Abstract: A relative positioning module applies a real-time kinematic (RTK) algorithm to provide relative position vector between reference receiver and rover receiver and to provide recovery data. At the rover, the precise positioning module applies the relative position vector, the aiding data, recovery data, and correction data as inputs, constraints, or both for convergence of one or more predictive filters on wide-lane and narrow-lane ambiguities (e.g., in accordance with a precise positioning algorithm). At the rover, the precise positioning module or the navigation positioning estimator estimates a precise position of the rover based on the converged or fixed narrow-lane ambiguities and wide-lane ambiguities.

Abstract: A real-time kinematic (RTK) filter uses the backup data to estimate a relative position vector between the mobile receiver at the first measurement time and the mobile receiver at the second measurement time and to provide recovery data associated with a satellite-differenced double-difference estimation for the mobile receiver between the first measurement time and the second measurement time. A navigation positioning estimator can apply the relative position vector, the backup data, the recovery data from the RTK filter, and received correction data with precise clock and orbit information on the satellite signals, as inputs, constraints, or both for convergence or resolution of wide-lane and narrow-lane ambiguities, and determination of a precise position, in accordance with a precise positioning algorithm.

Abstract: A relative positioning module applies a real-time kinematic (RTK) algorithm to provide relative position vector between reference receiver and rover receiver and to provide recovery data. At the rover, the precise positioning module applies the relative position vector, the aiding data, recovery data, and correction data as inputs, constraints, or both for convergence of one or more predictive filters on wide-lane and narrow-lane ambiguities (e.g., in accordance with a precise positioning algorithm). At the rover, the precise positioning module or the navigation positioning estimator estimates a precise position of the rover based on the converged or fixed narrow-lane ambiguities and wide-lane ambiguities.

Abstract: A real-time kinematic (RTK) filter uses the backup data to estimate a relative position vector between the mobile receiver at the first measurement time and the mobile receiver at the second measurement time and to provide recovery data associated with a satellite-differenced double-difference estimation for the mobile receiver between the first measurement time and the second measurement time. A navigation positioning estimator can apply the relative position vector, the backup data, the recovery data from the RTK filter, and received correction data with precise clock and orbit information on the satellite signals, as inputs, constraints, or both for convergence or resolution of wide-lane and narrow-lane ambiguities, and determination of a precise position, in accordance with a precise positioning algorithm.

Abstract: In a method of manufacturing a semiconductor device, a pad including at least one insulating interlayer and at least one conductive wiring may be formed in a pad area of a substrate. At least one wiring may be formed adjacent to the conductive wiring. At least one insulation layer may be formed adjacent to the insulating interlayer. At least one crack preventing structure may be formed in the insulation layer. The crack preventing structure may continuously extend in the insulation layer and portions of the insulation layer may also be continuous. When a semiconductor device includes at least one crack preventing structure disposed adjacent to a pad, a degradation of the semiconductor chip caused by an external impact and/or a stress may be efficiently prevented by the crack preventing structure.

Abstract: A method of measuring a dimension of a measurement pattern by using a scanning electron microscope is provided. The method of measuring the dimension of the pattern includes: (a) moving to a correction pattern that is adjacent to the measurement pattern. The correction pattern comprises circular patterns to correct focus and/or stigmatism of the scanning electron microscope with respect to the correction pattern. The method further includes (b) measuring the dimension of the measurement pattern under measurement conditions to which the corrected focus and/or the stigmatism are reflected.