Patents by Inventor Souichi Katagiri

Souichi Katagiri has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11894211
    Abstract: The invention provides an electron beam apparatus that reduces a time required for an electron gun chamber to which a sputter ion pump and a non-evaporable getter pump are connected to reach an extreme high vacuum state. The electron beam apparatus includes an electron gun configured to emit an electron beam and the electron gun chamber to which the sputter ion pump and the non-evaporable getter pump are connected. The electron beam apparatus further includes a gas supply unit configured to supply at least one of hydrogen, oxygen, carbon monoxide, and carbon dioxide to the electron gun chamber.
    Type: Grant
    Filed: July 2, 2019
    Date of Patent: February 6, 2024
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Erina Kawamoto, Soichiro Matsunaga, Souichi Katagiri, Keigo Kasuya, Takashi Doi, Tetsuya Sawahata, Minoru Yamazaki
  • Patent number: 11508544
    Abstract: To stabilize an emitted electron beam, a thermoelectric field emission electron source includes: an electron source having a needle shape; a metal wire to which the electron source is fixed and configured to heat the electron source; a stem fixed to an insulator and configured to energize the metal wire; a first electrode having a first opening portion and arranged such that a tip of the electron source protrudes from the first opening portion; a second electrode having a second opening portion; and an insulating body configured to position the first electrode and the second electrode such that a central axis of the first opening portion and a central axis of the second opening portion coincide with each other, and to provide electrical insulation between the first and second electrodes, so as to provide a structure that reduces an amount of gas released when the first electrode is heated.
    Type: Grant
    Filed: September 25, 2018
    Date of Patent: November 22, 2022
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Soichiro Matsunaga, Souichi Katagiri, Keigo Kasuya, Aki Takei, Hajime Kawano, Takashi Doi
  • Publication number: 20220351934
    Abstract: The invention provides an electron beam apparatus that reduces a time required for an electron gun chamber to which a sputter ion pump and a non-evaporable getter pump are connected to reach an extreme high vacuum state. The electron beam apparatus includes an electron gun configured to emit an electron beam and the electron gun chamber to which the sputter ion pump and the non-evaporable getter pump are connected. The electron beam apparatus further includes a gas supply unit configured to supply at least one of hydrogen, oxygen, carbon monoxide, and carbon dioxide to the electron gun chamber.
    Type: Application
    Filed: July 2, 2019
    Publication date: November 3, 2022
    Applicant: Hitachi High-Tech Corporation
    Inventors: Erina KAWAMOTO, Soichiro MATSUNAGA, Souichi KATAGIRI, Keigo KASUYA, Takashi DOI, Tetsuya SAWAHATA, Minoru YAMAZAKI
  • Publication number: 20220199349
    Abstract: A large current electron beam is stably emitted from an electron gun of a charged particle beam device. The electron gun of the charged particle beam device includes: a SE tip 202; a suppressor 303 disposed rearward of a distal end of the SE tip; a cup-shaped extraction electrode 204 including a bottom surface and a cylindrical portion and enclosing the SE tip and the suppressor; and an insulator 208 holding the suppressor and the extraction electrode. A shield electrode 301 of a conductive metal having a cylindrical portion 302 is provided between the suppressor and the cylindrical portion of the extraction electrode. A voltage lower than a voltage of the SE tip is applied to the shield electrode.
    Type: Application
    Filed: April 18, 2019
    Publication date: June 23, 2022
    Applicant: Hitachi High-Tech Corporation
    Inventors: Keigo KASUYA, Akira IKEGAMI, Kazuhiro HONDA, Masahiro FUKUTA, Takashi DOI, Souichi KATAGIRI, Aki TAKEI, Soichiro MATSUNAGA
  • Publication number: 20220037107
    Abstract: To stabilize an amount of electron beam emitted from a thermoelectric field emission electron source. A thermoelectric field emission electron source includes: an electron source 301 having a needle shape; a metal wire 302 to which the electron source is fixed and configured to heat the electron source; a stem 303 fixed to an insulator and configured to energize the metal wire; a first electrode 304 having a first opening portion 304a and arranged such that a tip of the electron source protrudes from the first opening portion; a second electrode 306 having a second opening portion 306a; and an insulating body 307 configured to position the first electrode and the second electrode such that a central axis of the first opening portion and a central axis of the second opening portion coincide with each other, and provide electrical insulation between the first electrode and the second electrode, so as to provide a structure in which an amount of gas released when the first electrode is heated is reduced.
    Type: Application
    Filed: September 25, 2018
    Publication date: February 3, 2022
    Inventors: Soichiro Matsunaga, Souichi Katagiri, Keigo Kasuya, Aki Takei, Hajime Kawano, Takashi Doi
  • Patent number: 11227740
    Abstract: In order to provide an electron gun capable of maintaining a small spot diameter of a beam converged on a sample even when a probe current applied to the sample is increased, a magnetic field generation source 301 is provided with respect to an electron gun including: an electron source 101; an extraction electrode 102 configured to extract electrons from the electron source 101; an acceleration electrode 103 configured to accelerate the electrons extracted from the electron source 101; and a first coil 104 and a first magnetic path 201 having an opening on an electron source side, the first coil 104 and the first magnetic path 201 forming a control lens configured to converge an electron beam emitted from the acceleration electrode 103. The magnetic field generation source is provided for canceling a magnetic field, at an installation position of the electron source 101, generated by the first coil 104 and the first magnetic path 201.
    Type: Grant
    Filed: September 7, 2017
    Date of Patent: January 18, 2022
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Soichiro Matsunaga, Yasunari Sohda, Souichi Katagiri, Makoto Sakakibara, Hajime Kawano, Takashi Doi
  • Patent number: 10903037
    Abstract: An object of the invention is to stably supply an electron beam from an electron gun, that is, to prevent variation in intensity of the electron beam. The invention provides a charged particle beam device that includes an electron gun having an electron source, an extraction electrode to which a voltage used for extracting electrons from the electron source is applied, and an acceleration electrode to which a voltage used for accelerating the electrons extracted from the electron source is applied, a first heating unit that heats the extraction electrode, and a second heating unit that heats the acceleration electrode.
    Type: Grant
    Filed: September 17, 2019
    Date of Patent: January 26, 2021
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Keigo Kasuya, Shuhei Ishikawa, Kenji Tanimoto, Hajime Kawano, Hideo Todokoro, Souichi Katagiri, Takashi Doi, Soichiro Matsunaga
  • Patent number: 10804084
    Abstract: In a vacuum apparatus including an ultrahigh vacuum evacuation pump, the ultrahigh vacuum evacuation pump is provided with a rod-shaped cathode including a non-evaporable getter alloy, a cylindrical anode disposed so as to surround the cathode, and a coil or a ring-shaped permanent magnet disposed so as to sandwich upper and lower openings of the cylindrical anode and surround the rod-shaped cathode. As a result, it is possible to reduce the size and weight of the ultrahigh vacuum evacuation pump and to dispose the vacuum evacuation pump at a desired location in the vacuum apparatus.
    Type: Grant
    Filed: September 16, 2015
    Date of Patent: October 13, 2020
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Souichi Katagiri, Keigo Kasuya
  • Publication number: 20200266020
    Abstract: In order to provide an electron gun capable of maintaining a small spot diameter of a beam converged on a sample even when a probe current applied to the sample is increased, a magnetic field generation source 301 is provided with respect to an electron gun including: an electron source 101; an extraction electrode 102 configured to extract electrons from the electron source 101; an acceleration electrode 103 configured to accelerate the electrons extracted from the electron source 101; and a first coil 104 and a first magnetic path 201 having an opening on an electron source side, the first coil 104 and the first magnetic path 201 forming a control lens configured to converge an electron beam emitted from the acceleration electrode 103. The magnetic field generation source is provided for canceling a magnetic field, at an installation position of the electron source 101, generated by the first coil 104 and the first magnetic path 201.
    Type: Application
    Filed: September 7, 2017
    Publication date: August 20, 2020
    Inventors: Soichiro MATSUNAGA, Yasunari SOHDA, Souichi KATAGIRI, Makoto SAKAKIBARA, Hajime KAWANO, Takashi DOI
  • Publication number: 20200090897
    Abstract: An object of the invention is to stably supply an electron beam from an electron gun, that is, to prevent variation in intensity of the electron beam. The invention provides a charged particle beam device that includes an electron gun having an electron source, an extraction electrode to which a voltage used for extracting electrons from the electron source is applied, and an acceleration electrode to which a voltage used for accelerating the electrons extracted from the electron source is applied, a first heating unit that heats the extraction electrode, and a second heating unit that heats the acceleration electrode.
    Type: Application
    Filed: September 17, 2019
    Publication date: March 19, 2020
    Inventors: Keigo KASUYA, Shuhei ISHIKAWA, Kenji TANIMOTO, Hajime KAWANO, Hideo TODOKORO, Souichi KATAGIRI, Takashi DOI, Soichiro MATSUNAGA
  • Publication number: 20190198284
    Abstract: Provided is a high-brightness, high-current electron source including a wire-like member. The wire-like member has an electron emission plane at the tip of the wire-like member. The electron emission plane has a projectingly curved surface. At least the surface of the electron emission plane is formed of an amorphous material.
    Type: Application
    Filed: September 6, 2016
    Publication date: June 27, 2019
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Soichiro MATSUNAGA, Yasunari SOHDA, Souichi KATAGIRI, Hajime KAWANO, Takashi DOI
  • Publication number: 20180254173
    Abstract: In a vacuum apparatus including an ultrahigh vacuum evacuation pump, the ultrahigh vacuum evacuation pump is provided with a rod-shaped cathode including a non-evaporable getter alloy, a cylindrical anode disposed so as to surround the cathode, and a coil or a ring-shaped permanent magnet disposed so as to sandwich upper and lower openings of the cylindrical anode and surround the rod-shaped cathode. As a result, it is possible to reduce the size and weight of the ultrahigh vacuum evacuation pump and to dispose the vacuum evacuation pump at a desired location in the vacuum apparatus.
    Type: Application
    Filed: September 16, 2015
    Publication date: September 6, 2018
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Souichi KATAGIRI, Keigo KASUYA
  • Patent number: 9837243
    Abstract: An ion pump and a charged particle beam device each includes two opposite flat-plate cathodes, an anode with a cylindrical shape having openings that face the respective flat-plate cathodes, a voltage application unit configured to apply a potential higher than potentials of the flat-plate cathodes to the anode, a magnetic field application unit configured to apply a magnetic field along an axial direction of the cylindrical shape of the anode, and a cathode bar arranged within the anode. The surface of the cathode bar is formed with a material that forms a non-evaporative getter alloy film on the anode or the flat-plate cathodes.
    Type: Grant
    Filed: February 4, 2016
    Date of Patent: December 5, 2017
    Assignee: HITACHI, LTD.
    Inventors: Keigo Kasuya, Takeshi Kawasaki, Takashi Ohshima, Souichi Katagiri
  • Publication number: 20160233050
    Abstract: An ion pump and a charged particle beam device each includes two opposite flat-plate cathodes, an anode with a cylindrical shape having openings that face the respective flat-plate cathodes, a voltage application unit configured to apply a potential higher than potentials of the flat-plate cathodes to the anode, a magnetic field application unit configured to apply a magnetic field along an axial direction of the cylindrical shape of the anode, and a cathode bar arranged within the anode. The surface of the cathode bar is formed with a material that forms a non-evaporative getter alloy film on the anode or the flat-plate cathodes.
    Type: Application
    Filed: February 4, 2016
    Publication date: August 11, 2016
    Inventors: Keigo KASUYA, Takeshi KAWASAKI, Takashi OHSHIMA, Souichi KATAGIRI
  • Patent number: 9006654
    Abstract: An embodiment is to provide a technique that continuously applies a certain amount of an electron beam to a sample by selecting a beam applied to the sample from an electron beam emitted from an electron source in a scanning electron microscope. A charged particle apparatus is configured, including: a mechanism that detects the distribution of electric current strength with respect to the emitting direction of an electron beam emitted from an electron source; a functionality that predicts a fluctuation of an electric current applied to a sample by predicting the distribution of the electric current based on the detected result; a functionality that determines a position at which a beam applied to the sample is acquired based on the predicted result; and a mechanism that controls a position at which a probe beam is acquired based on the determined result.
    Type: Grant
    Filed: July 30, 2014
    Date of Patent: April 14, 2015
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Soichiro Matsunaga, Souichi Katagiri, Hajime Kawano
  • Publication number: 20150034835
    Abstract: An embodiment is to provide a technique that continuously applies a certain amount of an electron beam to a sample by selecting a beam applied to the sample from an electron beam emitted from an electron source in a scanning electron microscope. A charged particle apparatus is configured, including: a mechanism that detects the distribution of electric current strength with respect to the emitting direction of an electron beam emitted from an electron source; a functionality that predicts a fluctuation of an electric current applied to a sample by predicting the distribution of the electric current based on the detected result; a functionality that determines a position at which a beam applied to the sample is acquired based on the predicted result; and a mechanism that controls a position at which a probe beam is acquired based on the determined result.
    Type: Application
    Filed: July 30, 2014
    Publication date: February 5, 2015
    Inventors: Soichiro Matsunaga, Souichi Katagiri, Hajime Kawano
  • Patent number: 8866371
    Abstract: Increasing the volume or weight of zirconia which is a diffusion and supply source, to extend the life of a field-emission type electron source causes a problem that the diffusion and supply source itself or a tungsten needle is easily subjected to damage. As another problem, although it is considered to form the diffusion and supply source using a thin film to avoid the above-described problem, it is difficult to stably obtain practical life exceeding 8,000 hours. It has been found that practical life exceeding 8,000 hours is stably obtained by providing a field-emission type electron source that has no chips or cracks in a diffusion and supply source and that can extend life with a little bit of an increase in the amount of the diffusion and supply source.
    Type: Grant
    Filed: September 24, 2012
    Date of Patent: October 21, 2014
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Souichi Katagiri, Takashi Ohshima, Sukehiro Ito
  • Publication number: 20140197725
    Abstract: Increasing the volume or weight of zirconia which is a diffusion and supply source, to extend the life of a field-emission type electron source causes a problem that the diffusion and supply source itself or a tungsten needle is easily subjected to damage. As another problem, although it is considered to form the diffusion and supply source using a thin film to avoid the above-described problem, it is difficult to stably obtain practical life exceeding 8,000 hours. It has been found that practical life exceeding 8,000 hours is stably obtained by providing a field-emission type electron source that has no chips or cracks in a diffusion and supply source and that can extend life with a little bit of an increase in the amount of the diffusion and supply source.
    Type: Application
    Filed: September 24, 2012
    Publication date: July 17, 2014
    Inventors: Souichi Katagiri, Takashi Ohshima, Sukehiro Ito
  • Patent number: 8772735
    Abstract: A charged particle beam apparatus includes a field emission electron source, electrodes for applying an electric field to the field emission electron source, and a vacuum exhaust unit for keeping the pressure around the field emission electron source at 1×10?8 Pa or less. The apparatus uses electron beams emitted to have an electron-beam-center radiation angle of 1×10?2 sr or less, and uses the electric current thereof, the second order differentiation of which is negative or zero with respect to time, and which reduces at a rate of 10% or less per hour. A heating unit is provided for the field emission electron source, and a detection unit is provided for the electric current of the electron beam. The field emission electron source is repeatedly heated to keep the electric current of the electron beam to be emitted, at a predetermined value or higher.
    Type: Grant
    Filed: November 1, 2012
    Date of Patent: July 8, 2014
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Keigo Kasuya, Takashi Ohshima, Souichi Katagiri, Shigeru Kokubo, Hideo Todokoro
  • Patent number: 8686380
    Abstract: The present invention provides a charged particle beam apparatus that keeps the degree of vacuum in the vicinity of the electron source to ultra-high vacuum such as 10?8 to 10?9 Pa even in the state where electron beams are emitted using a non-evaporable getter pump and is not affected by dropout foreign particles. The present invention includes a vacuum vessel in which a charged particle source (electron source, ion source, etc.) is disposed and a non-evaporable getter pump disposed at a position that does not directly face electron beams and includes a structure that makes the non-evaporable getter pump upward with respect to a horizontal direction to drop out foreign particles into a bottom in a groove, so that the foreign particles dropped out from the non-evaporable getter pump do not face an electron optical system.
    Type: Grant
    Filed: May 28, 2009
    Date of Patent: April 1, 2014
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Souichi Katagiri, Takashi Ohshima, Sho Takami, Makoto Ezumi, Takashi Doi, Yuji Kasai