Patents by Inventor Srivivas D. Nemani

Srivivas D. Nemani has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Dual top gas feed through distributor for high density plasma chamber
    Patent number: 7758698
    Abstract: A gas distributor for use in a semiconductor process chamber comprises a body. The body includes a first channel formed within the body and adapted to pass a first fluid from a first fluid supply line through the first channel to a first opening. A second channel is formed within the body and adapted to pass a second fluid from a second fluid supply line through the second channel to a second opening. The first and second openings are arranged to mix the fluids outside the body after the fluids pass through the openings.
    Type: Grant
    Filed: November 28, 2006
    Date of Patent: July 20, 2010
    Assignee: Applied Materials, Inc.
    Inventors: Won B. Bang, Srivivas D. Nemani, Phong Pham, Ellie Y. Yieh
  • Dual Top Gas Feed Through Distributor for High Density Plasma Chamber
    Publication number: 20090042407
    Abstract: A gas distributor for use in a semiconductor process chamber comprises a body. The body includes a first channel formed within the body and adapted to pass a first fluid from a first fluid supply line through the first channel to a first opening. A second channel is formed within the body and adapted to pass a second fluid from a second fluid supply line through the second channel to a second opening. The first and second openings are arranged to mix the fluids outside the body after the fluids pass through the openings.
    Type: Application
    Filed: October 17, 2008
    Publication date: February 12, 2009
    Applicant: Applied Materials, Inc.
    Inventors: Won B. Bang, Srivivas D. Nemani, Phong Pham, Ellie Y. Yieh
  • DUAL TOP GAS FEED THROUGH DISTRIBUTOR FOR HIGH DENSITY PLASMA CHAMBER
    Publication number: 20080121178
    Abstract: A gas distributor for use in a semiconductor process chamber comprises a body. The body includes a first channel formed within the body and adapted to pass a first fluid from a first fluid supply line through the first channel to a first opening. A second channel is formed within the body and adapted to pass a second fluid from a second fluid supply line through the second channel to a second opening. The first and second openings are arranged to mix the fluids outside the body after the fluids pass through the openings.
    Type: Application
    Filed: November 28, 2006
    Publication date: May 29, 2008
    Applicant: Applied Materials, Inc.
    Inventors: Won B. Bang, Srivivas D. Nemani, Phong Pham, Ellie Y. Yieh
  • DUAL TOP GAS FEED THROUGH DISTRIBUTOR FOR HIGH DENSITY PLASMA CHAMBER
    Publication number: 20080121177
    Abstract: A gas distributor for use in a semiconductor process chamber comprises a body. The body includes a first channel formed within the body and adapted to pass a first fluid from a first fluid supply line through the first channel to a first opening. A second channel is formed within the body and adapted to pass a second fluid from a second fluid supply line through the second channel to a second opening. The first and second openings are arranged to mix the fluids outside the body after the fluids pass through the openings.
    Type: Application
    Filed: November 28, 2006
    Publication date: May 29, 2008
    Applicant: Applied Materials, Inc.
    Inventors: Won B. Bang, Srivivas D. Nemani, Phong Pham, Ellie Y. Yieh