Abstract: A process directed to preparing surfactant-polycrystalline inorganic nanostructured materials having designed microscopic patterns. The process includes forming a polycrystalline inorganic substrate having a flat surface and placing in contact with the flat surface of the substrate a surface having a predetermined microscopic pattern. An acidified aqueous reacting solution is then placed in contact with an edge of the surface having the predetermined microscopic pattern. The solution wicks into the microscopic pattern by capillary action. The reacting solution has an effective amount of a silica source and an effective amount of a surfactant to produce a mesoscopic silica film upon contact of the reacting solution with the flat surface of the polycrystalline inorganic substrate and absorption of the surfactant into the surface. Subsequently an electric field is applied tangentially directed to the surface within the microscopic pattern.

Abstract: A process directed to preparing surfactant-polycrystalline inorganic nanostructured materials having designed microscopic patterns. The process includes forming a polycrystalline inorganic substrate having a flat surface and placing in contact with the flat surface of the substrate a surface having a predetermined microscopic pattern. An acidified aqueous reacting solution is then placed in contact with an edge of the surface having the predetermined microscopic pattern. The solution wicks into the microscopic pattern by capillary action. The reacting solution has an effective amount of a silica source and an effective amount of a surfactant to produce a mesoscopic silica film upon contact of the reacting solution with the flat surface of the polycrystalline inorganic substrate and absorption of the surfactant into the surface. Subsequently an electric field is applied tangentially directed to the surface within the microscopic pattern.

Abstract: A process directed to preparing surfactant-polycrystalline inorganic nanostructured materials having designed microscopic patterns. The process includes forming a polycrystalline inorganic substrate having a flat surface and placing in contact with the flat surface of the substrate a surface having a predetermined microscopic pattern. An acidified aqueous reacting solution is then placed in contact with an edge of the surface having the predetermined microscopic pattern. The solution wicks into the microscopic pattern by capillary action. The reacting solution has an effective amount of a silica source and an effective amount of a surfactant to produce a mesoscopic silica film upon contact of the reacting solution with the flat surface of the polycrystalline inorganic substrate and absorption of the surfactant into the surface. Subsequently an electric field is applied tangentially directed to the surface within the microscopic pattern.

Abstract: A process directed to preparing surfactant-polycrystalline inorganic nanostructured materials having designed microscopic patterns. The process includes forming a polycrystalline inorganic substrate having a flat surface and placing in contact with the flat surface of the substrate a surface having a predetermined microscopic pattern. An acidified aqueous reacting solution is then placed in contact with an edge of the surface having the predetermined microscopic pattern. The solution wicks into the microscopic pattern by capillary action. The reacting solution has an effective amount of a silica source and an effective amount of a surfactant to produce a mesoscopic silica film upon contact of the reacting solution with the flat surface of the polycrystalline inorganic substrate and absorption of the surfactant into the surface. Subsequently an electric field is applied tangentially directed to the surface within the microscopic pattern.

Abstract: A process directed to preparing surfactant-polycrystalline inorganic nanostructured materials having designed microscopic patterns. The process includes forming a polycrystalline inorganic substrate having a flat surface and placing in contact with the flat surface of the substrate a surface having a predetermined microscopic pattern. An acidified aqueous reacting solution is then placed in contact with an edge of the surface having the predetermined microscopic pattern. The solution wicks into the microscopic pattern by capillary action. The reacting solution has an effective amount of a silica source and an effective amount of a surfactant to produce a mesoscopic silica film upon contact of the reacting solution with the flat surface of the polycrystalline inorganic substrate and absorption of the surfactant into the surface. Subsequently an electric field is applied tangentially directed to the surface within the microscopic pattern.

Abstract: A process directed to preparing surfactant-polycrystalline inorganic nanostructured materials having designed microscopic patterns. The process includes forming a polycrystalline inorganic substrate having a flat surface and placing in contact with the flat surface of the substrate a surface having a predetermined microscopic pattern. An acidified aqueous reacting solution is then placed in contact with an edge of the surface having the predetermined microscopic pattern. The solution wicks into the microscopic pattern by capillary action. The reacting solution has an effective amount of a silica source and an effective amount of a surfactant to produce a mesoscopic silica film upon contact of the reacting solution with the flat surface of the polycrystalline inorganic substrate and absorption of the surfactant into the surface. Subsequently an electric field is applied tangentially directed to the surface within the microscopic pattern.