Abstract: The present invention relates to a method for manufacturing a secondary battery and a pre-degassing device for manufacturing a secondary battery.

Abstract: The quantum dot comprises a ligand which is a copolymer comprising a first repeating unit comprising at least one or more hole transporting functional groups and a second repeating unit comprising at least one or more photocrosslinking functional groups.

Abstract: A process chamber of semiconductor fabrication equipment includes a vessel in which a process gas is supplied, an upper electrode installed in an upper part of the vessel and to which power is applied, a shield ring extending alongside the upper electrode for insulating the upper electrode, a lower electrode disposed under the upper electrode as spaced from the upper electrode and to which power is applied to convert the process gas to plasma, an electrostatic chuck sitauted on the lower electrode and on which a wafer is received, and an insulation ring unit extending alongside the lower electrode for insulating the lower electrode. The shield ring and the insulation ring unit have a protection layer as an outer coating to prevent the shield ring and the insulation ring unit from being etched.

Abstract: A plasma etching apparatus includes a process chamber, an upper electrode and a lower electrode disposed vertically opposite to each other within the process chamber, an electrostatic chuck disposed on the lower electrode, a focus ring surrounding the electrostatic chuck, and a shield ring covering an outer circumferential part of the upper electrode. The shield ring has a guide part extending vertically downwardly away from the bottom of the upper electrode and terminating proximate an uppermost part of the focus ring, and a plurality of exhaust holes extending radially therethrough. The shield ring prevents polymer from adhering to relatively cool parts thereof, causes the plasma to flow substantially downwardly so as not to etch the shield ring or the focus ring and facilitates the discharge of by-products from the process chamber.