Patents by Inventor Souichirou Iwasaki

Souichirou Iwasaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8919277
    Abstract: A cylindrical coating nozzle having a flattened end is placed above a coating object being rotated. A coating solution is applied to a surface of the coating object by discharging the coating solution form a nozzle orifice at an end of the coating nozzle while moving the coating nozzle relative to the coating object in a direction intersecting a rotational direction of the coating object. The coating nozzle is formed with an angled notch at a part of the end thereof. A rotation control unit controls the rotation of the coating nozzle in a manner that the notch of the coating nozzle is positioned upstream from a position to feed the coating solution to the coating object being rotated.
    Type: Grant
    Filed: October 7, 2011
    Date of Patent: December 30, 2014
    Assignees: Chugai Ro Co., Ltd, Kabushiki Kaisha Toshiba
    Inventors: Takao Tokumoto, Sadao Natsu, Mitsuhiro Hida, Souichirou Iwasaki, Tsuyoshi Sato, Kenichi Ooshiro
  • Patent number: 8887657
    Abstract: According to one embodiment, a film forming system includes: a stage including a placement surface on which an object to be coated is placed; a rotating mechanism rotating the stage in a rotational direction along the placement surface; an application nozzle discharging a material onto the object placed on the stage for application; a moving mechanism relatively moving the stage and the application nozzle along the placement surface in a cross direction crossing the rotational direction; a controller performing a control to rotate the stage on which the object is placed through the rotating mechanism while relatively moving the stage and application nozzle along the placement surface in the cross direction through the moving mechanism and applying the material to the object on the stage through the application nozzle; and a cleaning apparatus cleaning the application nozzle.
    Type: Grant
    Filed: June 7, 2010
    Date of Patent: November 18, 2014
    Assignees: Kabushiki Kaisha Toshiba, Chugai Ro Co., Ltd.
    Inventors: Kenichi Ooshiro, Tsuyoshi Sato, Takao Tokumoto, Sadao Natsu, Souichirou Iwasaki
  • Publication number: 20120025145
    Abstract: A cylindrical coating nozzle having a flattened end is placed above a coating object being rotated. A coating solution is applied to a surface of the coating object by discharging the coating solution form a nozzle orifice at an end of the coating nozzle while moving the coating nozzle relative to the coating object in a direction intersecting a rotational direction of the coating object. The coating nozzle is formed with an angled notch at a part of the end thereof. A rotation control unit controls the rotation of the coating nozzle in a manner that the notch of the coating nozzle is positioned upstream from a position to feed the coating solution to the coating object being rotated.
    Type: Application
    Filed: October 7, 2011
    Publication date: February 2, 2012
    Applicants: KABUSHIKI KAISHA TOSHIBA, CHUGAI RO CO., LTD.
    Inventors: Takao Tokumoto, Sadao Natsu, Mitsuhiro Hida, Souichirou Iwasaki, Tsuyoshi Sato, Kenichi Ooshiro
  • Publication number: 20100310757
    Abstract: According to one embodiment, a film forming system includes: a stage including a placement surface on which an object to be coated is placed; a rotating mechanism rotating the stage in a rotational direction along the placement surface; an application nozzle discharging a material onto the object placed on the stage for application; a moving mechanism relatively moving the stage and the application nozzle along the placement surface in a cross direction crossing the rotational direction; a controller performing a control to rotate the stage on which the object is placed through the rotating mechanism while relatively moving the stage and application nozzle along the placement surface in the cross direction through the moving mechanism and applying the material to the object on the stage through the application nozzle; and a cleaning apparatus cleaning the application nozzle.
    Type: Application
    Filed: June 7, 2010
    Publication date: December 9, 2010
    Applicants: KABUSHIKI KAISHA TOSHIBA, Chugai Ro Co., Ltd.
    Inventors: Kenichi OOSHIRO, Tsuyoshi Sato, Takao Tokumoto, Sadao Natsu, Souichirou Iwasaki