Patents by Inventor Srinivas M. Satya

Srinivas M. Satya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • SEMICONDUCTOR CLEANING USING PLASMA-FREE PRECURSORS
    Publication number: 20240145230
    Abstract: Exemplary semiconductor processing methods may include providing one or more deposition precursors to a semiconductor processing chamber. A substrate may be disposed within a processing region of the semiconductor processing chamber. The methods may include depositing a silicon-containing material on the substrate and on one or more components of the semiconductor processing chamber. The methods may include providing a fluorine-containing precursor to the processing region. The fluorine-containing precursor may be plasma-free when provided to the processing region. The methods may include contacting the silicon-containing material on the one or more components of the semiconductor processing chamber with the fluorine-containing precursor. The methods may include removing at least a portion of the silicon-containing material on the one or more components of the semiconductor processing chamber with the fluorine-containing precursor.
    Type: Application
    Filed: October 28, 2022
    Publication date: May 2, 2024
    Applicant: Applied Materials, Inc.
    Inventors: Abhishek Mandal, Nitin Deepak, Geetika Bajaj, Ankur Kadam, Gopi Chandran Ramachandran, Suraj Rengarajan, Farhad K. Moghadam, Deenesh Padhi, Srinivas M. Satya, Manish Hemkar, Vijay Tripathi, Darshan Thakare