Patents by Inventor Soulbrain Co., Ltd.

Soulbrain Co., Ltd. has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20130171734
    Abstract: Provided is a reagent composition for measuring moisture content in a lithium secondary battery electrolyte, more particularly, a reagent composition for measuring moisture content in a lithium secondary battery electrolyte, containing imidazole, iodine, sulfur dioxide, and an amide based solvent, so that the reagent composition can suppress side reactions to thereby accurately measure a small amount of moisture content.
    Type: Application
    Filed: December 17, 2012
    Publication date: July 4, 2013
    Applicant: SOULBRAIN CO., LTD.
    Inventor: Soulbrain Co., Ltd.
  • Publication number: 20130168264
    Abstract: Provided are a method for measuring hydrofluoric acid content in a lithium secondary battery electrolyte and an analytical reagent composition used in the same.
    Type: Application
    Filed: December 20, 2012
    Publication date: July 4, 2013
    Applicant: SOULBRAIN CO., LTD.
    Inventor: Soulbrain Co., Ltd.
  • Publication number: 20130157427
    Abstract: The present invention provides an etching composition, comprising a silyl phosphate compound, phosphoric acid and deionized water, and a method for fabricating a semiconductor, which includes an etching process employing the etching composition. The etching composition of the invention shows a high etching selectivity for a nitride film with respect to an oxide film. Thus, when the etching composition of the present invention is used to remove a nitride film, the effective field oxide height (EEH) may be easily controlled by controlling the etch rate of the oxide film. In addition, the deterioration in electrical characteristics caused by damage to an oxide film or etching of the oxide film may be prevented, and particle generation may be prevented, thereby ensuring the stability and reliability of the etching process.
    Type: Application
    Filed: December 7, 2012
    Publication date: June 20, 2013
    Applicants: Soulbrain Co., Ltd., SK hynix Inc.
    Inventors: SK hynix Inc., Soulbrain Co., Ltd.