Patents by Inventor Srikant Pathak
Srikant Pathak has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20250115698Abstract: Printable resin precursor compositions and polishing articles including printable resin precursors are provided. Printable resin precursors include a curable precursor formulation having a viscosity of less than or about 15 cP at 70° which include at least one urethane acrylate oligomer, at least one reactive monomer, and a photoinitiator. The curable precursor formulation exhibits an ultimate tensile strength measured in mPa and an elongation at break (%), where a product of the ultimate tensile strength and the elongation at break is greater than or about 2,000.Type: ApplicationFiled: October 9, 2023Publication date: April 10, 2025Applicant: Applied Materials, Inc.Inventors: Xinyi Lu, SeyedMahmoud Hosseini, Sudhakar Madhusoodhanan, Srikant Pathak
-
Publication number: 20250115697Abstract: Printable resin precursor compositions and polishing articles including printable resin precursors are provided. Printable resin precursors include a curable precursor formulation having a viscosity of less than or about 15 cP at 70° which include at least one urethane acrylate oligomer, at least one reactive monomer, and a photoinitiator. The curable precursor formulation exhibits an ultimate tensile strength measured in mPa and an elongation at break (%), where a product of the ultimate tensile strength and the elongation at break is greater than or about 2,000.Type: ApplicationFiled: October 9, 2023Publication date: April 10, 2025Applicant: Applied Materials, Inc.Inventors: Xinyi Lu, SeyedMahmoud Hosseini, Sudhakar Madhusoodhanan, Srikant Pathak
-
Publication number: 20250034296Abstract: Polishing pads having porogen-features, methods of manufacturing polishing pads having porogen features, and compositions for manufacturing polishing pads having porogen features, and more particularly, to polishing pads used for chemical mechanical polishing (CMP) of a substrate in electronic device processing are provided. In one aspect, the porogen-forming composition, in proportions based on a total weight of the porogen-forming composition, includes (A) from about 60 to about 80 wt. % of an acrylamide monomer compound selected from acryloylmorpholine, N, N-dimethylacrylamide, or a combination thereof. The curable porogen-forming composition further includes (B) from about 10 to about 40 wt. % of a polyhydroxy compound having two or more hydroxyl groups. The curable porogen-forming composition further includes (C) from about 0.2 wt. % to about 4 wt. % of a photoinitiator component.Type: ApplicationFiled: July 27, 2023Publication date: January 30, 2025Inventors: Xinyi LU, Srikant PATHAK, Sudhakar MADHUSOODHANAN
-
Publication number: 20240227120Abstract: The disclosure generally relates to polishing pads, methods of manufacturing polishing pads, and formulations for manufacturing polishing pads, and more particularly, to polishing pads used for chemical mechanical polishing (CMP) of a substrate in electronic device processing. In one aspect, a photocurable printing composition containing photopolymerizable compounds and photopolymerization initiator is provided. The photocurable printing composition comprises a urethane acrylate oligomer having a functionality of 2 or more, a nominal viscosity greater than 20,000 cP at 60 degrees Celsius, and a glass transition temperature (Tg) of ?4 degrees Celsius or greater, the urethane acrylate oligomer present from about 20% to about 60% by weight based on a total weight of the photopolymerizable compounds. The photocurable printing composition has a viscosity of 20 centipoise or higher at 70 degrees Celsius.Type: ApplicationFiled: June 1, 2023Publication date: July 11, 2024Inventors: Sudhakar MADHUSOODHANAN, Xinyi LU, Srikant PATHAK
-
Publication number: 20230242710Abstract: Compositions that are curable by free radical redox reactions are disclosed. Free radical curing reactions between polythiols and polyalkyenyls are initiated by the reaction of metal complexes and organic peroxides. The compositions are useful as sealants.Type: ApplicationFiled: April 4, 2023Publication date: August 3, 2023Applicant: PRC-DeSoto International, Inc.Inventors: JianCheng Liu, Srikant Pathak, Bruce Virnelson
-
Patent number: 11655340Abstract: Compositions that are curable by free radical redox reactions are disclosed. Free radical curing reactions between polythiols and polyalkyenyls are initiated by the reaction of metal complexes and organic peroxides. The compositions are useful as sealants.Type: GrantFiled: June 8, 2018Date of Patent: May 23, 2023Assignee: PRC-DESOTO INTERNATIONAL, INC.Inventors: JianCheng Liu, Srikant Pathak, Bruce Virnelson
-
Publication number: 20210198496Abstract: Partially reacted alkoxysilane compositions, the use of partially reacted alkoxysilane compositions as adhesion-promoting primer coatings, and methods of using the partially reacted alkoxysilane compositions and coatings are disclosed.Type: ApplicationFiled: March 15, 2021Publication date: July 1, 2021Inventors: SRIKANT PATHAK, CHU RAN ZHENG, BRUCE VIRNELSON
-
Publication number: 20200199300Abstract: Compositions that are curable by free radical redox reactions are disclosed. Free radical curing reactions between polythiols and polyalkyenyls are initiated by the reaction of metal complexes and organic peroxides. The compositions are useful as sealants.Type: ApplicationFiled: June 8, 2018Publication date: June 25, 2020Applicant: PRC-DeSoto International, Inc.Inventors: JianCheng Liu, Srikant Pathak, Bruce Virnelson
-
Publication number: 20170009104Abstract: One embodiment is a pressure sensitive adhesive label or tape that comprises a facestock, and a pressure sensitive adhesive composition disposed on the facestock and the pressure sensitive adhesive composition includes a product made from reacting an epoxidized naturally occurring oil or fat with a dimer acid. Another embodiment of the invention is a method that comprises reacting an epoxidized naturally occurring oil or fat with a dimer acid to form a PSA precursor; coating the PSA precursor onto a carrier and curing the PSA precursor via UV radiation to form a pressure sensitive adhesive.Type: ApplicationFiled: September 26, 2016Publication date: January 12, 2017Inventors: Carol A. KOCH, Srikant PATHAK
-
Patent number: 9453151Abstract: One embodiment is a pressure sensitive adhesive label or tape that comprises a facestock, and a pressure sensitive adhesive composition disposed on the facestock and the pressure sensitive adhesive composition includes a product made from reacting an epoxidized naturally occurring oil or fat with a dimer acid. Another embodiment of the invention is a method that comprises reacting an epoxidized naturally occurring oil or fat with a dimer acid to form a PSA precursor; coating the PSA precursor onto a carrier and curing the PSA precursor via UV radiation to form a pressure sensitive adhesive.Type: GrantFiled: December 5, 2012Date of Patent: September 27, 2016Assignee: Avery Dennison CorporationInventors: Carol A. Koch, Srikant Pathak
-
Publication number: 20160257819Abstract: Partially reacted alkoxysilane compositions, the use of partially reacted alkoxysilane compositions as adhesion-promoting primer coatings, and methods of using the partially reacted alkoxysilane compositions and coatings are disclosed.Type: ApplicationFiled: March 6, 2015Publication date: September 8, 2016Inventors: Srikant Pathak, Chu Ran Zheng, Bruce Virnelson
-
Patent number: 8915583Abstract: Methods and/or systems for printing or otherwise evincing temporary indicia on media with disappearing inks are described along with suitable disappearing ink formulations and media constructions for executing the same. In particular embodiments, the methods and/or systems described employ a plurality of disappearing inks with different disappearing rates. In one embodiment, a barrier layer that is selectively used to cover a major surface of the media is employed to substantially block or otherwise regulate a rate of phase transitions (e.g., evaporation and/or sublimation) experienced by ink borne by the media.Type: GrantFiled: May 27, 2009Date of Patent: December 23, 2014Assignee: Avery Dennison CorporationInventors: David N. Edwards, Ali R. Mehrabi, Haochuan Wang, Juan M. De Santos Avila, Pradeep S. Iyer, Liviu Dinescu, Srikant Pathak, Nagarajan Srivatsan, Frank Y. Shih
-
Publication number: 20140224577Abstract: A pressure sensitive adhesive composition and laminate and having superior adhesive and damping properties is provided. The adhesive laminate includes an acrylic damping composition comprising a graft copolymer having an acrylic backbone and macromonomer side chains.Type: ApplicationFiled: August 23, 2011Publication date: August 14, 2014Applicant: Avery Dennison CorporationInventors: Srikant Pathak, Prakash Mallya, Daniel L. Holguin, Xing-Ya Li, Nagarajan Srivatsan
-
Publication number: 20130261409Abstract: Various methods, devices and systems for patch based physical, physiological, chemical, and biochemical sensors that diagnose and monitor disease states are described. The patch based sensors provide a panel of specific analyte parameters that determine one or more physiological conditions and/or the level of healing progression of a wound. The use of such analyte panels in local or remote monitoring of parameters related to various disease states is also described.Type: ApplicationFiled: November 30, 2010Publication date: October 3, 2013Inventors: Srikant Pathak, David N. Edwards
-
Publication number: 20090295851Abstract: Methods and/or systems for printing or otherwise evincing temporary indicia on media with disappearing inks are described along with suitable disappearing ink formulations and media constructions for executing the same. In particular embodiments, the methods and/or systems described employ a plurality of disappearing inks with different disappearing rates. In one embodiment, a barrier layer that is selectively used to cover a major surface of the media is employed to substantially block or otherwise regulate a rate of phase transitions (e.g., evaporation and/or sublimation) experienced by ink borne by the media.Type: ApplicationFiled: May 27, 2009Publication date: December 3, 2009Applicant: AVERY DENNISON CORPORATIONInventors: David N. Edwards, Ali R. Mehrabi, Haochuan Wang, Juan M. De Santos Avila, Pradeep S. Iyer, Liviu Dinescu, Srikant Pathak, Nagarajan Srivatsan, Frank Y. Shih
-
Publication number: 20050136538Abstract: One embodiment of the invention describes a novel method for providing a substrate for selective cell patterning, wherein the method comprises contacting an epoxide coated substrate surface with a bi-functional molecule having an epoxide end group and reacting these end groups with the substrate surface through a photochemically induced acid coupling reaction. The bi-functional molecule is applied in solution to the substrate surface as a photo-sensitive coating. A photomask stencil is used to deposit electromagnetic radiation into the coating in predetermined locations to form a desired pattern of the coating. The patterned substrate is provided by washing coating from the substrate leaving the bi-functional molecule attached to the substrate in those areas exposed to the radiation providing thereby cell adhesive moieties in controlled locations on the substrate.Type: ApplicationFiled: December 17, 2003Publication date: June 23, 2005Inventors: Srikant Pathak, Blake Simmons, Paul Dentinger