Abstract: Semiconductor devices and fabrication methods thereof are described. For example, a semiconductor device includes a source region and a drain region having a first conductivity type disposed in a semiconductor layer having an opposite second conductivity type, a shallow trench isolation structure disposed in the semiconductor layer between the source region and the drain region, a gate dielectric layer disposed over the semiconductor layer and extending between the source region and the shallow trench isolation structure, a gate electrode disposed over the gate dielectric layer and extending toward the drain region and over the shallow trench isolation structure, and a field plate spacer between the gate electrode and the shallow trench isolation structure.

Abstract: An integrated circuit, including a source region, a drain region, a channel region between the source region and the drain region, and a gate for inducing a conductive path through the channel region. The integrated circuit also includes structure, proximate a curved length of the gate, for inhibiting current flow along a portion of the channel region.

Abstract: One example includes a method for performing a BTI test process of DUTs. The method includes coupling contact pads of a DUT circuit to testing equipment. The DUT circuit includes a differential input stage and a gain stage. The differential input stage include a differential pair of transistors that are fabrication matched to the DUTs. The method also includes providing a BTI stress from the testing equipment to one of the differential pair of transistor devices to simulate BTI aging of the respective one of the differential pair of the transistors. The method also includes providing a differential input voltage from the testing equipment to the differential input stage. The method further includes measuring an output voltage at an output of the gain stage via the testing equipment in response to the differential input voltage to determine a threshold voltage change between the differential pair of transistor devices.

Abstract: An integrated circuit, including a source region, a drain region, a channel region between the source region and the drain region, and a gate for inducing a conductive path through the channel region. The integrated circuit also includes structure, proximate a curved length of the gate, for inhibiting current flow along a portion of the channel region.

Abstract: A method includes coupling a gate pulse generator to a gate terminal of a power transistor device under test, coupling a drain pulse generator to a drain terminal of the power transistor device under test; for a first set of test conditions, activating the drain pulse generator for each of the test conditions to apply a voltage pulse to the drain terminal, and for each of the test conditions, applying a voltage pulse to the gate terminal, the gate pulse rising only after the drain pulse falls below a predetermined threshold; for a second set of test conditions, applying a voltage pulse to the drain terminal, and applying a voltage pulse to the gate terminal, the drain pulse generator and the gate pulse generator both being active so that there is some overlap; and measuring the drain current into the power transistor device under test. An apparatus is disclosed.

Abstract: A method includes coupling a gate pulse generator to a gate terminal of a power transistor device under test, coupling a drain pulse generator to a drain terminal of the power transistor device under test; for a first set of test conditions, activating the drain pulse generator for each of the test conditions to apply a voltage pulse to the drain terminal, and for each of the test conditions, applying a voltage pulse to the gate terminal, the gate pulse rising only after the drain pulse falls below a predetermined threshold; for a second set of test conditions, applying a voltage pulse to the drain terminal, and applying a voltage pulse to the gate terminal, the drain pulse generator and the gate pulse generator both being active so that there is some overlap; and measuring the drain current into the power transistor device under test. An apparatus is disclosed.

Abstract: Apportioning unequally contributions of different metal paths of a circuit to electromigration (EM) reliability. In an embodiment, a corresponding parameter value representing a magnitude of excess current flowing in a single direction in each metal path is determined. A desired reliability measure for electromigration (EM) is apportioned among the metal paths based on computed parameter values for the corresponding metal path. A reliability analysis for the circuit is performed based on the apportioning. In an embodiment, metal paths which predominantly carry currents with an average value less than a threshold are excluded from being considered as contributors to EM degradation.

Abstract: Various apparatuses and methods for varying segment activation in a segmented power amplifier are disclosed herein. For example, some embodiments provide a power amplifier including an input, an output, a plurality of amplifier segments and a controller. The amplifier segments are connected in parallel between the input and the output and are adapted to be activated and inactivated. The power level at the output may be controlled by changing a number of the amplifier segments that are activated concurrently. The controller is connected to the amplifier segments and is adapted to vary which of the amplifier segments are activated to arrive at a selected number of activated amplifier segments.

Abstract: Various apparatuses and methods for varying segment activation in a segmented power amplifier are disclosed herein. For example, some embodiments provide a power amplifier including an input, an output, a plurality of amplifier segments and a controller. The amplifier segments are connected in parallel between the input and the output and are adapted to be activated and inactivated. The power level at the output may be controlled by changing a number of the amplifier segments that are activated concurrently. The controller is connected to the amplifier segments and is adapted to vary which of the amplifier segments are activated to arrive at a selected number of activated amplifier segments.

Abstract: One embodiment relates to an on-chip power amplifier (PA) test circuit. In one embodiment, a PA test circuit comprises a controllable oscillator (CO) configured to generate a radio frequency (RF) signal, a parallel resonant circuit tuned to the radio frequency, a pre-power amplifier (PPA) coupled to the CO and the parallel resonant circuit, the PPA configured to amplify and drive the RF signal from an output of the PPA into a load. The test circuit may further comprise a first transmission gate configured to couple the RF signal from the CO to an input of the PPA. One testing methodology for a PA test circuit comprises stressing the PPA with an RF signal, measuring a characteristic of the PPA, determining stress degradation from the characteristic measurements, and repeating the stressing and characteristic measurements until a maximum stress degradation is achieved or a maximum stress has been applied.

Abstract: Apparatus and methods are disclosed for evaluating degradation of a transistor in a cross coupled pair of an RF oscillator independently. A MOS device can be coupled between a separated center-tap inductor. By appropriately sizing the MOS device and turning the MOS device on during operation of RF oscillator, a good contact can again be made that allows the oscillator to operate at design performance. By turning the MOS device off, the supplies can be separates such that I-V characteristics of both transistors of the cross-coupled pair may be obtained.

Abstract: An integrated circuit (IC) includes at least a first complementary MOS (CMOS) circuit, the first CMOS circuit comprising one or more first n-channel MOS (NMOS) transistors and one or more first p-channel MOS (PMOS) transistors, where the first NMOS transistors and the first PMOS transistors are arranged in the first CMOS circuit to drive at least a first common node of the first CMOS circuit. An average of the effective gate channel lengths of the first NMOS transistors (first NMOS average length) is at least 2% greater than an average of the effective gate channel lengths of the first PMOS transistors (first PMOS average length).

Abstract: Apparatus and methods are disclosed for evaluating degradation of a transistor in a cross coupled pair of an RF oscillator independently. A MOS device can be coupled between a separated center-tap inductor. By appropriately sizing the MOS device and turning the MOS device on during operation of RF oscillator, a good contact can again be made that allows the oscillator to operate at design performance. By turning the MOS device off, the supplies can be separates such that I-V characteristics of both transistors of the cross-coupled pair may be obtained.

Abstract: An integrated circuit (IC) includes at least a first complementary MOS (CMOS) circuit, the first CMOS circuit comprising one or more first n-channel MOS (NMOS) transistors and one or more first p-channel MOS (PMOS) transistors, where the first NMOS transistors and the first PMOS transistors are arranged in the first CMOS circuit to drive at least a first common node of the first CMOS circuit. An average of the effective gate channel lengths of the first NMOS transistors (first NMOS average length) is at least 2% greater than an average of the effective gate channel lengths of the first PMOS transistors (first PMOS average length).

Abstract: According to one embodiment of the invention, a silicon-on-insulator device includes an insulative layer formed overlying a substrate and a source and drain region formed overlying the insulative layer. The source region and the drain region comprise a material having a first conductivity type. A body region is disposed between the source region and the drain region and overlying the insulative layer. The body region comprises a material having a second conductivity type. A gate insulative layer overlies the body region. This device also includes a gate region overlying the gate insulative layer. The device also includes a diode circuit conductively coupled to the source region and a conductive connection coupling the gate region to the diode circuit.

Abstract: Apportioning unequally contributions of different metal paths of a circuit to electromigration (EM) reliability. In an embodiment, a corresponding parameter value representing a magnitude of excess current flowing in a single direction in each metal path is determined. A desired reliability measure for electromigration (EM) is apportioned among the metal paths based on computed parameter values for the corresponding metal path. A reliability analysis for the circuit is performed based on the apportioning. In an embodiment, metal paths which predominantly carry currents with an average value less than a threshold are excluded from being considered as contributors to EM degradation.

Abstract: One embodiment relates to an on-chip power amplifier (PA) test circuit. In one embodiment, a PA test circuit comprises a controllable oscillator (CO) configured to generate a radio frequency (RF) signal, a parallel resonant circuit tuned to the radio frequency, a pre-power amplifier (PPA) coupled to the CO and the parallel resonant circuit, the PPA configured to amplify and drive the RF signal from an output of the PPA into a load. The test circuit may further comprise a first transmission gate configured to couple the RF signal from the CO to an input of the PPA. One testing methodology for a PA test circuit comprises stressing the PPA with an RF signal, measuring a characteristic of the PPA, determining stress degradation from the characteristic measurements, and repeating the stressing and characteristic measurements until a maximum stress degradation is achieved or a maximum stress has been applied.

Abstract: According to one embodiment of the invention, a silicon-on-insulator device includes an insulative layer formed overlying a substrate and a source and drain region formed overlying the insulative layer. The source region and the drain region comprise a material having a first conductivity type. A body region is disposed between the source region and the drain region and overlying the insulative layer. The body region comprises a material having a second conductivity type. A gate insulative layer overlies the body region. This device also includes a gate region overlying the gate insulative layer. The device also includes a diode circuit conductively coupled to the source region and a conductive connection coupling the gate region to the diode circuit.

Abstract: According to one embodiment of the invention, a silicon-on-insulator device includes an insulative layer formed overlying a substrate and a source and drain region formed overlying the insulative layer. The source region and the drain region comprise a material having a first conductivity type. A body region is disposed between the source region and the drain region and overlying the insulative layer. The body region comprises a material having a second conductivity type. A gate insulative layer overlies the body region. This device also includes a gate region overlying the gate insulative layer. The device also includes a diode circuit conductively coupled to the source region and a conductive connection coupling the gate region to the diode circuit.

Abstract: Methods and systems are provided for characterizing the negative temperature bias instability of a transistor. A bias voltage is maintained at a drain terminal of the transistor during a test period. A stress voltage is maintained at a gate terminal of the transistor during the test period, such that the stress voltage is applied concurrently with the bias voltage. At least one characteristic of the transistor is measured at periodic intervals during the stress period to determine a degradation of the at least one characteristic caused by the stress voltage until a termination event occurs.