Patents by Inventor Soon Shin Kim

Soon Shin Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • QUANTUM DOTS, DISPLAY APPARATUS INCLUDING THE SAME, AND METHOD FOR MANUFACTURING THE DISPLAY APPARATUS
    Publication number: 20240114709
    Abstract: The quantum dot comprises a ligand which is a copolymer comprising a first repeating unit comprising at least one or more hole transporting functional groups and a second repeating unit comprising at least one or more photocrosslinking functional groups.
    Type: Application
    Filed: September 22, 2020
    Publication date: April 4, 2024
    Applicants: LG DISPLAY CO., LTD., KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION
    Inventors: Joona BANG, Ki Seok CHANG, Jeong Min MOON, Soon Shin JUNG, Dong Hoon CHOI, Hyung Jong KIM, Jae Wan KO
  • Photoresist composition
    Patent number: 8530135
    Abstract: The present invention provides a photoresist composition comprising a resin having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid, an acid generator and a compound represented by the formula (I): wherein Z1 represents a C7-C20 alkylene group, a C3-C20 divalent saturated cyclic group or a divalent group formed by combining at least one C1-C6 alkylene group with at least one C3-C20 divalent saturated cyclic group.
    Type: Grant
    Filed: September 22, 2010
    Date of Patent: September 10, 2013
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Satoshi Yamaguchi, Soon Shin Kim, Isao Yoshida, Koji Ichikawa
  • Chemically amplified positive resist composition
    Patent number: 7998656
    Abstract: The present invention provides a chemically amplified positive composition comprising: a resin comprising a structural unit represented by the formula (I): wherein R1 represents a hydrogen atom, a halogen atom, a C1-C4 alkyl group or a C1-C4 perfluoroalkyl group, Z represents a single bond or —(CH2)k—CO—X4—, k represents an integer of 1 to 4, X1, X2, X3 and X4 each independently represents an oxygen atom or a sulfur atom, m represents an integer of 1 to 3 and n represents an integer of 0 to 3, and an acid generator.
    Type: Grant
    Filed: August 5, 2009
    Date of Patent: August 16, 2011
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Masahiko Shimada, Kazuhiko Hashimoto, Satoshi Yamaguchi, Soon Shin Kim, Yoshiyuki Takata, Takashi Hiraoka
  • PHOTORESIST COMPOSITION
    Publication number: 20110076617
    Abstract: The present invention provides a photoresist composition comprising a resin having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid, an acid generator and a compound represented by the formula (I): wherein Z1 represents a C7-C20 alkylene group, a C3-C20 divalent saturated cyclic group or a divalent group formed by combining at least one C1-C6 alkylene group with at least one C3-C20 divalent saturated cyclic group.
    Type: Application
    Filed: September 22, 2010
    Publication date: March 31, 2011
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Satoshi Yamaguchi, Soon Shin Kim, Isao Yoshida, Koji Ichikawa
  • CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION
    Publication number: 20100035180
    Abstract: The present invention provides a chemically amplified positive composition comprising: a resin comprising a structural unit represented by the formula (I): wherein R1 represents a hydrogen atom, a halogen atom, a C1-C4 alkyl group or a C1-C4 perfluoroalkyl group, Z represents a single bond or —(CH2)k—CO—X4—, k represents an integer of 1 to 4, X1, X2, X3 and X4 each independently represents an oxygen atom or a sulfur atom, m represents an integer of 1 to 3 and n represents an integer of 0 to 3, and an acid generator.
    Type: Application
    Filed: August 5, 2009
    Publication date: February 11, 2010
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Masahiko Shimada, Kazuhiko Hashimoto, Satoshi Yamaguchi, Soon Shin Kim, Yoshiyuki Takata, Takashi Hiraoka