process chamber and a flange of upper certain area has an inclined surface which is upward centrally inclined. The discharge tube bridge is provided with at least one ferrite core, and the ferrite core has a winding connected to a power supply source. When a process gas is injected via the gas inlet and a RF power from the power supply source is supplied with a winding, the electromotive force is transmitted inside the discharge tube head, the discharge bridge and the process chamber so that the plasma discharge is occurred in the plasma chamber.