Abstract: The present disclosure relates to a method for performing an additive manufacturing operation to form a structure by processing a photopolymer resist material. A laser beam is directed at a tunable mask. At least one emergent beam is collected from a plurality of emergent beams emerging from the tunable mask. The at least one emergent beam is collimated to create a collimated beam. Each emergent beam from the tunable mask has a plurality of beamlets of varying or identical intensity, and each beamlet emerges from a unique subsection or region of the tunable mask. The collimated beam is focused into a laser beam which is projected as an image plane onto or within the photopolymer resist material, such that the same optical path length is created between the tunable mask and the focused image plane for all optical frequencies of the focused laser beam.

Abstract: The present disclosure relates to a method for performing an additive manufacturing operation to form a structure by processing a photopolymer resist material. A laser beam is directed at a tunable mask. At least one emergent beam is collected from a plurality of emergent beams emerging from the tunable mask. The at least one emergent beam is collimated to create a collimated beam. Each emergent beam from the tunable mask has a plurality of beam lets of varying or identical intensity, and each beam let emerges from a unique subsection or region of the tunable mask. The collimated beam is focused into a laser beam which is projected as an image plane onto or within the photopolymer resist material, such that the same optical path length is created between the tunable mask and the focused image plane for all optical frequencies of the focused laser beam.

Abstract: Systems, methods, devices, and compositions of matter for 3D printing methods and systems that can be used for rapid nanoscale 3D printing of large and deterministic 3D structures with sub-micrometer features and porosities. The method includes storing or determining a plurality of interspersed features for a three-dimensional (3D) structure to project as a sequence of sparse images on the same plane to generate closely spaced fine features on a polymer resist; and generating, using the sequence of sparse images, a plurality of patterned light sheet on the polymer resist with a temporally-focused femtosecond pulse, the light sheet having patterns.

Abstract: Disclosed herein are systems and methods of use thereof. For example, disclosed herein are systems and methods for printing using superluminescent light. For example, disclosed herein are methods of printing with superluminescent light, the methods comprising: generating a patterned light sheet from superluminescent light, with the proviso that the superluminescent light is not generated by a femtosecond laser; and projecting the patterned light sheet at an image plane onto or within a sample comprising a photosensitive material; thereby simultaneously illuminating a selected portion of the photosensitive material within a layer of the sample corresponding to a selected pattern, thereby causing a simultaneous photoreaction that prints structures in the selected pattern.

Abstract: An exemplary optical projection method and system is disclosed, e.g., femtosecond projection two-photon lithography (FP-TPL) based operation, that applies multiple temporally focused light with reduced density of the projected mask to control over-polymerization defects (e.g., without need to tune the photopolymer composition) when certain aspect ratio of the submicron features are desired.

Abstract: An apparatus is disclosed for performing an additive manufacturing operation to form a structure by processing a photopolymer resist material. The apparatus may incorporate a laser for generating a laser beam, and a tunable mask for receiving the laser beam which has an optically dispersive element. The mask splits the laser beam into a plurality of emergent beams each having a subplurality of beamlets of varying or identical intensity, with each beamlet emerging from a unique subsection of illuminated regions of the mask. A collimator collimates at least one of the emergent beams to form a collimated beam. One or more focusing elements focuses the collimated beam into a focused beam which is projected as a focused image plane on or within the resist material. The focused beam simultaneously illuminates a layer of the resist material to process an entire layer in a parallel fashion.

Abstract: The present disclosure relates to a method for performing an additive manufacturing operation to form a structure by processing a photopolymer resist material. A laser beam is directed at a tunable mask. At least one emergent beam is collected from a plurality of emergent beams emerging from the tunable mask. The at least one emergent beam is collimated to create a collimated beam. Each emergent beam from the tunable mask has a plurality of beam lets of varying or identical intensity, and each beam let emerges from a unique subsection or region of the tunable mask. The collimated beam is focused into a laser beam which is projected as an image plane onto or within the photopolymer resist material, such that the same optical path length is created between the tunable mask and the focused image plane for all optical frequencies of the focused laser beam.

Abstract: A resist blend for additive manufacturing includes a radiopaque pre-polymer compound, a photoinitiator, a polymerization inhibitor, and a base pre-polymer. The radiopaque pre-polymer compound includes at least one of the following elements: iodine, bromine, tin, lead, or bismuth. The resist blend is configured to have a first portion of the resist blend to be polymerized and to have a second portion of the resist blend to be unpolymerized, wherein the second portion is removable.

Abstract: According to one embodiment, a method includes contacting a triiodobenzoic acid with an oxalyl chloride in a solvent whereby triiodobenzoyl chloride is formed, contacting diethanolamine with triiodobenzoyl chloride where triiodobenzoic diol amine is formed, and forming an acrylate of triiodobenzoic diol amine with acryloyl chloride where an organoiodine compound is formed. According to another embodiment, an optically clear photopolymer resist blend for additive manufacturing includes a radiopaque pre-polymer compound where the compound includes at least one of the following: iodine, bromine, tin, lead, or bismuth. The resist blend also includes a photoinitiator, a polymerization inhibitor, and a base pre-polymer.

Abstract: The range of stretch-tunability of sinusoidal wrinkled surfaces that are obtained by compression of supported thin films is limited by the emergence of a period-doubled mode at high compressive strains. This disclosure presents a method to suppress the emergence of the period-doubled mode at high strains. This is achieved by compressing pre-patterned supported thin films, wherein the pre-patterns are substantially similar to the natural pattern of the supported thin film system. As compared to flat thin film systems, pre-patterned thin film systems exhibit period doubling behavior at a higher compressive strain. The onset strain for emergence of period-doubling is tuned by altering the amplitude of the pre-patterns.

Abstract: This invention relates to the low-cost manufacture of a tunable physical topographic pattern and more particularly to the manufacture of micro and nano scale hierarchical periodic wrinkle patterns that are generated upon compression of supported thin films. Disclosed herein is (i) a composite material with tunable hierarchical wrinkle patterns, wherein the composite material comprises a stretched and pre-patterned base layer and a thin film that is conformally attached to the pre-patterned surface of the base layer, (ii) a method of fabricating the pre-patterned base via pattern replication, and (iii) a method of fabricating tunable hierarchical wrinkle patterns, wherein the pattern can be deterministically switched across the hierarchical and non-hierarchical states via strain control.

Abstract: According to one embodiment, a method includes contacting a triiodobenzoic acid with an oxalyl chloride in a solvent whereby triiodobenzoyl chloride is formed, contacting diethanolamine with triiodobenzoyl chloride where triiodobenzoic diol amine is formed, and forming an acrylate of triiodobenzoic diol amine with acryloyl chloride where an organoiodine compound is formed. According to another embodiment, an optically clear photopolymer resist blend for additive manufacturing includes a radiopaque pre-polymer compound where the compound includes at least one of the following: iodine, bromine, tin, lead, or bismuth. The resist blend also includes a photoinitiator, a polymerization inhibitor, and a base pre-polymer.

Abstract: Wrinkling of supported thin films is a strain-driven phenomenon that enables scalable and low-cost fabrication of periodic micro and nano scale structures. The morphology of wrinkles depends on both the magnitude and the nature of compressive strains that are applied to the thin film. This disclosure presents the methods to fabricate asymmetric 2-D wrinkled structures using biaxial compressive strains. The method relies on the dependence of wrinkle morphology on both strains and strain paths to generate asymmetric 2D wrinkles. Asymmetry is achieved by deliberately traversing the system through a strain state that creates cracks along a preferential direction. Fabricated patterns include non-uniform zigzag wrinkles that demonstrate period doubling only along one direction.

Abstract: The pattern complexity and functional value of wrinkled structures can be substantially increased by fabricating the wrinkles on pre-patterned quasi-planar substrates instead of flat substrates. This disclosure presents the methods for fabricating pre-patterned polymeric surfaces that can be subsequently used as the substrates during manufacture of complex wrinkled structures. Pre-patterned substrates are generated by imprinting the pre-patterns onto the substrates during the curing process. Suitability for post-curing use in fabrication of wrinkles is ensured by (i) delayed imprinting that occurs close to but before the gelation point and (ii) gradual alignment of pre-patterns to the direction of stretch that is applied later during manufacture of wrinkled structures.

Abstract: The range of stretch-tunability of sinusoidal wrinkled surfaces that are obtained by compression of supported thin films is limited by the emergence of a period-doubled mode at high compressive strains. This disclosure presents a method to suppress the emergence of the period-doubled mode at high strains. This is achieved by compressing pre-patterned supported thin films, wherein the pre-patterns are substantially similar to the natural pattern of the supported thin film system. As compared to flat thin film systems, pre-patterned thin film systems exhibit period doubling behavior at a higher compressive strain. The onset strain for emergence of period-doubling is tuned by altering the amplitude of the pre-patterns.

Abstract: Wrinkling of supported thin films is a strain-driven phenomenon that enables scalable and low-cost fabrication of periodic micro and nano scale structures. The morphology of wrinkles depends on both the magnitude and the nature of compressive strains that are applied to the thin film. This disclosure presents the methods to fabricate asymmetric 2-D wrinkled structures using biaxial compressive strains. The method relies on the dependence of wrinkle morphology on both strains and strain paths to generate asymmetric 2D wrinkles. Asymmetry is achieved by deliberately traversing the system through a strain state that creates cracks along a preferential direction. Fabricated patterns include non-uniform zigzag wrinkles that demonstrate period doubling only along one direction.

Abstract: Wrinkling of thin films is a strain-driven process that enables scalable and low-cost fabrication of periodic micro and nano scale patterns. However, real-world application is limited by the inability of current tools to provide the means for applying large, accurate, and non-equal biaxial strains via a device that can fit within the vacuum chambers that are required for thin film deposition/growth during wrinkling. The present biaxial tensile stage is a compact system that enables one to apply large and accurate non-equal biaxial strains to elastomeric films. It consists of (i) fixtures to clamp and hold films onto the stage, (ii) linear bearings for motion guidance, (iii) integrated actuators for real-time stretch control, (iv) base with kinematic coupling for registration to a metrology system, and (v) the structural frame.

Abstract: The pattern complexity and functional value of wrinkled structures can be substantially increased by fabricating the wrinkles on pre-patterned quasi-planar substrates instead of flat substrates. This disclosure presents the methods for fabricating pre-patterned polymeric surfaces that can be subsequently used as the substrates during manufacture of complex wrinkled structures. Pre-patterned substrates are generated by imprinting the pre-patterns onto the substrates during the curing process. Suitability for post-curing use in fabrication of wrinkles is ensured by (i) delayed imprinting that occurs close to but before the gelation point and (ii) gradual alignment of pre-patterns to the direction of stretch that is applied later during manufacture of wrinkled structures.

Abstract: Wrinkling of thin films is a strain-driven process that enables scalable and low-cost fabrication of periodic micro and nano scale patterns. However, real-world application is limited by the inability of current tools to provide the means for applying large, accurate, and non-equal biaxial strains via a device that can fit within the vacuum chambers that are required for thin film deposition/growth during wrinkling. The present biaxial tensile stage is a compact system that enables one to apply large and accurate non-equal biaxial strains to elastomeric films. It consists of (i) fixtures to clamp and hold films onto the stage, (ii) linear bearings for motion guidance, (iii) integrated actuators for real-time stretch control, (iv) base with kinematic coupling for registration to a metrology system, and (v) the structural frame.

Abstract: This invention relates to the low-cost manufacture of a tunable physical topographic pattern and more particularly to the manufacture of micro and nano scale hierarchical periodic wrinkle patterns that are generated upon compression of supported thin films. Disclosed herein is (i) a composite material with tunable hierarchical wrinkle patterns, wherein the composite material comprises a stretched and pre-patterned base layer and a thin film that is conformally attached to the pre-patterned surface of the base layer, (ii) a method of fabricating the pre-patterned base via pattern replication, and (iii) a method of fabricating tunable hierarchical wrinkle patterns, wherein the pattern can be deterministically switched across the hierarchical and non-hierarchical states via strain control.