Abstract: A laser-based manufacturing system is disclosed for fabricating non-planar three-dimensional layers. The system may have a laser for producing a laser beam with a plurality of optical wavelengths. An optically dispersive element may be used for receiving the laser beam and splitting the beam into a plurality of distinct beam components, wherein each beam component has spatially separated optical spectral components. A phase mask may be used which is configured to receive at least one of the beam components emerging from the dispersive element and to create a modified beam. One or more focusing elements may then be used to receive the modified beam emerging from the phase mask and to focus the modified beam into a non-planar light sheet for use in fabricating a part.

Abstract: A laser-based manufacturing system is disclosed for fabricating non-planar three-dimensional layers. The system may have a laser for producing a laser beam with a plurality of optical wavelengths. An optically dispersive element may be used for receiving the laser beam and splitting the beam into a plurality of distinct beam components, wherein each beam component has spatially separated optical spectral components. A phase mask may be used which is configured to receive at least one of the beam components emerging from the dispersive element and to create a modified beam. One or more focusing elements may then be used to receive the modified beam emerging from the phase mask and to focus the modified beam into a non-planar light sheet for use in fabricating a part.

Abstract: This invention relates to a microelectromechanical device for mechanical characterization of a specimen. In one embodiment the device may incorporate a substrate, at least one first flexure bearing and at least one second flexure bearing, both being supported on the substrate. First and second movable shuttles may be used which are supported above the substrate by the flexure bearings so that each is free to move linearly relative to the substrate. Ends of the movable shuttles are separated by a gap. A thermal actuator may be connected to one end of the first movable shuttle, and operates to cause the first movable shuttle to move in a direction parallel to the surface of the substrate in response to a signal applied to the thermal actuator. A first capacitive sensor may be formed between the first movable shuttle and the substrate, and a second capacitive sensor formed between the second movable shuttle and the substrate.

Abstract: This invention relates to a microelectromechanical device for mechanical characterization of a specimen. In one embodiment the device may incorporate a substrate, at least one first flexure bearing and at least one second flexure bearing, both being supported on the substrate. First and second movable shuttles may be used which are supported above the substrate by the flexure bearings so that each is free to move linearly relative to the substrate. Ends of the movable shuttles are separated by a gap. A thermal actuator may be connected to one end of the first movable shuttle, and operates to cause the first movable shuttle to move in a direction parallel to the surface of the substrate in response to a signal applied to the thermal actuator. A first capacitive sensor may be formed between the first movable shuttle and the substrate, and a second capacitive sensor formed between the second movable shuttle and the substrate.

Abstract: An apparatus is disclosed for performing an additive manufacturing operation to form a structure by processing a photopolymer resist material. The apparatus may incorporate a laser for generating a laser beam, and a tunable mask for receiving the laser beam which has an optically dispersive element. The mask splits the laser beam into a plurality of emergent beams each having a subplurality of beamlets of varying or identical intensity, with each beamlet emerging from a unique subsection of illuminated regions of the mask. A collimator collimates at least one of the emergent beams to form a collimated beam. One or more focusing elements focuses the collimated beam into a focused beam which is projected as a focused image plane on or within the resist material. The focused beam simultaneously illuminates a layer of the resist material to process an entire layer in a parallel fashion.