Abstract: The invention relates to a charge-coupled device. Such devices comprise at least one insulated conducting gate (3) connecting two semiconductor zones. According to the invention, each insulated conducting gate (3) has a width progressively increasing from the first semiconductor zone (1) to the second semiconductor zone (2). The width of each gate (3) is sufficiently narrow for the potential well created by the application of a voltage V to the gate to have a depth increasing progressively from the first zone (1) to the second zone (2), thus enabling the charges to be driven away. The invention applies to any type of charge-coupled device and particularly to photodiodes.

Abstract: The disclosure relates to charge-coupled devices taking the form of shift registers and, more specifically, to those working in the MPP (Multi-Pinned Phase) mode, i.e. with high negative polarisation of the electrodes during the phases of waiting or of integration of integration of the photosensitive charges. These registers use a potential barrier created by a P type compensating implantation in a zone 16 located beneath a first electrode of each stage of the register. This barrier separates the stages from one another. To increase the charge storage capacity during the storage phase and the charge transfer capacity during the transfer, it is provided that the compensating implantation of the zone 16 will extend beneath only one part (and not the totality) of the first electrode of each stage of the register. Application to photosensitive image sensors, analog delay lines, charge-coupled analog memories, working in MPP mode during the waiting phases to limit losses of information due to the dark current.

Abstract: A protection circuit against the electrostatic discharges that could appear at the terminals of a circuit, wherein said protection circuit comprises a first transistor made in a well whose potential is a floating potential and enabling the value of the discharge voltage to be limited to a value equal to minus the value of the threshold voltage of said first transistor and a second transistor made in a well whose potential is a floating potential and enabling the value of the discharge voltage to be limited to a value equal to the value of the threshold voltage of said second transistor. The disclosure can be applied to MOS technology integrated circuits.