Patents by Inventor Sophia Maumovna Ratenberg

Sophia Maumovna Ratenberg has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Two step anneal for controlling resistor tolerance
    Patent number: 6255185
    Abstract: A method of controlling the resistance and improving the low temperature tolerance of a polysilicon resistor is provided. The method of the present invention employs a second annealing step after one of the high temperature (about 800° C. or above) device activation anneals. That is, the second annealing step can be used after source/drain activation, emitter activation or silicide formation. In accordance with the present invention, if a low temperature second annealing step below about 800° C. is performed after the high temperature device activation anneal, the resistance of the resistor increases, whereas when the second annealing temperature is higher than about 800° C., the resistance of the resistor decreases.
    Type: Grant
    Filed: May 19, 1999
    Date of Patent: July 3, 2001
    Assignee: International Business Machines Corporation
    Inventors: Douglas Duane Coolbaugh, Glenn Robert Miller, Sophia Maumovna Ratenberg