Patents by Inventor Spikantewara Dakshina-Murthy

Spikantewara Dakshina-Murthy has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Dielectric formation to seal porosity of low dielectic constant (low k) materials after etch
    Publication number: 20010051420
    Abstract: A method is provided, the method including forming a first dielectric layer above a first structure layer, and forming a first opening in the first dielectric layer, the first opening having sidewalls. The method also includes forming a second dielectric layer on the sidewalls of the first opening.
    Type: Application
    Filed: January 19, 2000
    Publication date: December 13, 2001
    Inventors: Paul R. Besser, Spikantewara Dakshina-Murthy, Jeremy I. Martin, Jonathan B. Smith, Eric M. Apelgren