Patents by Inventor Srinivasan Chakrapani

Srinivasan Chakrapani has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140193753
    Abstract: The present invention provides a composition for forming a bottom anti-reflective coating, and also provides a photoresist pattern formation method employing that composition. The composition gives a bottom anti-reflective coating used in a lithographic process for manufacturing semiconductor devices, and the coating can be developed with a developing solution for photoresist. The composition contains a solvent, a polymer having a condensed polycyclic aromatic group, and a compound having a maleimide derivative or a maleic anhydride derivative. The composition may further contain a photo acid generator or a crosslinking agent.
    Type: Application
    Filed: February 19, 2014
    Publication date: July 10, 2014
    Applicant: AZ ELECTRONIC MATERIALS USA CORP.
    Inventors: Shigemasa NAKASUGI, Kazuma YAMAMOTO, Shinji MIYAZAKI, Munirathna PADMANABAN, Srinivasan CHAKRAPANI
  • Patent number: 8697336
    Abstract: The present invention provides a composition for forming a bottom anti-reflective coating, and also provides a photoresist pattern formation method employing that composition. The composition gives a bottom anti-reflective coating used in a lithographic process for manufacturing semiconductor devices, and the coating can be developed with a developing solution for photoresist. The composition contains a solvent, a polymer having a condensed polycyclic aromatic group, and a compound having a maleimide derivative or a maleic anhydride derivative. The composition may further contain a photo acid generator or a crosslinking agent.
    Type: Grant
    Filed: December 15, 2011
    Date of Patent: April 15, 2014
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Shigemasa Nakasugi, Kazuma Yamamoto, Yasushi Akiyama, Shinji Miyazaki, Munirathna Padmanaban, Srinivasan Chakrapani
  • Patent number: 8632948
    Abstract: The invention relates to a photoimageable antireflective coating composition capable of forming a pattern by development in an aqueous alkaline solution, comprising, (i) a polymer A soluble in a coating solvent and comprises a chromophore, a crosslinking moiety, and optionally a cleavable group which under acid or thermal conditions produces a functionality which aids in the solubility of the polymer in an aqueous alkaline solution and; (ii) at least one photoacid generator; (iii) a crosslinking agent; (iv) optionally, a thermal acid generator; (v) a polymer B which is soluble in an aqueous alkaline solution prior to development, where polymer B is non-miscible with polymer A and soluble in the coating solvent, and; (vi) a coating solvent composition, and (vii) optionally, a quencher. The invention also relates to a process for imaging the antireflective coating.
    Type: Grant
    Filed: September 30, 2009
    Date of Patent: January 21, 2014
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Munirathna Padmanaban, Srinivasan Chakrapani, Francis M. Houlihan, Shinji Miyazaki, Edward Ng, Mark O. Neisser
  • Patent number: 8623589
    Abstract: The present invention relates to an antireflective coating composition comprising a crosslinking agent, a polymer comprising at least one chromophore group and at least one hydroxyl and/or a carboxyl group, and an additive, further where the additive has structure 1 and comprises at least one arylene-hydroxyl moiety, where Y is selected from an carboxylate anion or sulfonate anion, R1, R2, and R3 are independently selected from unsubstituted C1-C8 alkyl, substituted C1-C8 alkyl, aryl and arylene-hydroxyl; X1, X2, and X3 are independently selected from direct valence bond and C1-C8 alkylene group, and, n=1, 2 or 3. The invention further relates to a process for using the composition.
    Type: Grant
    Filed: June 6, 2011
    Date of Patent: January 7, 2014
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Takanori Kudo, Alberto Dioses, Edward Ng, Srinivasan Chakrapani, Munirathna Padmanaban
  • Publication number: 20130157196
    Abstract: The present invention provides a composition for forming a bottom anti-reflective coating, and also provides a photoresist pattern formation method employing that composition. The composition gives a bottom anti-reflective coating used in a lithographic process for manufacturing semiconductor devices, and the coating can be developed with a developing solution for photoresist. The composition contains a solvent, a polymer having a condensed polycyclic aromatic group, and a compound having a maleimide derivative or a maleic anhydride derivative. The composition may further contain a photo acid generator or a crosslinking agent.
    Type: Application
    Filed: December 15, 2011
    Publication date: June 20, 2013
    Applicant: AZ ELECTRONIC MATERIALS USA CORP.
    Inventors: Shigemasa Nakasugi, Kazuma Yamamoto, Yasushi Akiyama, Shinji Miyazaki, Munirathna Padmanaban, Srinivasan Chakrapani
  • Publication number: 20120308939
    Abstract: The present invention relates to an antireflective coating composition comprising a crosslinking agent, a polymer comprising at least one chromophore group and at least one hydroxyl and/or a carboxyl group, and an additive, further where the additive has structure 1 and comprises at least one arylene-hydroxyl moiety, where Y is selected from an carboxylate anion or sulfonate anion, R1, R2, and R3 are independently selected from unsubstituted C1-C8 alkyl, substituted C1-C8 alkyl, aryl and arylene-hydroxyl; X1, X2, and X3 are independently selected from direct valence bond and C1-C8 alkylene group, and, n=1, 2 or 3. The invention further relates to a process for using the composition.
    Type: Application
    Filed: June 6, 2011
    Publication date: December 6, 2012
    Applicant: AZ ELECTRONIC MATERIALS USA CORP.
    Inventors: Takanori Kudo, Alberto Dioses, Edward Ng, Srinivasan Chakrapani, Munirathna Padmanaban
  • Patent number: 8252503
    Abstract: Photoresist compositions are disclosed.
    Type: Grant
    Filed: August 24, 2007
    Date of Patent: August 28, 2012
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Srinivasan Chakrapani, Munirathna Padmanaban, Muthiah Thiyagarajan, Takanori Kudo, David L. Rentkiewicz
  • Publication number: 20120122029
    Abstract: The present invention relates to a photoimageable underlayer composition comprising a polymer, a crosslinker comprising a vinyl ether group, and a thermal acid generator comprising a salt of a mono or polycarboxylic acid and an amine, where the amine has a boiling point of at least 150° C. The invention also relates to a process for forming an image in the underlayer comprising the novel composition.
    Type: Application
    Filed: November 11, 2010
    Publication date: May 17, 2012
    Inventors: Takanori Kudo, Alberto Dioses, Edward Ng, Srinivasan Chakrapani, Munirathna Padmanaban
  • Publication number: 20120108067
    Abstract: The invention relates to an edge bead remover composition for an organic film disposed on a substrate surface, comprising an organic solvent and at least one polymer having a contact angle with water greater than 70°. The invention also relates to a process for using the composition as an edge bead remover for an organic film.
    Type: Application
    Filed: October 29, 2010
    Publication date: May 3, 2012
    Inventors: Mark O. Neisser, Srinivasan Chakrapani, Munirathna Padmanaban, Ralph R. Dammel
  • Publication number: 20110086312
    Abstract: The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent of structure (7), and optionally, a photoacid generator and/or an acid and/or a thermal acid generator, where structure (7) is wherein W is selected from (C1-C30) linear, branched or cyclic alkyl moiety, substituted or unsubstituted (C3-C40) alicyclic hydrocarbon moiety and substituted is or unsubstituted (C3-C40) cycloalkylalkylene moiety; R is selected from C1-C10 linear or branched alkylene and n?2. The invention further relates to a process for using such a composition.
    Type: Application
    Filed: October 9, 2009
    Publication date: April 14, 2011
    Inventors: Ralph R. Dammel, Srinivasan Chakrapani, Munirathna Padmanaban, Shinji Miyazaki, Edward W. Ng, Takanori Kudo, Alberto D. Dioses, Francis M. Houlihan
  • Publication number: 20110076626
    Abstract: The invention relates to a photoimageable antireflective coating composition capable of forming a pattern by development in an aqueous alkaline solution, comprising, (i) a polymer A soluble in a coating solvent and comprises a chromophore, a crosslinking moiety, and optionally a cleavable group which under acid or thermal conditions produces a functionality which aids in the solubility of the polymer in an aqueous alkaline solution and; (ii) at least one photoacid generator; (iii) a crosslinking agent; (iv) optionally, a thermal acid generator; (v) a polymer B which is soluble in an aqueous alkaline solution prior to development, where polymer B is non-miscible with polymer A and soluble in the coating solvent, and; (vi) a coating solvent composition, and (vii) optionally, a quencher. The invention also relates to a process for imaging the antireflective coating.
    Type: Application
    Filed: September 30, 2009
    Publication date: March 31, 2011
    Inventors: Munirathna Padmanaban, Srinivasan Chakrapani, Francis M. Houlihan, Shinji Miyazaki, Edward Ng, Mark O. Neisser
  • Patent number: 7847033
    Abstract: An emulsifier for use in forming a film for a suspended particle device (SPD) wherein the film is comprised of a cross-linked matrix polymer having a plurality of droplets of a liquid light valve suspension distributed therein. The emulsifier is formed of a copolymer material comprising at least first and second segments, the segments differing from one another in at least one of their chemical affinities, their compositions and their polarities. A first one of the segments is soluble in an uncured liquid matrix polymer used in forming the film, but insoluble in a liquid suspension medium of which the droplets are dispersed. A second segment is soluble in the liquid suspending medium in the droplets and insoluble in the uncured liquid matrix polymer. The first and second segments have substantially the same index of refraction and the index of refraction of the segments is within 0.010 of that of each phase of an emulsion formed with the emulsifier.
    Type: Grant
    Filed: June 20, 2006
    Date of Patent: December 7, 2010
    Assignee: Research Frontiers Incorporated
    Inventors: Srinivasan Chakrapani, Robert L. Saxe, Steven M. Slovak
  • Publication number: 20100136477
    Abstract: The present invention relates to a novel photosensitive composition comprising a) an organic polymer, b) a photobase generator of structure (1), and c) optionally a photoacid generator, (+A1?O2C)—B—(CO2?A2+)x??(1) where A1+ and A2+ are independently an onium cation, x is an integer greater than or equal to 1, and B is a nonfluorinated hydrocarbon moiety. The photosensitive composition may be used as a photoresist composition or be used as an alkali developable antireflective underlayer coating composition.
    Type: Application
    Filed: December 1, 2008
    Publication date: June 3, 2010
    Inventors: Edward W. Ng, Nelson M. Felix, Munirathna Padmanaban, Srinivasan Chakrapani
  • Publication number: 20090053652
    Abstract: Photoresist compositions are disclosed.
    Type: Application
    Filed: August 24, 2007
    Publication date: February 26, 2009
    Inventors: Srinivasan Chakrapani, Munirathna Padmanaban, Muthiah Thiyagarajan, Takanori Kudo, David L. Rentkiewicz
  • Patent number: 7491482
    Abstract: The present application relates to a compound of formula AiXi where Ai is an organic onium cation; and Xi is an anion of the formula X—CF2CF2OCF2CF2—SO3?. The compounds are useful as photoactive materials.
    Type: Grant
    Filed: December 4, 2006
    Date of Patent: February 17, 2009
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Munirathna Padmanaban, Srinivasan Chakrapani, M. Dalil Rahman
  • Publication number: 20090042148
    Abstract: The present invention refers to a photoresist composition comprising (i) a polymer A comprising at least one acid labile group; (ii) at least one photoacid generator; (iii) at least one base; (iv) a polymer B, where polymer B is non-miscible with polymer A and soluble in the coating solvent, and; (v) a coating solvent composition. The present invention also relates to the process of imaging the photoresist.
    Type: Application
    Filed: August 6, 2007
    Publication date: February 12, 2009
    Inventors: Munirathna Padmanaban, Srinivasan Chakrapani, Guanyang Lin
  • Publication number: 20080187868
    Abstract: The present application relates to a composition comprising a) a polymer containing an acid labile group; b) a compound selected from (i), (ii) and mixtures thereof, where (i) is Ai Xi Bi and (ii) is Ai Xi1; and c) a compound of formula Ai Xi2 where Ai, Bi, Xi, Xi1, and Xi2 are defined herein. The compositions are useful in the semiconductor industry.
    Type: Application
    Filed: February 7, 2007
    Publication date: August 7, 2008
    Inventors: Munirathna Padmanaban, Srinivasan Chakrapani
  • Publication number: 20080171270
    Abstract: The present application relates to a polymer having the formula where R30, R31, R32, R33, R40, R41, R42, jj, kk, mm, and nn are described herein. The compounds are useful in forming photoresist compositions.
    Type: Application
    Filed: January 16, 2007
    Publication date: July 17, 2008
    Inventors: Munirathna Padmanaban, Srinivasan Chakrapani, Ralph R. Dammel
  • Publication number: 20080131811
    Abstract: The present application relates to a compound of formula AiXi where Ai is an organic onium cation; and Xi is an anion of the formula X—CF2CF2OCF2CF2—SO3?. The compounds are useful as photoactive materials.
    Type: Application
    Filed: December 4, 2006
    Publication date: June 5, 2008
    Inventors: Munirathna Padmanaban, Srinivasan Chakrapani, M. Dalil Rahman
  • Patent number: 7361252
    Abstract: The invention is directed to a method for laminating a suspended particle device (SPD) film which comprises forming a suspended particle device film; positioning the suspended particle device film within an unlaminated stack of components for forming a laminated suspended particle device film, wherein the stack comprises at least one hot melt adhesive sheet or film contacting an outer surface of the suspended particle device film; subjecting the unlaminated stack to at least a partial vacuum, preheating the unlaminated stack of components under the vacuum for a time and at a temperature selected to permit at least partial degassing of the stack and applying a sufficient net pressure to the stack at a sufficient temperature and for a sufficient time to produce a laminated suspended particle device film from the unlaminated stack.
    Type: Grant
    Filed: July 23, 2004
    Date of Patent: April 22, 2008
    Assignee: Research Frontiers Incorporated
    Inventors: Steven M Slovak, Srinivasan Chakrapani, Robert L Saxe